-
公开(公告)号：US08220315B2
公开(公告)日：2012-07-17
申请号：US12609835
申请日：2009-10-30
IPC分类号： G01B13/08
CPC分类号： G03B27/52 , G01B13/12 , G03F9/7057
摘要： A gas gauge has a gas delivery tube arranged to determine a distance to an object. The gas delivery tube includes a gas conduit through which a suitable measurement gas is supplied. The measurement gas leaves the gas delivery tube under pressure via an outlet and impinges on the object in an interaction area, wherein a pressure of a recoiled gas is measured by a pressure detector. A gas having a low atomic number may be used. The pressure sensor may include a membrane positioned in the gas delivery tube at least partially enveloping the gas conduit at or near the gas outlet. The pressure sensor may include a membrane disk arranged about the gas conduit. The pressure sensor may include a suitable plurality of pressure elements arranged in a substantially common plane and which may be spaced apart yet enveloping the gas conduit.
摘要翻译： 气量计具有布置成确定到物体的距离的气体输送管。 气体输送管包括供给合适的测量气体的气体导管。 测量气体通过出口在压力下离开气体输送管，并在相互作用区域中撞击物体，其中通过压力检测器测量反冲气体的压力。 可以使用原子序数低的气体。 压力传感器可以包括位于气体输送管中的膜，其至少部分地包围气体出口处或附近的气体导管。 压力传感器可以包括围绕气体管道布置的膜盘。 压力传感器可以包括布置在基本上共同的平面中并且可以间隔开并包封气体管道的合适的多个压力元件。
-
公开(公告)号：US08901521B2
公开(公告)日：2014-12-02
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。
-
公开(公告)号：US08115900B2
公开(公告)日：2012-02-14
申请号：US11898933
申请日：2007-09-17
申请人： Yuri Johannes Gabriël Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
发明人： Yuri Johannes Gabriël Van De Vijver , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski , Tjarko Adriaan Rudolf Van Empel
IPC分类号： G03B27/52
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003 , H05G2/008
摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.
摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。
-
公开(公告)号：US20100116029A1
公开(公告)日：2010-05-13
申请号：US12609835
申请日：2009-10-30
CPC分类号： G03B27/52 , G01B13/12 , G03F9/7057
摘要： A gas gauge has a gas delivery tube arranged to determine a distance to an object. The gas delivery tube includes a gas conduit through which a suitable measurement gas is supplied. The measurement gas leaves the gas delivery tube under pressure via an outlet and impinges on the object in an interaction area, wherein a pressure of a recoiled gas is measured by a pressure detector. A gas having a low atomic number may be used. The pressure sensor may include a membrane positioned in the gas delivery tube at least partially enveloping the gas conduit at or near the gas outlet. The pressure sensor may include a membrane disk arranged about the gas conduit. The pressure sensor may include a suitable plurality of pressure elements arranged in a substantially common plane and which may be spaced apart yet enveloping the gas conduit.
摘要翻译： 气量计具有布置成确定到物体的距离的气体输送管。 气体输送管包括供给合适的测量气体的气体导管。 测量气体通过出口在压力下离开气体输送管，并在相互作用区域中撞击物体，其中通过压力检测器测量反冲气体的压力。 可以使用原子序数低的气体。 压力传感器可以包括位于气体输送管中的膜，其至少部分地包围气体出口处或附近的气体导管。 压力传感器可以包括围绕气体管道布置的膜盘。 压力传感器可以包括布置在基本上共同的平面中并且可以间隔开并包封气体管道的合适的多个压力元件。
-
5.发明授权Method and system for determining a suppression factor of a suppression system and a lithographic apparatus 失效用于确定抑制系统和光刻设备的抑制因子的方法和系统公开(公告)号：US08711325B2
公开(公告)日：2014-04-29
申请号：US12742009
申请日：2008-11-06
申请人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。
-
6.发明申请METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 失效用于确定抑制系统的抑制因子的方法和系统和光刻设备公开(公告)号：US20110261329A1
公开(公告)日：2011-10-27
申请号：US12742009
申请日：2008-11-06
申请人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译： 本发明涉及一种确定抑制系统抑制因子的方法。 抑制系统被布置成抑制污染气体从第一系统中的迁移。 抑制因子表示抑制系统的性能。 该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。 该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。
-
公开(公告)号：US20120229782A1
公开(公告)日：2012-09-13
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
-
公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
-
公开(公告)号：US20120229783A1
公开(公告)日：2012-09-13
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
-
公开(公告)号：US08797504B2
公开(公告)日：2014-08-05
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.021 秒)
