摘要:
A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.
摘要:
Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.
摘要:
A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.
摘要:
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
摘要:
The present invention relates to preparation of porous gallium (III) oxide [Ga2O3] photocatalyst for production of hydrocarbons a porous gallium oxide photocatalyst for production of hydrocarbons, manufactured by the foregoing method, and a process of producing hydrocarbons using the porous gallium oxide photocatalyst for production of hydrocarbons, manufactured by the foregoing method.
摘要翻译:本发明涉及通过上述方法制备用于生产碳氢化合物的多孔氧化镓光催化剂的多孔氧化镓(III)[Ga 2 O 3]光催化剂的制备,以及使用多孔氧化镓光催化剂生产碳氢化合物的方法 通过上述方法制造碳氢化合物。
摘要:
An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.
摘要:
An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.
摘要:
The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.
摘要:
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.
摘要:
The present invention relates to a method of manufacturing a heterogeneous catalyst using space specificity, comprising: depositing a metal in a core of micelles provided on a substrate; depositing an oxide around a shell of the micelles after the deposition of the metal in the core of the micelle; and reducing the metal in the core of the micelles after the deposition of the oxide, then, removing the micelles, and a method for generation of hydrogen through decomposing water in the presence of the heterogeneous catalyst prepared according to the aforesaid method under a light source.