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1.发明授权Dehumidifier, cross-flow heat exchanger and method of making a cross-flow heat exchanger 有权除湿器，横流式热交换器和制造横流式热交换器的方法公开(公告)号：US08069681B1
公开(公告)日：2011-12-06
申请号：US12016858
申请日：2008-01-18
CPC分类号： F28D7/082 , F24F3/1405 , F24F2003/1446 , F28D2021/0068 , F28F13/08 , F28F2250/106
摘要： A cross-flow heat exchanger, method of making a cross-flow heat exchanger, and a dehumidifier are provided. The cross-flow heat exchanger has an axial flow path extending through the heat exchanger from an inlet to an outlet and a transverse flow path oriented transversely to the axial flow path and extending through the heat exchanger from an inlet to an outlet. The transverse flow path is adjacent to and separate from the axial flow path. The surface area of the inlet of the axial flow path is less than the surface area of the outlet of the axial flow path. In a preferred embodiment, the heat exchanger has an exterior shape that is trapezoidal.
摘要翻译： 提供了一种横流式热交换器，制造横流式热交换器的方法和除湿器。 横流式热交换器具有从入口到出口延伸穿过热交换器的轴向流动路径和横向于轴向流动路径定向并且从入口到出口延伸穿过热交换器的横向流动路径。 横向流动路径与轴向流动路径相邻并分离。 轴向流路入口的表面积小于轴流道出口的表面面积。 在优选实施例中，热交换器具有梯形的外部形状。
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公开(公告)号：US09052132B1
公开(公告)日：2015-06-09
申请号：US13298163
申请日：2011-11-16
IPC分类号： F25D17/06
CPC分类号： F24F3/1405 , F24F2003/1446 , F24F2221/125 , F25D17/06 , F28D1/0477 , F28D7/082 , F28D2021/0068 , F28F13/08 , F28F2250/106
摘要： A cross-flow heat exchanger, method of making a cross-flow heat exchanger, and a dehumidifier are provided. The cross-flow heat exchanger has an axial flow path extending through the heat exchanger from an inlet to an outlet and a transverse flow path oriented transversely to the axial flow path and extending through the heat exchanger from an inlet to an outlet. The transverse flow path is adjacent to and separate from the axial flow path. The surface area of the inlet of the axial flow path is less than the surface area of the outlet of the axial flow path. In a preferred embodiment, the heat exchanger has an exterior shape that is trapezoidal.
摘要翻译： 提供了一种横流式热交换器，制造横流式热交换器的方法和除湿器。 横流式热交换器具有从入口到出口延伸穿过热交换器的轴向流动路径和横向于轴向流动路径定向并且从入口到出口延伸穿过热交换器的横向流动路径。 横向流动路径与轴向流动路径相邻并分离。 轴向流路入口的表面积小于轴流道出口的表面面积。 在优选实施例中，热交换器具有梯形的外部形状。
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公开(公告)号：USD570988S1
公开(公告)日：2008-06-10
申请号：US29302572
申请日：2008-01-18
申请人： David M. Cink , Vincent Yu , Kenneth C. Gehring
设计人： David M. Cink , Vincent Yu , Kenneth C. Gehring
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公开(公告)号：US08938981B2
公开(公告)日：2015-01-27
申请号：US13468852
申请日：2012-05-10
IPC分类号： F25D17/06
CPC分类号： F24F3/153 , F24F3/1405 , F24F11/0008
摘要： A dehumidification apparatus comprises an air inlet configured to receive an inlet airflow that is separated into a process airflow and a bypass airflow. An evaporator unit is operable to cool the process airflow by facilitating heat transfer from the process airflow to a flow of refrigerant as the process airflow passes through the evaporator unit. A condenser unit operable to (1) reheat the process airflow by facilitating heat transfer from the flow of refrigerant to the process airflow as the process airflow passes through a first portion of the condenser unit, and (2) heat the bypass airflow by facilitating heat transfer from the flow of refrigerant to the bypass airflow as the bypass airflow passes through a second portion of the condenser unit. The process airflow is discharged into the structure via a process airflow outlet and the bypass airflow is discharged into the structure via a bypass airflow outlet.
摘要翻译： 除湿装置包括空气入口，其构造成接收分离成过程气流和旁路气流的入口气流。 蒸发器单元可操作以在处理气流通过蒸发器单元时促进从处理气流到制冷剂流的热传递来冷却过程气流。 一种冷凝器单元，其可操作以（1）当处理气流穿过冷凝器单元的第一部分时，促进从制冷剂流向工艺空气流的热传递来再加热过程气流，以及（2）通过促进热量来加热旁路气流 当旁路气流通过冷凝器单元的第二部分时，从制冷剂流转向旁路气流。 工艺气流通过工艺气流出口排放到结构中，旁路气流通过旁路气流出口排入结构。
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公开(公告)号：US20130298579A1
公开(公告)日：2013-11-14
申请号：US13468852
申请日：2012-05-10
CPC分类号： F24F3/153 , F24F3/1405 , F24F11/0008
摘要： A dehumidification apparatus comprises an air inlet configured to receive an inlet airflow that is separated into a process airflow and a bypass airflow. An evaporator unit is operable to cool the process airflow by facilitating heat transfer from the process airflow to a flow of refrigerant as the process airflow passes through the evaporator unit. A condenser unit operable to (1) reheat the process airflow by facilitating heat transfer from the flow of refrigerant to the process airflow as the process airflow passes through a first portion of the condenser unit, and (2) heat the bypass airflow by facilitating heat transfer from the flow of refrigerant to the bypass airflow as the bypass airflow passes through a second portion of the condenser unit. The process airflow is discharged into the structure via a process airflow outlet and the bypass airflow is discharged into the structure via a bypass airflow outlet.
摘要翻译： 除湿装置包括空气入口，其构造成接收分离成过程气流和旁路气流的入口气流。 蒸发器单元可操作以在处理气流通过蒸发器单元时促进从处理气流到制冷剂流的热传递来冷却过程气流。 一种冷凝器单元，其可操作以（1）当处理气流穿过冷凝器单元的第一部分时，促进从制冷剂流向工艺空气流的热传递来再加热过程气流，以及（2）通过促进热量来加热旁路气流 当旁路气流通过冷凝器单元的第二部分时，从制冷剂流转向旁路气流。 工艺气流通过工艺气流出口排放到结构中，旁路气流通过旁路气流出口排入结构。
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公开(公告)号：US08383322B2
公开(公告)日：2013-02-26
申请号：US11427017
申请日：2006-06-28
申请人： Ching-Yu Chang , Vincent Yu
发明人： Ching-Yu Chang , Vincent Yu
IPC分类号： G03F7/26
CPC分类号： G03F7/2041 , G03F7/70341
摘要： A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an immersion lithography exposure system. The immersion lithography exposure system utilizes a fluid during exposure and may be capable of removing some, but not all, of the fluid after exposure. After exposure, a treatment process is used to neutralize the effect of undesired elements that diffused into the resist layer during the immersion exposure. After treatment, a post-exposure bake and a development step are used.
摘要翻译： 在半导体衬底上进行浸渍光刻的方法包括在半导体衬底的表面上提供抗蚀剂层并使用浸没光刻曝光系统曝光抗蚀剂层。 浸没式光刻曝光系统在曝光期间利用流体，并且可以在曝光后能够去除一些但不是全部的流体。 曝光后，使用处理工艺来中和在浸没曝光期间扩散到抗蚀剂层中的不期望的元素的影响。 处理后，使用曝光后烘烤和显影步骤。
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公开(公告)号：US07691559B2
公开(公告)日：2010-04-06
申请号：US11337986
申请日：2006-01-24
申请人： Ching-Yu Chang , C. C. Ke , Vincent Yu
发明人： Ching-Yu Chang , C. C. Ke , Vincent Yu
CPC分类号： G03F7/2041 , G03F7/162 , G03F7/168 , G03F7/70341 , H01L21/67051 , H01L21/6708 , H01L21/6715
摘要： A method of performing immersion lithography on a semiconductor wafer is provided. The method includes providing a layer of resist onto a surface of the semiconductor wafer. Next, an edge-bead removal process spins the wafer at a speed greater than 1000 revolutions per minute and dispenses solvent through a nozzle while the wafer is spinning. Then, the resist layer is exposed using an immersion lithography exposure system.
摘要翻译： 提供了在半导体晶片上进行浸渍光刻的方法。 该方法包括在半导体晶片的表面上提供一层抗蚀剂。 接下来，边缘珠去除过程以大于1000转/分钟的速度旋转晶片，并且在晶片旋转时通过喷嘴分配溶剂。 然后，使用浸没式光刻曝光系统曝光抗蚀剂层。
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公开(公告)号：USD681440S1
公开(公告)日：2013-05-07
申请号：US29393073
申请日：2011-05-31
申请人： Vincent Yu
设计人： Vincent Yu
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公开(公告)号：USD674058S1
公开(公告)日：2013-01-08
申请号：US29419788
申请日：2012-05-01
申请人： Vincent Yu
设计人： Vincent Yu
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公开(公告)号：US20090103068A1
公开(公告)日：2009-04-23
申请号：US11875471
申请日：2007-10-19
申请人： Vincent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
发明人： Vincent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
CPC分类号： G03F7/70833 , G03F7/70258 , G03F7/70641 , G03F7/70858
摘要： Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.
摘要翻译： 提供一种包括可变聚焦装置的曝光装置。 可变聚焦装置可以包括可能在存在电场的情况下变形的透明膜。 透明膜的变形可以允许改变辐射束的聚焦长度。 在一个实施例中，可调制可变聚焦装置，使得具有第一聚焦长度的辐射束用于曝光目标上的第一位置，并且为曝光目标上的第二位置提供具有第二焦距的辐射束 。 还提供了一种方法和计算机可读介质。
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