摘要:
A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for supplying power at a frequency of the generator to the overhead electrode and capable of maintaining a plasma within the chamber at a desired plasma ion density level. The overhead electrode has a capacitance such that the overhead electrode and the plasma formed in the chamber at the desired plasma ion density resonate together at an electrode-plasma resonant frequency, the frequency of the generator being at least near the electrode-plasma resonant frequency. The reactor further includes a set of MERIE magnets surrounding the plasma process area overlying the wafer surface that produce a slowly circulating magnetic field which stirs the plasma to improve plasma ion density distribution uniformity.
摘要:
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry.
摘要:
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
摘要:
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
摘要:
Systems and methods for executing compiled code having parallel code fragments is provided. One method includes storing executable code having a plurality of parallel code fragments, each of the plurality of parallel code fragments representing alternative executable paths through a code stream. The method includes translating the executable code into machine-readable code executable by a processor of the computing system. Translating the executable code includes selecting a code fragment from among the plurality of parallel code fragments for execution to select features for inclusion in execution at a time of execution. The method includes executing the machine-readable code within the hosted computing environment.
摘要:
A shampoo bowl and neck/head rest combination wherein the shampoo bowl for receiving the neck and/or head area has a recessed area for receiving the neck/head rest below a top edge of the shampoo bowl. In another embodiment, a shampoo bowl arrangement comprises a bowl, the bowl dimensioned to receive a neck area and/or a head area of a person during a hair washing, hair cutting, massaging and/or hair coloring procedure; and one or more accessories, couplable to the bowl and utilizable during the hair washing, hair cutting, massaging and/or hair coloring procedure. In a preferred embodiment, a cushion is provided, wherein the cushion extends along at least a portion of a top edge of the shampoo bowl, and wherein the one or more accessories are coupled to the cushion and the cushion and the neck/head rest are integrated as one unit (e.g. one piece of material).
摘要:
A method of determining whether a stack of components in a device are in a desired order includes irradiating each of the components in the device with an energy beam. The radiation emissions from each of the irradiated components are detected with a radiation detector. The detected radiation emissions are analyzed using a central processing unit (CPU) to determine whether the components in the device are stacked in the desired order.
摘要:
An affinity server estimates an affinity between two different time based media events (e.g., TV, radio, social media content stream), between a time based media event and a specific topic, or between two different topics, where the affinity score represents an intersection between the populations of social media users who have authored social media content items regarding the two different events and/or topics. The affinity score represents an estimation of the real world affinity between the real world population of people who have an interest in both time based media events, both topics, or in a time based media event and a topic. One possible threshold for including a social media user in a population may be based on a confidence score that indicates the confidence that one or more social media content items authored by the social media user are relevant to the topic or event in question.
摘要:
An interface is provided that configures itself dynamically based on sensor information received from a sensor assembly or actuator information received from an actuator assembly. The interface may be configured to interoperate with sensor assemblies including analog transducers, smart transducers providing digital outputs and various actuators. The sensor information or the actuator information may include information for managing power consumption associated with the operation of the sensor or the actuator. Using the sensor information or the actuator information, a power management scheme may be implemented to reduce power consumption and extend the operational time of a module. The sensor information also includes information about the sensor signal generated by the sensor. The information about the sensor signal allows the module to interoperate with more diverse types of sensors.
摘要:
Methods and systems for determining positioning of objects of interest within a scene in video content are disclosed. One method includes applying position detection tags to one or more physical objects in a scene to be captured as video content, and capturing video content including the scene containing the one or more physical objects such that positions of the physical objects are known. The method also includes detecting the one or more objects within a recorded scene of the video content, and identifying one or more objects of interest in the recorded scene corresponding to the objects at least in part by extrapolating from the known physical positions of the objects in the scene.