Strained gettering layers for semiconductor processes
    9.
    发明授权
    Strained gettering layers for semiconductor processes 失效
    用于半导体工艺的应变吸收层

    公开(公告)号:US07202124B2

    公开(公告)日:2007-04-10

    申请号:US10956481

    申请日:2004-10-01

    IPC分类号: H01L21/8238 H01L21/322

    摘要: A method and structure for forming semiconductor structures using tensilely strained gettering layers. The method includes forming a donor wafer comprising a tensilely strained gettering layer disposed over a substrate, and at least one material layer disposed over the tensilely strained gettering layer. Additionally, the donor wafer may possess a particle-confining region proximate the tensilely strained layer. The method also includes introducing particles into the donor wafer to a depth below the surface, and accumulating at least some particles within the tensilely strained gettering layer. Next, the method includes initiating a cleaving action so as to separate at least one of the material layers form the substrate. The tensilely strained gettering layer may accumulate particles and/or point defects and reduce the implantation dose and thermal budget required for cleaving.

    摘要翻译: 使用拉伸应变吸气层形成半导体结构的方法和结构。 该方法包括形成供体晶片,其包括设置在基板上方的拉伸变应的吸气层,以及设置在拉伸变应的吸气层上的至少一个材料层。 此外,施主晶片可以具有靠近拉伸应变层的颗粒约束区域。 该方法还包括将颗粒引入供体晶片到表面下方的深度,并且在拉伸变应的吸气层内积聚至少一些颗粒。 接下来,该方法包括引发切割动作,以将至少一个材料层分离成基底。 拉伸应变吸气层可能会积聚颗粒和/或点缺陷,并减少切割所需的注射剂量和热预算。