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    Process for forming a silica coating on a glass substrate
    2.
    发明授权
    Process for forming a silica coating on a glass substrate 有权
    在玻璃基板上形成二氧化硅涂层的方法

    公开(公告)号：US08734903B2

    公开(公告)日：2014-05-27

    申请号：US13604095

    申请日：2012-09-05

    Applicant: Douglas M. Nelson

    Inventor： Douglas M. Nelson

    IPC: C23C16/22

    CPC classification number: C03C17/245 ,  C03C17/002 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2218/1525 ,  C23C16/402 ,  C23C16/45512 ,  C23C16/545

    Abstract: A chemical vapor deposition process for the deposition of a silica layer on a glass substrate is provided. The process includes providing a glass substrate. The process also includes forming a gaseous precursor mixture comprising a silane compound, oxygen, water vapor, and a radical scavenger and directing the precursor mixture toward and along the glass substrate. The mixture reacts over the glass substrate to form a silica coating thereon.

    Abstract translation: 提供了用于在玻璃基板上沉积二氧化硅层的化学气相沉积工艺。 该方法包括提供玻璃基底。 该方法还包括形成包含硅烷化合物，氧气，水蒸气和自由基清除剂的气态前体混合物，并将前体混合物导向和沿着玻璃基底引导。 混合物在玻璃基板上反应以在其上形成二氧化硅涂层。

    Method of introducing protective atmosphere gases into a glass forming chamber
    3.
    发明授权
    Method of introducing protective atmosphere gases into a glass forming chamber 失效
    将保护气氛气体引入玻璃成型室的方法

    公开(公告)号：US5364435A

    公开(公告)日：1994-11-15

    申请号：US979662

    申请日：1992-11-20

    Applicant: Douglas M. Nelson

    Inventor： Douglas M. Nelson

    IPC: C03B18/20

    CPC classification number: C03B18/20

    Abstract: A method of introducing a reducing gas and an inert gas into a glass forming chamber at a plurality of locations along the length of the chamber by means of a system which permits delivery of a mixture of the reducing and inert gases to all such locations, or delivery of only the inert gas at certain of the locations. A significantly greater proportion of the reducing gas is introduced into the service space above the bath proximate the inlet end thereof. Further, the total amount of reducing gas which must be introduced to maintain a reducing bath atmosphere is minimized as a result of the location of such introduction. The present invention provides for a more conservative use of reducing gases such as hydrogen.

    Abstract translation: 一种通过允许将还原惰性气体和惰性气体的混合物输送到所有这些位置的系统将还原气体和惰性气体引入到沿着室的长度的多个位置处的玻璃形成室中的方法，或 在某些位置仅输送惰性气体。 还原气体的比例大大地被引入靠近其入口端的浴槽上方的使用空间。 此外，由于这种引入的位置，必须将引入的还原气体的总量保持在减少浴气氛中。 本发明提供了更保守地使用诸如氢的还原气体。

    Method and apparatus for preparing vaporized reactants for chemical vapor deposition
    4.
    发明授权
    Method and apparatus for preparing vaporized reactants for chemical vapor deposition 有权
    用于制备用于化学气相沉积的蒸发反应物的方法和装置

    公开(公告)号：US06827974B2

    公开(公告)日：2004-12-07

    申请号：US10376894

    申请日：2003-02-28

    Applicant: Douglas M. Nelson

    Inventor： Douglas M. Nelson

    IPC: C23C1600

    CPC classification number: C23C16/4409 ,  B01D1/225 ,  B01D1/228 ,  C23C16/4481

    Abstract: One or more coating precursors are selected from metal or silicon compounds at a temperature above their melting points but substantially below their standard vaporization temperature, thereby causing the coating precursors to be in the form of a liquid. A vaporization chamber has a structure for continually injecting the liquid coating precursor into the chamber to produce a vapor. A seal-less, magnetically driven portion rotates a structure for distributing the liquid coating precursor in the vaporization chamber. In one embodiment, a barrier gas is injected adjacent the chamber at a velocity greater than the diffusion velocity of the vapor to prevent the vapor from communicating with the magnetically driven portion. In another embodiment, a first portion of the magnetically driven portion is connected to a structure for distributing the liquid coating precursor in the vaporization chamber. The second portion, located adjacent the first portion, but outside the vaporization chamber, magnetically couples with and rotates the first portion.

    Abstract translation: 一种或多种涂层前体在高于其熔点但基本上低于其标准气化温度的温度下选自金属或硅化合物，从而使涂层前体呈液体形式。 蒸发室具有用于将液体涂覆前体持续喷入室中以产生蒸气的结构。 无密封的磁力驱动部分旋转用于将液体涂覆前体分配在蒸发室中的结构。 在一个实施例中，阻挡气体以大于蒸气扩散速度的速度与腔室相邻地注入，以防止蒸气与磁驱动部分连通。 在另一个实施例中，磁驱动部分的第一部分连接到用于将液体涂覆前体分配在蒸发室中的结构。 位于第一部分附近但在蒸发室外部的第二部分与第一部分磁耦合并旋转。

    Coatings on glass
    5.
    发明授权
    Coatings on glass 失效
    玻璃上的涂料

    公开(公告)号：US5764415A

    公开(公告)日：1998-06-09

    申请号：US370418

    申请日：1995-01-09

    Applicant: Douglas M. Nelson ,  Timothy Jenkinson

    Inventor： Douglas M. Nelson ,  Timothy Jenkinson

    IPC: C03C17/34 ,  G02B1/10 ,  G02B5/08 ,  B05D5/06 ,  C03C17/00

    CPC classification number: G02B5/0833 ,  C03C17/3411 ,  C03C17/3482 ,  Y10S359/90

    Abstract: A method of producing front surface mirrors comprising depositing onto a hot ribbon of low transmissivity glass during the production process a low transmissivity reflecting coating whereby the mirrors have a transmissivity through the coated glass of up to about 10% in visible light. There is also provided a front surface mirror comprising a glass substrate of low transmissivity glass carrying a low transmissivity reflecting coating whereby the mirror has a transmissivity through the coated glass of up to about 10% in visible light.

    Abstract translation: 一种制造前表面镜的方法，包括在制造过程中在低透射率玻璃的热带上沉积低透射率反射涂层，由此反射镜在可见光下通过涂覆玻璃具有高达约10％的透射率。 还提供了一种前表面镜，其包括具有低透射率反射涂层的低透射率玻璃的玻璃基底，由此该反射镜在可见光下具有高达约10％的涂覆玻璃的透射率。

    Method and apparatus for reducing tin oxide in float glass production
    7.
    发明申请
    Method and apparatus for reducing tin oxide in float glass production 有权
    浮法玻璃生产中氧化锡还原的方法和装置

    公开(公告)号：US20120000248A1

    公开(公告)日：2012-01-05

    申请号：US13138631

    申请日：2010-03-25

    Applicant: Douglas M. Nelson

    Inventor： Douglas M. Nelson

    IPC: C03B18/20

    CPC classification number: C03B18/18 ,  C03B18/20

    Abstract: A method for removing oxygen from molten tin in the float bath chamber of a float glass manufacturing process is provided. The method includes providing a chamber having within it molten metal and a gaseous atmosphere above the molten metal, providing at least one reducing gas container proximate the interface between the molten metal and the gaseous atmosphere, providing a source of a reducing gas, and directing the reducing gas to the at least one container. In the at least one container, the reducing gas reacts with the oxygen in the molten metal. The method may include removing a vapor/particulate stream from the float bath chamber. The method may also include removing the vapor and/or the particulate from the stream. An apparatus for removing oxygen from the molten tin is also provided.

    Abstract translation: 提供了一种用于从浮法玻璃制造工艺的浮浴室中从熔融锡中除去氧的方法。 该方法包括提供在其内部具有熔融金属的气室和在熔融金属上方的气态气体，在熔融金属和气体气氛之间的界面处提供至少一个还原气体容器，提供还原气体源，并引导 将气体还原到所述至少一个容器。 在至少一个容器中，还原气体与熔融金属中的氧气反应。 该方法可以包括从浮浴室除去蒸汽/颗粒物流。 该方法还可以包括从流中除去蒸气和/或颗粒。 还提供了一种用于从熔融锡中除去氧的装置。

    Light transmittance optimizing coated glass article for solar cell and method for making
    8.
    发明授权
    Light transmittance optimizing coated glass article for solar cell and method for making 失效
    太阳能电池透光率优化涂层玻璃制品及其制造方法

    公开(公告)号：US07968201B2

    公开(公告)日：2011-06-28

    申请号：US11990475

    申请日：2006-08-24

    Applicant: Douglas M. Nelson ,  Gary Nichol ,  Srikanth Varanasi

    Inventor： Douglas M. Nelson ,  Gary Nichol ,  Srikanth Varanasi

    IPC: B32B17/06 ,  B05D5/06 ,  C23C16/00 ,  C03C17/00

    CPC classification number: H01L31/02168 ,  H01L31/03762 ,  Y02E10/548 ,  Y10T428/12604 ,  Y10T428/265

    Abstract: A multi-layer thin film stack, particularly suitable as a component of a solar cell, is deposited on a transparent dielectric substrate. The multi-layer film stack comprises a transparent electrically conductive metal oxide layer deposited over the dielectric substrate, the conductive metal oxide layer having a refractive index less than 2.0, a light transmittance optimizing interlayer having a refractive index between 2.3 and 3.5, deposited over the electrically conductive metal oxide layer, and a silicon layer having a refractive index of at least 4.5 deposited over the light transmittance optimizing interlayer. The film stack can be deposited by any suitable method, but deposition of each of these layers by atmospheric chemical vapor deposition is preferred.

    Abstract translation: 特别适合作为太阳能电池组件的多层薄膜叠层淀积在透明电介质基片上。 多层膜堆叠包括沉积在电介质基底上的透明导电金属氧化物层，导电金属氧化物层具有小于2.0的折射率，折射率在2.3和3.5之间的透光率优选中间层沉积在 导电金属氧化物层，以及沉积在透光率优选中间层上的具有至少4.5的折射率的硅层。 可以通过任何合适的方法沉积膜堆叠，但是优选通过大气化学气相沉积沉积这些层。

    PRODUCTION OF COATED GLASS
    9.
    发明申请
    PRODUCTION OF COATED GLASS 有权
    生产涂层玻璃

    公开(公告)号：US20110083472A1

    公开(公告)日：2011-04-14

    申请号：US12736730

    申请日：2009-05-07

    Applicant: Kevin David Sanderson ,  Gerhard Lingl ,  Hans-Eckhard Leitl ,  Douglas M. Nelson ,  Franz Michael Josef Scharnagl

    Inventor： Kevin David Sanderson ,  Gerhard Lingl ,  Hans-Eckhard Leitl ,  Douglas M. Nelson ,  Franz Michael Josef Scharnagl

    IPC: C03C17/34

    CPC classification number: C03C17/3655 ,  C03C17/002 ,  C03C17/36 ,  C03C17/366 ,  C03C2218/112 ,  C03C2218/152

    Abstract: A process for coating a ribbon of float glass is disclosed. It comprises the steps of forming a glass ribbon, depositing a first transparent conductive coating upon a major surface of the ribbon which does not extend to the edges of the ribbon whilst the ribbon is at an elevated temperature, cooling said coated ribbon under controlled conditions in an annealing lehr and cutting off the edges of the ribbon so as to produce a ribbon having a uniform coating extending across the full width of the cut ribbon which is characterised in that a second conductive coating is deposited upon the uncoated edges of the ribbon whilst that edge is at a temperature which is above the ambient temperature. The invention finds particular application in the production of coated glass products where the thickness of the glass ribbon is at least 8 mm and most particularly where the thickness of the glass is at least 10 mm.

    Abstract translation: 公开了一种用于涂覆浮法玻璃带的方法。 它包括以下步骤：形成玻璃带，将第一透明导电涂层沉积在色带的主表面上，当色带处于升高的温度时，其不延伸到色带的边缘，在受控条件下将所述涂覆的色带冷却 退火玻璃钢，并切除带的边缘，以便产生具有延伸穿过切割带的整个宽度的均匀涂层的带，其特征在于，第二导电涂层沉积在带的未涂覆边缘上，同时 边缘处于高于环境温度的温度。 本发明特别适用于生产玻璃制品的玻璃制品的厚度至少为8毫米，特别是玻璃的厚度至少为10mm的玻璃制品。

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