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1.发明授权Systems and methods for treating flammable effluent gases from manufacturing processes 有权用于处理来自制造过程的易燃废气的系统和方法公开(公告)号：US09387428B2
公开(公告)日：2016-07-12
申请号：US12365886
申请日：2009-02-04
CPC分类号： B01D53/005 , B01D53/40 , B01D2257/108 , B01D2258/0216
摘要： A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.
摘要翻译： 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。
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2.发明申请METHODS AND SYSTEMS FOR DESIGNING AND VALIDATING OPERATION OF ABATEMENT SYSTEMS 审中-公开用于设计和确认退休系统操作的方法和系统公开(公告)号：US20090018688A1
公开(公告)日：2009-01-15
申请号：US12139472
申请日：2008-06-14
申请人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Belynda Flippo , Mehran Moalem , Charles Murray
发明人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Belynda Flippo , Mehran Moalem , Charles Murray
IPC分类号： G06F19/00
CPC分类号： B01D53/346 , B01D2258/0216
摘要： A method of developing an integrated abatement system is provided, including the steps: a) determining whether an integrated abatement system meets a destruction removal efficiency standard wherein the determination includes the steps: i) operating an electronic device manufacturing process tool using a best known method, whereby effluent containing a target species is produced; ii) abating the target species to form abated effluent, using an abatement system which is coupled to the process tool; and iii) calculating a destruction removal efficiency for the target species; and b) modifying the abatement system by altering at least one of a design parameter and an operating parameter of the abatement system to improve the destruction removal efficiency. Numerous other aspects are provided.
摘要翻译： 提供了一种开发集成减排系统的方法，包括步骤：a）确定综合减排系统是否满足销毁去除效率标准，其中确定包括以下步骤：i）使用最佳已知方法操作电子设备制造工艺工具 由此产生含有目标物种的流出物; ii）使用与处理工具相连的减排系统来减轻目标物种以形成减排的流出物; 和iii）计算目标物种的破坏去除效率; 以及b）通过改变所述减排系统的设计参数和操作参数中的至少一个来改进所述减排系统，以提高所述破坏去除效率。 提供了许多其他方面。
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3.发明申请SYSTEMS AND METHODS FOR TREATING FLAMMABLE EFFLUENT GASES FROM MANUFACTURING PROCESSES 有权用于从制造过程中处理易燃气体的系统和方法公开(公告)号：US20090216061A1
公开(公告)日：2009-08-27
申请号：US12365886
申请日：2009-02-04
CPC分类号： B01D53/005 , B01D53/40 , B01D2257/108 , B01D2258/0216
摘要： A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.
摘要翻译： 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。
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4.发明申请公开(公告)号：US20090238972A1
公开(公告)日：2009-09-24
申请号：US12410063
申请日：2009-03-24
申请人： Daniel O. Clark , Mehran Moalem , Robbert M. Vermeulen , Yong Kee Chae , Charles Gay , John M. White , Robert Z. Bachrach , Jay J. Jung
发明人： Daniel O. Clark , Mehran Moalem , Robbert M. Vermeulen , Yong Kee Chae , Charles Gay , John M. White , Robert Z. Bachrach , Jay J. Jung
IPC分类号： C23C16/42
CPC分类号： C23C16/24 , C23C16/4402 , C23C16/4412 , C23C16/45593
摘要： In one aspect, a method of forming a silicon layer on a substrate is provided, including the steps providing a substrate; and introducing hydrogen and silane into a chamber containing the substrate such that a layer of silicon is deposited on the substrate; wherein the silane is less than about 99.999% pure. Numerous other aspects are provided.
摘要翻译： 一方面，提供了在基板上形成硅层的方法，包括提供基板的步骤; 并将氢和硅烷引入到含有所述衬底的室中，使得硅层沉积在所述衬底上; 其中所述硅烷的纯度小于约99.999％。 提供了许多其他方面。
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公开(公告)号：US20080290041A1
公开(公告)日：2008-11-27
申请号：US12126920
申请日：2008-05-25
申请人： Daniel O. Clark , Robbert M. Vermeulen , Youssef A. Loldj , Belynda Flippo , Mehran Moalem , Shaun W. Crawford
发明人： Daniel O. Clark , Robbert M. Vermeulen , Youssef A. Loldj , Belynda Flippo , Mehran Moalem , Shaun W. Crawford
IPC分类号： G05B11/00
摘要： A method of operating an electronic device manufacturing system is provided which includes the steps of receiving information with an interface, wherein the information relates to an abatement system, and shutting down a process tool and an abatement tool in response to the information.
摘要翻译： 提供了一种操作电子设备制造系统的方法，其包括以界面接收信息的步骤，其中所述信息涉及减排系统，以及响应于所述信息关闭处理工具和减排工具。
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6.发明申请METHODS AND APPARATUS FOR A COGENERATION ABATEMENT SYSTEM FOR ELECTRONIC DEVICE MANUFACTURING 审中-公开用于电子设备制造的加密系统的方法和装置公开(公告)号：US20080310975A1
公开(公告)日：2008-12-18
申请号：US12126925
申请日：2008-05-25
IPC分类号： F04B17/00
摘要： The present invention provides systems, methods, and apparatus for abating effluent from an electronic device manufacturing system using cogeneration. The invention includes a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber; a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber. The turbine is adapted to generate power which is applied to operate the pump. Numerous additional aspects are disclosed.
摘要翻译： 本发明提供了用于减少来自使用热电联产的电子装置制造系统的流出物的系统，方法和装置。 本发明包括适于联接到处理室并适于从处理室抽出流出物的泵; 反应室，其耦合到所述泵并适于从所述泵接收流出物; 以及联接到反应室并适于由来自反应室的燃烧气体驱动的涡轮机。 涡轮机适于产生用于操作泵的动力。 公开了许多附加方面。
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7.发明授权Methods and apparatus for assembling and operating electronic device manufacturing systems 失效组装和操作电子设备制造系统的方法和装置公开(公告)号：US08455368B2
公开(公告)日：2013-06-04
申请号：US12126922
申请日：2008-05-25
申请人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Jay J. Jung , Roger M. Johnson , Youssef A. Loldj , James L. Smith
发明人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Jay J. Jung , Roger M. Johnson , Youssef A. Loldj , James L. Smith
IPC分类号： H01L21/00
CPC分类号： G05B19/4184 , G05B2219/31386 , G05B2219/45026 , Y02P90/04 , Y02P90/14 , Y10T29/49826 , Y10T29/53048
摘要： A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.
摘要翻译： 提供了一种用于操作一个或多个电子设备制造系统的方法，包括以下步骤：1）使用工艺工具执行一系列电子设备制造工艺步骤，其中所述工艺工具产生流出物作为执行所述一系列工艺步骤的副产品; 2）用减排工具减轻废水; 3）从第一减排资源提供给减排工具的减排资源; 4）将减排资源供应从第一减排资源供应改为第二减排资源供应，其中改变减排资源供应包括：i）中断来自第一减排资源供应的减排资源的流动; 和ii）从第二减排资源供应开始减排资源的流动; 5）在改变和改变减排资源供应的同时，继续与流程工具一起执行一系列流程步骤。
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8.发明申请METHODS AND APPARATUS FOR ASSEMBLING AND OPERATING ELECTRONIC DEVICE MANUFACTURING SYSTEMS 失效组装和操作电子设备制造系统的方法和装置公开(公告)号：US20080289167A1
公开(公告)日：2008-11-27
申请号：US12126922
申请日：2008-05-25
申请人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Jay J. Jung , Roger M. Johnson , Youssef A. Loldj , James L. Smith
发明人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Jay J. Jung , Roger M. Johnson , Youssef A. Loldj , James L. Smith
IPC分类号： B23P11/00
CPC分类号： G05B19/4184 , G05B2219/31386 , G05B2219/45026 , Y02P90/04 , Y02P90/14 , Y10T29/49826 , Y10T29/53048
摘要： A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.
摘要翻译： 提供了一种用于操作一个或多个电子设备制造系统的方法，包括以下步骤：1）使用工艺工具执行一系列电子设备制造工艺步骤，其中所述工艺工具产生流出物作为执行所述一系列工艺步骤的副产品; 2）用减排工具减轻废水; 3）从第一减排资源提供给减排工具的减排资源; 4）将减排资源供应从第一减排资源供应改为第二减排资源供应，其中改变减排资源供应包括：i）中断来自第一减排资源供应的减排资源的流动; 和ii）从第二减排资源供应开始减排资源的流动; 5）在改变和改变减排资源供应的同时，继续与流程工具一起执行一系列流程步骤。
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公开(公告)号：US07736600B2
公开(公告)日：2010-06-15
申请号：US11555056
申请日：2006-10-31
IPC分类号： B01D50/00
CPC分类号： B01D53/38 , B01D53/68 , B01D53/74 , B01D53/79 , B01D53/8659 , B01D53/8662 , B01D2251/104 , B01D2251/106 , B01D2251/2062 , B01D2258/0216 , C23C16/4412 , F23C7/02 , F23D2900/00016 , F23G7/065 , F23M5/00
摘要： A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous section of the interior porous wall.
摘要翻译： 提供了一种在减少半导体制造过程中使用的热反应器，包括热反应单元，其具有限定中心室的内部多孔壁，所述内部多孔壁由多个堆叠的多孔部分形成; 至少一个气体入口与中心室流体连通并且适于将气体废物流引入中心室; 位于中心室内的热机构，其适于分解中心室内的气态废物流，从而形成反应产物; 以及流体输送系统，其适于通过内部多孔壁以足够的力向中心室提供流体，以减少反应产物在中心室的内部多孔壁的内表面上的沉积; 其中所述多孔部分中的至少一个具有以下一种或多种：在所述多孔部分内变化的性质; 以及与内部多孔壁的至少另一个多孔部分的性质不同的性质。
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10.发明申请METHODS AND APPARATUS FOR HEATING REAGENTS AND EFFLUENTS IN ABATEMENT SYSTEMS 审中-公开在加热系统中加热试剂和废水的方法和装置公开(公告)号：US20090252664A1
公开(公告)日：2009-10-08
申请号：US12372729
申请日：2009-02-17
CPC分类号： H01L21/67103
摘要： In some aspects, an apparatus for abating effluent from an electronic device manufacturing process tool is provided, including: a reaction chamber adapted to receive an effluent; and a reagent heating apparatus in fluid connection with the reaction chamber; wherein the reagent heating apparatus is adapted to heat a reagent and to introduce the heated reagent into a heated reagent reaction zone of the reaction chamber; and wherein the reaction chamber is further adapted to mix the effluent and the heated reagent in the heated reagent reaction zone. Other apparatus and methods are disclosed.
摘要翻译： 在一些方面，提供了一种用于减轻来自电子设备制造工艺工具的流出物的设备，包括：适于接收流出物的反应室; 以及与所述反应室流体连接的试剂加热装置; 其中所述试剂加热装置适于加热试剂并将加热的试剂引入反应室的加热试剂反应区; 并且其中所述反应室还适于将所述流出物和所述加热的试剂混合在所述加热的试剂反应区中。 公开了其他装置和方法。
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