Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
    1.
    发明申请
    Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same 有权
    光敏树脂组合物,薄膜晶体管基板的制造方法以及使用该薄膜晶体管基板的公共电极基板的制造方法

    公开(公告)号:US20060275700A1

    公开(公告)日:2006-12-07

    申请号:US11445846

    申请日:2006-06-02

    IPC分类号: G03C1/00

    摘要: A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.

    摘要翻译: 用于有机层图案的感光性树脂组合物包括约100重量份的丙烯酸类共聚物和约5至约100重量份的1,2-醌二叠氮化合物。 基于丙烯酸类的共聚物通过基于丙烯酸类共聚物的总重量共聚约5至约60重量%的基于羧酸异冰片的化合物来制备,约10至约30重量%的不饱和化合物携带 约20至约40重量%的烯烃基不饱和化合物,和约10至约40重量%的选自不饱和羧酸,不饱和羧酸酐及其混合物的一种。 还提供了使用该感光性树脂组合物制造TFT基板和公共电极基板的方法。 有利地,有机层图案可以具有具有改进的局部平坦度而没有凹凸结构的山体结构。

    Resin composition for organic insulating layer, method of manufacturing resin composition, and display panel including resin composition
    2.
    发明授权
    Resin composition for organic insulating layer, method of manufacturing resin composition, and display panel including resin composition 有权
    有机绝缘层用树脂组合物,树脂组合物的制造方法以及包含树脂组合物的显示面板

    公开(公告)号:US07879961B2

    公开(公告)日:2011-02-01

    申请号:US11670700

    申请日:2007-02-02

    IPC分类号: C08F4/04

    摘要: Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

    摘要翻译: 本发明公开了一种有机绝缘层用树脂组合物及其制造方法以及使用该树脂组合物形成的绝缘层的显示面板。 用于有机绝缘层的树脂组合物通过将约5至约35重量%的不饱和羧酸,不饱和羧酸酐或不饱和羧酸和不饱和羧酸酐的混合物聚合为约5至约 40重量%的苯乙烯化合物,约5至约40重量%的环氧化合物,约0.1至约10重量%的异冰片基化合物和约20至约40重量%的二环戊二烯化合物,基于总重量 的不饱和羧酸,不饱和羧酸酐,苯乙烯化合物,异冰片基化合物和二环戊二烯化合物。

    Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
    3.
    发明授权
    Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same 有权
    光敏树脂组合物,薄膜晶体管基板的制造方法以及使用该薄膜晶体管基板的公共电极基板的制造方法

    公开(公告)号:US07799509B2

    公开(公告)日:2010-09-21

    申请号:US11445846

    申请日:2006-06-02

    IPC分类号: G03F7/30 G03F7/023

    摘要: A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.

    摘要翻译: 用于有机层图案的感光性树脂组合物包括约100重量份的丙烯酸类共聚物和约5至约100重量份的1,2-醌二叠氮化合物。 基于丙烯酸类的共聚物通过基于丙烯酸类共聚物的总重量共聚约5至约60重量%的基于羧酸异冰片的化合物来制备,约10至约30重量%的不饱和化合物携带 约20至约40重量%的烯烃基不饱和化合物,和约10至约40重量%的选自不饱和羧酸,不饱和羧酸酐及其混合物的一种。 还提供了使用该感光性树脂组合物制造TFT基板和公共电极基板的方法。 有利地,有机层图案可以具有具有改进的局部平坦度而没有凹凸结构的山体结构。

    Photoresist composition for multi-micro nozzle head coater
    4.
    发明授权
    Photoresist composition for multi-micro nozzle head coater 有权
    用于多微喷嘴头涂布机的光刻胶组合物

    公开(公告)号:US07378230B2

    公开(公告)日:2008-05-27

    申请号:US10750845

    申请日:2004-01-05

    IPC分类号: G03F7/32 G03F7/023

    CPC分类号: G03F7/0236 G03F7/0048

    摘要: The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

    摘要翻译: 本发明涉及一种用于MMN(多微喷嘴)喷涂机的光致抗蚀剂组合物,更具体地说涉及一种光致抗蚀剂组合物,其包含分子量范围为2000-12,000的酚醛清漆树脂,二叠氮光敏化合物,有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题,并且改善了涂布特性,从而可以在工业上得到利用并且预期显着提高生产率 。

    Apparatuses for overlaying images, portable devices having the same and methods of overlaying images
    6.
    发明授权
    Apparatuses for overlaying images, portable devices having the same and methods of overlaying images 有权
    用于覆盖图像的装置,具有相同的便携式装置以及重叠图像的方法

    公开(公告)号:US08120623B2

    公开(公告)日:2012-02-21

    申请号:US12225099

    申请日:2007-03-15

    IPC分类号: G09G5/00

    摘要: An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.

    摘要翻译: 覆盖图像的装置包括广播图像层生成器,应用图像层生成器和覆盖处理器。 广播图像层发生器基于接收到的广播信号生成广播图像层。 应用图像层生成器基于应用图像生成应用图像层。 覆盖处理器生成通过将广播图​​像层与应用图像层重叠而获得的覆盖图像,从而可以在屏幕上同时显示与广播图像层对应的广播图像和与应用图像层对应的应用图像。 广播图像和应用图像可以在屏幕上同时显示,并且当便携式设备执行多重任务时,可以基于用户的偏好和用户的识别能力来增强应用图像中的文本的可视性和可读性 程序同时执行。

    Apparatuses For Overlaying Images, Portable Devices Having The Same And Methods Of Overlaying Images
    7.
    发明申请
    Apparatuses For Overlaying Images, Portable Devices Having The Same And Methods Of Overlaying Images 有权
    用于覆盖图像的装置,具有相同的便携式设备和覆盖图像的方法

    公开(公告)号:US20090033680A1

    公开(公告)日:2009-02-05

    申请号:US12225099

    申请日:2007-03-15

    IPC分类号: G09G5/00 G09G5/02

    摘要: An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.

    摘要翻译: 覆盖图像的装置包括广播图像层生成器,应用图像层生成器和覆盖处理器。 广播图像层发生器基于接收到的广播信号生成广播图像层。 应用图像层生成器基于应用图像生成应用图像层。 覆盖处理器生成通过将广播图​​像层与应用图像层重叠而获得的覆盖图像,从而可以在屏幕上同时显示与广播图像层对应的广播图像和与应用图像层对应的应用图像。 广播图像和应用图像可以在屏幕上同时显示,并且当便携式设备执行多重任务时,可以基于用户的偏好和用户的识别能力来增强应用图像中的文本的可视性和可读性 程序同时执行。

    Photoresist composition having a high heat resistance
    8.
    发明授权
    Photoresist composition having a high heat resistance 有权
    具有高耐热性的光刻胶组合物

    公开(公告)号:US07144662B2

    公开(公告)日:2006-12-05

    申请号:US10493193

    申请日:2002-02-20

    IPC分类号: G03F7/023

    CPC分类号: G03F7/0226

    摘要: The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.

    摘要翻译: 本发明涉及在LCD的生产过程中使用的具有高耐热性的光致抗蚀剂组合物,更具体地说,涉及具有高耐热性,能够降低工艺简化的工艺(一种方法)的光致抗蚀剂组合物,以及 削减支出。 本发明的组合物通过使得本发明的组合物代替本发明的组合物可以跳过5种工艺,例如形成金属膜的Cr金属沉积和金属的整个表面的光刻/蚀刻/ PR剥离/蚀刻步骤 通常的金属膜,由于其高耐热性,可以发生TFT-LCD的生产中的N + + / - 离子掺杂。