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37 条记录 (耗时 0.046 秒)

    Method and apparatus for detecting repetitive structures in 3D mesh models
    5.
    发明授权
    Method and apparatus for detecting repetitive structures in 3D mesh models 有权

    公开(公告)号：US10311635B2

    公开(公告)日：2019-06-04

    申请号：US13807322

    申请日：2010-06-30

    申请人： Kangying Cai ,  Weiwei Li ,  Zhibo Chen

    发明人： Kangying Cai ,  Weiwei Li ,  Zhibo Chen

    IPC分类号： G06K9/00 ,  G06K9/46 ,  G06K9/48 ,  G06T17/10 ,  G06T19/00

    摘要： Discovering repetitive structures in 3D models is a challenging task. A method for detecting repetitive structures in 3D models comprises sampling the 3D model using a current sampling step size, detecting repetitive structures and remaining portions of the model, determining a representative for each of the one or more repetitive structures, and as long as the detecting step yields one or more repetitive structures, reducing the current sampling step size and repeating the steps of sampling and detecting for each detected representative of a detected repetitive structure and for the remaining portions of the model, wherein the reduced sampling step size is used. The described method and device can e.g. be used for 3D model compression, 3D model repairing, or geometry synthesis.

    Method of eliminating surface stress of silicon wafer
    6.
    发明授权
    Method of eliminating surface stress of silicon wafer 失效
    消除硅晶片表面应力的方法

    公开(公告)号：US07524235B2

    公开(公告)日：2009-04-28

    申请号：US11753222

    申请日：2007-05-24

    申请人： Yuling Liu ,  Jianxin Zhang ,  Weiwei Li ,  Yanyan Huang ,  Yongchao Bian ,  Na Liu

    发明人： Yuling Liu ,  Jianxin Zhang ,  Weiwei Li ,  Yanyan Huang ,  Yongchao Bian ,  Na Liu

    IPC分类号： B24B1/00

    CPC分类号： B28D5/022 ,  H01L21/3043

    摘要： This invention provides a method for eliminating the surface stress of a silicon wafer comprising forming one or more anti-stress groove(s) on the surface of the silicon wafer. These anti-stress grooves can reduce or eliminate the surface stress of silicon wafer effectively to avoid the formation of slip lines and dislocation arrangements, which may induce the p-n junction to conduct or the leakage current to increase. The process is highly efficient and low in cost. It is simple to manage and does not require additional equipment beyond that already used for processing of silicon wafers.

    摘要翻译： 本发明提供了一种消除硅晶片的表面应力的方法，包括在硅晶片的表面上形成一个或多个抗应力槽。 这些抗应力槽可以有效地减少或消除硅晶片的表面应力，以避免形成滑移线和位错布置，这可能导致p-n结导通或漏电流增加。 该过程高效，成本低。 管理简单，不需要超出已经用于硅晶片处理的附加设备。

    Method and kit for detection of early cancer or pre-cancer using blood and body fluids
    7.
    发明申请
    Method and kit for detection of early cancer or pre-cancer using blood and body fluids 审中-公开
    使用血液和体液检测早期癌症或癌前病变的方法和试剂盒

    公开(公告)号：US20070141582A1

    公开(公告)日：2007-06-21

    申请号：US11303815

    申请日：2005-12-15

    申请人： Weiwei Li ,  Jessica Li

    发明人： Weiwei Li ,  Jessica Li

    IPC分类号： C12Q1/68 ,  C12P19/34

    CPC分类号： C12Q1/6886 ,  C12Q2600/154 ,  C12Q2600/156 ,  C12Q2600/16

    摘要： This invention is related to a method for the detection of early or pre-cancer using DNA isolated from blood and body fluids. This invention provides an improved methylation-based PCR assay, a panel of methylated-based cancer-related gene markers for the detection of general cancer and a panel of demethylation-based tissue- or cell-specific gene markers for discriminating different type of cancer detected from blood samples. This method couples a sequential cancer-related gene marker detection and tissue or cell-specific gene marker assay and is particularly useful as a simultaneous screening test for following type of cancer: lung, breast, ovarian, colon, stomach, prostatic, pancreatic and liver cancer.

    摘要翻译： 本发明涉及使用从血液和体液中分离的DNA检测早期或癌前的方法。 本发明提供了改进的基于甲基化的PCR测定法，用于检测一般癌症的甲基化基于癌症的相关基因标记组和用于鉴别检测到的不同类型的癌症的基于去甲基化的组织或细胞特异性基因标记物 从血液样本。 该方法结合顺序的癌症相关基因标记检测和组织或细胞特异性基因标记测定，并且作为以下类型的癌症的同时筛选试验特别有用：肺，乳腺，卵巢，结肠，胃，前列腺，胰腺和肝脏 癌症。

    Method for removing contaminants from silicon wafer surface
    9.
    发明授权
    Method for removing contaminants from silicon wafer surface 失效
    从硅晶片表面去除污染物的方法

    公开(公告)号：US07578890B2

    公开(公告)日：2009-08-25

    申请号：US11753219

    申请日：2007-05-24

    申请人： Yuling Liu ,  Xinhuan Niu ,  Shengli Wang ,  Juan Wang ,  Weiwei Li ,  Zhenguo Ma

    发明人： Yuling Liu ,  Xinhuan Niu ,  Shengli Wang ,  Juan Wang ,  Weiwei Li ,  Zhenguo Ma

    IPC分类号： B08B3/00 ,  B08B3/12 ,  C25F1/00 ,  C25F3/30

    CPC分类号： H01L21/02052 ,  C11D1/72 ,  C11D3/30 ,  C11D11/0047 ,  C11D11/007

    摘要： Taught is a method of removal surface contaminants, including organic contaminants, metal ions and solid particles, from silicon wafer surface comprising the following steps: (a) submerging the silicon wafer surface in an aqueous cleaning agent solution through which current is passed using a boron-doped diamond film as an electrode; (b) submerging the silicon wafer surface in an aqueous cleaning agent solution; subjecting the silicon wafer to ultrasound waves; and, optionally, heating the solution; (c) submerging the silicon wafer surface in water through which current is passed using a boron-doped diamond film as an electrode; (d) submerging the silicon wafer surface in water with ultrasound and heating; (e) repeating step (d); and (f) spraying the silicon surface with water. The results obtained using the method according to this invention are far superior to those obtained with conventional methods. The technology is simple, convenient to operate, and environmentally friendly.

    摘要翻译： 教授是从硅晶片表面去除表面污染物（包括有机污染物，金属离子和固体颗粒）的方法，包括以下步骤：（a）将硅晶片表面浸入通过其中流过电流的水性清洁剂溶液中 掺杂金刚石膜作为电极; （b）将硅晶片表面浸没在水性清洁剂溶液中; 对硅晶片进行超声波; 和任选地加热溶液; （c）使用掺杂硼的金刚石膜作为电极将硅晶片表面浸入通过电流的水中; （d）用超声波和加热将硅晶片表面浸入水中; （e）重复步骤（d）; 和（f）用水喷涂硅表面。 使用根据本发明的方法获得的结果远远优于用常规方法获得的结果。 技术简单，操作方便，环保。

    Nogo-receptor antagonists for the treatment of conditions involving amyloid plaques
    10.
    发明申请
    Nogo-receptor antagonists for the treatment of conditions involving amyloid plaques 审中-公开
    Nogo受体拮抗剂用于治疗涉及淀粉样蛋白斑的病症

    公开(公告)号：US20070065429A1

    公开(公告)日：2007-03-22

    申请号：US10553669

    申请日：2004-04-16

    申请人： Daniel Lee ,  Weiwei Li

    发明人： Daniel Lee ,  Weiwei Li

    IPC分类号： A61K39/395 ,  A61K38/17

    CPC分类号： C07K16/28 ,  A61K38/1787 ,  C07K2317/76

    摘要： The invention provides methods for treating diseases involving aberrant amyloid-β (Aβ) peptide deposition, including Alzheimer's Disease, by the administration of Nogo receptor antagonists. The invention also provides method for reducing levels of Aβ peptide in a mammal by the administration of soluble Nogo receptor polypeptides

    摘要翻译： 本发明提供了通过施用Nogo受体拮抗剂来治疗涉及异常淀粉样蛋白-β（Abeta）肽沉积的疾病，包括阿尔茨海默氏病的方法。 本发明还提供了通过施用可溶性Nogo受体多肽来降低哺乳动物中Abeta肽水平的方法