公开(公告)号：US06207028B1

公开(公告)日：2001-03-27

申请号：US09371605

申请日：1999-08-10

申请人： Dieter Haas ,  Wolfgang Buschbeck ,  Jörg Krempel-Hesse

发明人： Dieter Haas ,  Wolfgang Buschbeck ,  Jörg Krempel-Hesse

IPC分类号： C23C1400

CPC分类号： H01J37/3423 ,  H01J37/3402

摘要： In a sputtering device with magnetic amplification, a magnetic field is generated by means of a permanent magnet system, whose lines of force run above and penetrate the sputtering surface, whereby the permanent magnet system is formed of two dosed, coaxial circular or oval rows (7, 8) of individual magnets (5, 5′ . . . , 6, 6′ . . . ) that are connected via a yoke (15), whereby the surface of the target (3) that faces away from the rows of permanent magnets (7, 8) is formed of two partial surfaces (3a, 3b) that form an angle to each other and whereby the edge (3c) that is formed by the two partial surfaces (3a, 3b) runs parallel to the two rows (7, 8) of permanent magnets (5, 5′ . . , 6, 6′ . . . ) and whereby an insert (14) made of ferromagnetic material is inserted between the magnetic yoke (15) and the surface of the target (3) that faces the magnetic yoke (15).

摘要翻译： 在具有磁放大的溅射装置中，通过永磁体系统产生磁场，永磁体系线的力线在其上方并穿过溅射表面，由此永磁体系统由两个定量的，同轴的圆形或椭圆形的行（ 通过轭架（15）连接的单个磁体（5,5'，...，6，6'），从而使目标（3）的远离行 永磁体（7,8）由两个彼此成角度的部分表面（3a，3b）形成，由此由两个部分表面（3a，3b）形成的边缘（3c）平行于两个 永磁体（5,5'，...，6“）的排（7,8），并且由铁磁材料制成的插入件（14）插入在磁轭（15）和 目标（3）面向磁轭（15）。

公开(公告)号：US07972486B2

公开(公告)日：2011-07-05

申请号：US11279047

申请日：2006-04-07

申请人： Hans Buchberger ,  Andreas Geiss ,  Jörg Krempel-Hesse ,  Dieter Haas

发明人： Hans Buchberger ,  Andreas Geiss ,  Jörg Krempel-Hesse ,  Dieter Haas

IPC分类号： C23C14/34

CPC分类号： C23C14/56 ,  H01J37/32431 ,  H01J37/32458

摘要： A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.

摘要翻译： 用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。 每个模块1具有腔室部分2，可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3，以及可移除地布置在第一支撑件3处的第二支撑件4.而第一支撑件3承载阴极 ，第二支撑件4形成为盖，在该盖处布置有用于在涂覆室中产生真空的泵。 载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a，11b。 以这种方式，机器的组件容易接近，例如用于维护目的。 可以在阴极和室内同时进行工作。

公开(公告)号：US09206512B2

公开(公告)日：2015-12-08

申请号：US13528906

申请日：2012-06-21

申请人： Hanh D. Nguyen ,  Majeed A. Foad ,  Dieter Haas ,  Karl J. Armstrong ,  Xiaoxiong Yuan

发明人： Hanh D. Nguyen ,  Majeed A. Foad ,  Dieter Haas ,  Karl J. Armstrong ,  Xiaoxiong Yuan

IPC分类号： C23C16/455 ,  F17D1/00

CPC分类号： C23C16/455 ,  C23C16/45565 ,  F17D1/00 ,  Y10T137/8593

摘要： In some embodiments, a gas distribution system may include a body disposed within a through hole formed in a process chamber body, the body comprising an opening, wherein an outer surface of the body is disposed a first distance from an inner surface of the through hole to form a first gap; a flange disposed proximate a first end of the body, the flange having an outer dimension greater than an inner dimension of the through hole; a showerhead disposed proximate a second end of the body opposite the first end and extending outwardly from the body to overlap a portion of the process chamber body, the showerhead configured to allow a flow of gas to an inner volume of the process chamber, wherein an outer surface of the showerhead is disposed a second distance from an inner surface of the process chamber body to form a second gap.

摘要翻译： 在一些实施例中，气体分配系统可以包括设置在形成在处理室主体中的通孔内的主体，主体包括开口，其中主体的外表面与通孔的内表面第一距离设置 形成第一个差距; 靠近所述主体的第一端设置的凸缘，所述凸缘具有大于所述通孔的内部尺寸的外部尺寸; 淋浴头，其设置在所述主体的与所述第一端相对的第二端附近并且从所述主体向外延伸以与所述处理室主体的一部分重叠，所述喷头构造成允许气体流动到所述处理室的内部容积，其中， 淋浴喷头的外表面与处理室主体的内表面设置成第二距离，以形成第二间隙。

公开(公告)号：US08218224B2

公开(公告)日：2012-07-10

申请号：US12772930

申请日：2010-05-03

申请人： Byung-Sung Leo Kwak ,  Dieter Haas ,  Stefan Bangert ,  Nety M. Krishna ,  Winfried Hoffmann

发明人： Byung-Sung Leo Kwak ,  Dieter Haas ,  Stefan Bangert ,  Nety M. Krishna ,  Winfried Hoffmann

IPC分类号： G02F1/15 ,  G02F1/153

CPC分类号： B32B17/10981 ,  B32B17/10045 ,  B32B17/10055 ,  B32B17/10513 ,  B32B17/10761 ,  B32B17/10788 ,  E06B3/6722 ,  E06B9/24 ,  E06B2009/2464 ,  G02F1/1533 ,  Y10S359/90 ,  Y10T156/1075 ,  Y10T156/12

摘要： A method of manufacturing electrically tintable window glass with a variety of sizes and functionalities is described. The method comprises: (a) providing a large format glass substrate; (b) fabricating a plurality of electrically tintable thin film devices on the large format glass substrate; (c) cutting the large format glass substrate into a plurality of electrically tintable pieces, each electrically tintable piece including one of the plurality of electrically tintable thin film devices; (d) providing a plurality of window glass pieces; (e) matching each one of the plurality of electrically tintable pieces with a corresponding one of the plurality of window glass pieces; and (f) laminating each of the matched electrically tintable pieces and window glass pieces. The lamination may result in the electrically tintable device either being sandwiched between the glass substrate and the window glass piece or on the surface of the laminated pieces. The electrically tintable device is an electrochromic device.

摘要翻译： 描述了制造具有各种尺寸和功能性的可着色的窗玻璃的方法。 该方法包括：（a）提供大幅面玻璃基板; （b）在大幅面玻璃基板上制造多个可着色的薄膜装置; （c）将大幅面玻璃基板切割成多个可着色的片，每个可着色的片包括多个可着色的薄膜器件中的一个; （d）提供多个窗玻璃片; （e）将所述多个电致可着色件中的每一个与所述多个窗玻璃件中的相应一个匹配; 和（f）层合每个匹配的可着色件和窗玻璃片。 层压可能导致可着色的装置夹在玻璃基板和窗玻璃片之间或层压片的表面上。 电致色装置是电致变色装置。

公开(公告)号：US20070022955A1

公开(公告)日：2007-02-01

申请号：US11384016

申请日：2006-03-17

申请人： Marcus Bender ,  Uwe Hoffmann ,  Gunter Klemm ,  Dieter Haas ,  Ulrich Englert

发明人： Marcus Bender ,  Uwe Hoffmann ,  Gunter Klemm ,  Dieter Haas ,  Ulrich Englert

IPC分类号： C23C16/00

CPC分类号： C23C14/26 ,  C23C14/243

摘要： A vapor deposition device for the vapor deposition of a substrate, and specifically particular of a substrate comprising heat-sensitive substances, for example OLEDs. To keep heat away from these substances, the vapor deposition device includes an evaporator tube with a special nozzle bar. This nozzle bar, which comprises several linearly arranged openings, projects with respect to the evaporator tube in the direction toward the substrate to be coated.

摘要翻译： 一种用于气相沉积基底的气相沉积装置，特别是包括热敏物质的基底，例如OLED。 为了将热量远离这些物质，气相沉积装置包括具有特殊喷嘴杆的蒸发器管。 该喷嘴杆包括几个线性排列的开口，相对于蒸发器管沿着待涂覆的基板的方向突出。

公开(公告)号：US20060032846A1

公开(公告)日：2006-02-16

申请号：US11186326

申请日：2005-07-21

申请人： Dieter Haas

发明人： Dieter Haas

IPC分类号： H05B3/10

CPC分类号： H05B3/0033 ,  H05B2203/032

摘要： The present invention relates to an infrared heating element and a substrate heater type vacuum chamber, particularly for vacuum coating facilities. The infrared heating element comprises a heating source which is surrounded by a protective means designed as a tubular metal jacket. The tubular metal jacket is provided at least to an extent with an infrared-emitting layer. The vacuum chamber comprises a substrate and at least one heating element that is designed as an infrared heating element, the substrate and infrared heating element being thermally decoupled in such a way that only thermal radiation contributes toward heating.

摘要翻译： 本发明涉及红外加热元件和基板加热器型真空室，特别是用于真空镀膜设备。 红外加热元件包括被设计为管状金属护套的保护装置包围的加热源。 管状金属护套至少在一定程度上设置有红外线发射层。 真空室包括衬底和设计为红外加热元件的至少一个加热元件，衬底和红外加热元件以仅仅热辐射有助于加热的方式进行热分离。

公开(公告)号：US20130255076A1

公开(公告)日：2013-10-03

申请号：US13898912

申请日：2013-05-21

申请人： Byung-Sung Kwak ,  Stefan Bangert ,  Dieter Haas ,  Omkaram Nalamasu

发明人： Byung-Sung Kwak ,  Stefan Bangert ,  Dieter Haas ,  Omkaram Nalamasu

IPC分类号： H01M10/04

CPC分类号： H01M10/0404 ,  H01M4/621 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585 ,  Y02E60/122 ,  Y02P70/54 ,  Y10T29/52

摘要： Methods of and factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A factory includes one or more tool sets for fabricating a thin-film battery.

摘要翻译： 描述了薄膜电池制造的方法和工厂。 一种方法包括制造薄膜电池的操作。 工厂包括用于制造薄膜电池的一个或多个工具组。

公开(公告)号：US20080295773A1

公开(公告)日：2008-12-04

申请号：US12108320

申请日：2008-04-23

申请人： Dieter Haas ,  Thomas Berger ,  Simon Lau

发明人： Dieter Haas ,  Thomas Berger ,  Simon Lau

IPC分类号： C23C16/54

CPC分类号： H01L21/68714 ,  H01L21/68 ,  Y10T29/49998

摘要： A substrate support for supporting a substrate in a processing chamber comprises a frame for carrying the substrate, at least a first fastening means fixedly attached to the frame for aligning the substrate relative to the frame, and at least a second fastening means movably attached to the frame, the second fastening means being movable relative to the frame and/or the substrate. Furthermore, a processing device comprises an edge exclusion projecting over a portion of the surface of the substrate in order to prevent processing of the portion of the surface of the substrate. A part of the edge exclusion may be moved into a gap between the edge(s) of the substrate and the frame element of the substrate support to form a labyrinth seal between the frame element and the edge of the substrate. A method of placing the substrate on the substrate support is also disclosed.

摘要翻译： 用于在处理室中支撑衬底的衬底支撑件包括用于承载衬底的框架，至少一个固定地连接到框架上用于使衬底相对于框架对准的第一紧固装置，以及至少一个第二紧固装置， 第二紧固装置可相对于框架和/或基板移动。 此外，处理装置包括在衬底表面的一部分上突出的边缘排除，以防止衬底的表面部分的处理。 边缘排除的一部分可以移动到基板的边缘和基板支撑件的框架元件之间的间隙中，以在框架元件和基板的边缘之间形成迷宫式密封。 还公开了将衬底放置在衬底支撑件上的方法。

公开(公告)号：US20070144889A1

公开(公告)日：2007-06-28

申请号：US11580721

申请日：2006-10-13

申请人： Erkan Koparal ,  Dieter Haas

发明人： Erkan Koparal ,  Dieter Haas

IPC分类号： C23C14/32 ,  C23C14/00 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C14/568

摘要： A machine 1 for treating substrates S comprises an infeed area 6, at least a first process chamber 2, a second process chamber 3, a third process chamber 4, and a fourth process chamber 8 for the execution of a treatment, for example the application of a coating to a substrate S for coating, as well as an outfeed area 7. The four process chambers 2,3, 4 and 8 are connected to a central transport chamber 5. The first process chamber 2 fourth process chamber 8 are each arranged between one of the lock areas 6 or 7 and the central transport chamber 5 in series. The second process chamber 3 and the third process chamber 4 are connected in parallel and independently accessible from each other to the central transport chamber. The treatment method comprises the stages: a) infeed of a substrate into the machine 1; b) transport of the substrate S into the first process chamber 2 and execution of a first treatment stage; c) transport of the substrate S into the central transport chamber 5; d) transport of the substrate S alternatively into the second process chamber 3 or the third process chamber 4, and execution of a second treatment stage; e) transport of the substrate S into the central transport chamber 5; and g) outfeed of the substrate S from the machine 1.

摘要翻译： 用于处理基板S的机器1包括进给区域6，至少第一处理室2，第二处理室3，第三处理室4和用于执行处理的第四处理室8，例如应用 涂布到用于涂布的基材S上的涂层以及出料区域7。 四个处理室2,3,4和8连接到中央传送室5。 第一处理室2的第四处理室8分别布置在锁定区域6或7中的一个和中央传送室5之间。 第二处理室3和第三处理室4并联连接并且彼此独立地接近中央传送室。 处理方法包括以下阶段：a）将基材送入机器1; b）将基板S输送到第一处理室2中并执行第一处理台; c）将衬底S运送到中央传送室5中; d）将衬底S交替地输送到第二处理室3或第三处理室4中，并执行第二处理阶段; e）将衬底S运送到中央传送室5中; 和g）从机器1输出基片S.

公开(公告)号：US06829932B2

公开(公告)日：2004-12-14

申请号：US10202008

申请日：2002-07-25

申请人： Robert Laun ,  Dieter Haas

发明人： Robert Laun ,  Dieter Haas

IPC分类号： G01F2328

CPC分类号： G01F23/2965 ,  G01F23/284

摘要： In order to detect a filling process, a signal is emitted into the container and an echo reflected from the container is recorded. At least one parameter, e.g., the amplitude h(t) of the reflected echo at a time t, is determined, and a filling process is detected if the parameter lies outside an expected range.

摘要翻译： 为了检测填充过程，信号被发射到容器中并记录从容器反射的回波。 确定至少一个参数，例如在时间t的反射回波的振幅h（t），并且如果参数在预期范围之外，则检测填充处理。