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1.发明授权Systems and methods for treating flammable effluent gases from manufacturing processes 有权用于处理来自制造过程的易燃废气的系统和方法公开(公告)号：US09387428B2
公开(公告)日：2016-07-12
申请号：US12365886
申请日：2009-02-04
CPC分类号： B01D53/005 , B01D53/40 , B01D2257/108 , B01D2258/0216
摘要： A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.
摘要翻译： 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。
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2.发明申请METHODS AND SYSTEMS FOR DESIGNING AND VALIDATING OPERATION OF ABATEMENT SYSTEMS 审中-公开用于设计和确认退休系统操作的方法和系统公开(公告)号：US20090018688A1
公开(公告)日：2009-01-15
申请号：US12139472
申请日：2008-06-14
申请人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Belynda Flippo , Mehran Moalem , Charles Murray
发明人： Phil Chandler , Daniel O. Clark , Robbert M. Vermeulen , Belynda Flippo , Mehran Moalem , Charles Murray
IPC分类号： G06F19/00
CPC分类号： B01D53/346 , B01D2258/0216
摘要： A method of developing an integrated abatement system is provided, including the steps: a) determining whether an integrated abatement system meets a destruction removal efficiency standard wherein the determination includes the steps: i) operating an electronic device manufacturing process tool using a best known method, whereby effluent containing a target species is produced; ii) abating the target species to form abated effluent, using an abatement system which is coupled to the process tool; and iii) calculating a destruction removal efficiency for the target species; and b) modifying the abatement system by altering at least one of a design parameter and an operating parameter of the abatement system to improve the destruction removal efficiency. Numerous other aspects are provided.
摘要翻译： 提供了一种开发集成减排系统的方法，包括步骤：a）确定综合减排系统是否满足销毁去除效率标准，其中确定包括以下步骤：i）使用最佳已知方法操作电子设备制造工艺工具 由此产生含有目标物种的流出物; ii）使用与处理工具相连的减排系统来减轻目标物种以形成减排的流出物; 和iii）计算目标物种的破坏去除效率; 以及b）通过改变所述减排系统的设计参数和操作参数中的至少一个来改进所述减排系统，以提高所述破坏去除效率。 提供了许多其他方面。
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3.发明申请SYSTEMS AND METHODS FOR TREATING FLAMMABLE EFFLUENT GASES FROM MANUFACTURING PROCESSES 有权用于从制造过程中处理易燃气体的系统和方法公开(公告)号：US20090216061A1
公开(公告)日：2009-08-27
申请号：US12365886
申请日：2009-02-04
CPC分类号： B01D53/005 , B01D53/40 , B01D2257/108 , B01D2258/0216
摘要： A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.
摘要翻译： 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。
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4.发明申请公开(公告)号：US20090238972A1
公开(公告)日：2009-09-24
申请号：US12410063
申请日：2009-03-24
申请人： Daniel O. Clark , Mehran Moalem , Robbert M. Vermeulen , Yong Kee Chae , Charles Gay , John M. White , Robert Z. Bachrach , Jay J. Jung
发明人： Daniel O. Clark , Mehran Moalem , Robbert M. Vermeulen , Yong Kee Chae , Charles Gay , John M. White , Robert Z. Bachrach , Jay J. Jung
IPC分类号： C23C16/42
CPC分类号： C23C16/24 , C23C16/4402 , C23C16/4412 , C23C16/45593
摘要： In one aspect, a method of forming a silicon layer on a substrate is provided, including the steps providing a substrate; and introducing hydrogen and silane into a chamber containing the substrate such that a layer of silicon is deposited on the substrate; wherein the silane is less than about 99.999% pure. Numerous other aspects are provided.
摘要翻译： 一方面，提供了在基板上形成硅层的方法，包括提供基板的步骤; 并将氢和硅烷引入到含有所述衬底的室中，使得硅层沉积在所述衬底上; 其中所述硅烷的纯度小于约99.999％。 提供了许多其他方面。
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公开(公告)号：US20080290041A1
公开(公告)日：2008-11-27
申请号：US12126920
申请日：2008-05-25
申请人： Daniel O. Clark , Robbert M. Vermeulen , Youssef A. Loldj , Belynda Flippo , Mehran Moalem , Shaun W. Crawford
发明人： Daniel O. Clark , Robbert M. Vermeulen , Youssef A. Loldj , Belynda Flippo , Mehran Moalem , Shaun W. Crawford
IPC分类号： G05B11/00
摘要： A method of operating an electronic device manufacturing system is provided which includes the steps of receiving information with an interface, wherein the information relates to an abatement system, and shutting down a process tool and an abatement tool in response to the information.
摘要翻译： 提供了一种操作电子设备制造系统的方法，其包括以界面接收信息的步骤，其中所述信息涉及减排系统，以及响应于所述信息关闭处理工具和减排工具。
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公开(公告)号：US20100192773A1
公开(公告)日：2010-08-05
申请号：US12696808
申请日：2010-01-29
申请人： Daniel O. Clark , Colin John Dickinson , Jay J. Jung , Daniel Stephan Brown , Mehran Moalem , Frank F. Hooshdaran , Morteza Farnia , Barry Page , Gary Sypherd , Jonathan Dahm , Phil Chandler
发明人： Daniel O. Clark , Colin John Dickinson , Jay J. Jung , Daniel Stephan Brown , Mehran Moalem , Frank F. Hooshdaran , Morteza Farnia , Barry Page , Gary Sypherd , Jonathan Dahm , Phil Chandler
CPC分类号： B01D47/027 , B01D47/06 , B01D53/185 , B01D53/40 , B01D53/78 , B01D2251/604 , B01D2251/80 , B01D2258/0216
摘要： Embodiments of an abatement apparatus are disclosed herein. In some embodiments, an abatement apparatus may include a scrubber configured to receive an effluent stream from a process chamber and further configured to remove first particles from the effluent stream; a scrubber conduit coupled to the scrubber to receive the effluent stream therefrom and configured to remove second particles from the effluent stream, the scrubber conduit having one or more inlets configured to provide a fluid to sufficiently wet an interior surface of the scrubber conduit to trap the second particles thereon and to wash the second particles therealong; and a central scrubber coupled to the scrubber via the scrubber conduit. In some embodiments, the scrubber conduit is downward sloping from the scrubber to the central scrubber. In some embodiments, a plurality of scrubbers may be coupled to the central scrubber via a plurality of scrubber conduits.
摘要翻译： 减轻装置的实施例在此公开。 在一些实施例中，减排装置可以包括洗涤器，其构造成从处理室接收流出物流，并进一步构造成从排出物流中除去第一颗粒; 洗涤器管道，其耦合到洗涤器以接收来自其的流出物流，并被配置为从流出物流中除去第二颗粒，洗涤器管道具有一个或多个入口，其配置成提供流体以充分地润湿洗涤器管道的内表面， 第二颗粒在其上并在其上洗涤第二颗粒; 以及通过洗涤器管道耦合到洗涤器的中央洗涤器。 在一些实施例中，洗涤器导管从洗涤器向下倾斜到中央洗涤器。 在一些实施例中，多个洗涤器可以经由多个洗涤器管道耦合到中央洗涤器。
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7.发明申请METHODS AND APPARATUS FOR REDUCING THE CONSUMPTION OF REAGENTS IN ELECTRONIC DEVICE MANUFACTURING PROCESSES 审中-公开减少电子设备制造过程中试剂消耗的方法和装置公开(公告)号：US20090017206A1
公开(公告)日：2009-01-15
申请号：US12140055
申请日：2008-06-16
CPC分类号： C23C16/4412 , C23C16/45593
摘要： A substrate coating system is provided which includes a substrate coating chamber; a gas box connected to the coating chamber and adapted to provide reagent gases to the coating chamber; and a reagent reclaim system connected to the substrate coating chamber and the gas box, wherein the reagent reclaim system includes a wet scrubber connected to the coating chamber; a polisher connected to the wet scrubber; and a dryer connected to the polisher and the gas box.
摘要翻译： 提供了一种基材涂布系统，其包括基材涂布室; 连接到所述涂覆室并适于向所述涂覆室提供试剂气体的气体箱; 以及连接到所述基板涂覆室和所述气体箱的试剂回收系统，其中所述试剂回收系统包括连接到所述涂覆室的湿式洗涤器; 与湿式洗涤器连接的抛光机; 和连接到抛光机和气箱的干燥机。
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公开(公告)号：US08747762B2
公开(公告)日：2014-06-10
申请号：US12957539
申请日：2010-12-01
IPC分类号： B01J19/08
CPC分类号： B01D53/32 , B01D53/92 , B01D2258/0216 , B01D2259/122 , B01D2259/80 , B01D2259/818 , C23C16/4412
摘要： Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas upstream of the foreline.
摘要翻译： 本文提供了用于处理衬底处理系统的前级管线中的废气的方法和装置。 在一些实施例中，用于处理衬底处理系统的前级管线中的废气的装置包括耦合到处理室的前级管线的等离子体源，耦合到等离子体源上游的前级管线的试剂源和前级气体注入 前级管线注入套件包括用于设定前级气体输送压力设定点的压力调节器，以及耦合以监测前级管线上游气体的输送压力的第一压力表， 。
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公开(公告)号：US09080576B2
公开(公告)日：2015-07-14
申请号：US13359899
申请日：2012-01-27
申请人： Youssef Loldj , Jay J. Jung , Mehran Moalem , Paul E. Fisher , Joshua Putz , Andreas Neuber
发明人： Youssef Loldj , Jay J. Jung , Mehran Moalem , Paul E. Fisher , Joshua Putz , Andreas Neuber
CPC分类号： F04D27/004 , F04D19/04 , F17D3/00 , H01L21/67017 , H01L21/6719 , H01L21/67253 , Y10T137/0396
摘要： Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.
摘要翻译： 本文提供了用于控制处理系统的方法和装置。 在一些实施例中，一种控制处理系统的方法可以包括以选择为将处理室维持在等于第一基准泵空闲压力的压力的第一基准泵空转速度下操作联接到处理室的真空泵; 在第一基准泵怠速下操作真空泵时监测处理室中的压力; 以及当所述真空泵以所述第一基准泵怠速运转时，确定所述处理室中是否能够维持所述第一基准泵怠速压力。
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公开(公告)号：US20080014134A1
公开(公告)日：2008-01-17
申请号：US11838521
申请日：2007-08-14
申请人： Sebastien Raoux , Kuo-Chen Lin , Robbert Vermeulen , Daniel Clark , Stephen Tsu , Mehran Moalem , Allen Fox , Monique McIntosh , Joshua Putz , Eric Rieske , Poh Lee
发明人： Sebastien Raoux , Kuo-Chen Lin , Robbert Vermeulen , Daniel Clark , Stephen Tsu , Mehran Moalem , Allen Fox , Monique McIntosh , Joshua Putz , Eric Rieske , Poh Lee
CPC分类号： B01D53/8662 , B01D2257/2066 , C01B7/20 , Y02C20/30 , Y02P20/154
摘要： In some aspects, a method is provided for abating perfluorocarbons (PFCs) in a gaseous waste abatement system having a pre-installed controlled decomposition oxidation (CDO) thermal reaction chamber. The method that includes (1) providing a catalyst bed within the CDO thermal reaction chamber; and (2) introducing a gaseous waste stream into the CDO thermal reaction chamber so as to expose the gaseous waste stream to the catalyst bed. Numerous other aspects are provided.
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