公开(公告)号：US20230094492A1

公开(公告)日：2023-03-30

申请号：US17952996

申请日：2022-09-26

Applicant: ENTEGRIS, INC.

Inventor： Oleg Byl ,  Joe R. Despres ,  Ed A. Sturm

IPC: F17C11/00 ,  B01D53/04 ,  B01J20/20 ,  F17C7/00

Abstract: Described are storage and dispensing systems, and related methods, for storing and selectively dispensing high purity reagent gas from a storage vessel in which the reagent gas is held in sorptive relationship to pyrolyzed carbon adsorption particles.

公开(公告)号：US20230080027A1

公开(公告)日：2023-03-16

申请号：US17945849

申请日：2022-09-15

Applicant: ENTEGRIS, INC.

Inventor： Ed A. Sturm ,  Joe R. Despres

IPC: B01D53/22 ,  B01D71/26 ,  B01D71/12 ,  C23C16/04 ,  C23C16/18 ,  C23C16/455

Abstract: Described are methods, systems, and apparatus for processing a gas mixture that contains at least two gases by contacting the gas mixture with a membrane that allows for preferential flow of one of the gases through the membrane, to separate one constituent gas from the mixture.

公开(公告)号：US20240136145A1

公开(公告)日：2024-04-25

申请号：US18536031

申请日：2023-12-11

Applicant: ENTEGRIS, INC.

Inventor： Ying Tang ,  Joe R. Despres ,  Joseph D. Sweeney ,  Oleg Byl ,  Barry Lewis Chambers

IPC: H01J37/08 ,  H01J37/32

CPC classification number: H01J37/08 ,  H01J37/32532 ,  H01J37/3171 ,  H01J2237/31701

Abstract: Described are ion implantation devices, systems, and methods, and in particular to an ion source that is useful for generating an aluminum ion beam.

公开(公告)号：US11881376B2

公开(公告)日：2024-01-23

申请号：US17492089

申请日：2021-10-01

Applicant: Entegris, Inc.

Inventor： Ying Tang ,  Joe R. Despres ,  Joseph D. Sweeney ,  Oleg Byl ,  Barry Lewis Chambers

IPC: H01J37/08 ,  H01J37/32 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/32532 ,  H01J37/3171 ,  H01J2237/31701

Abstract: Described are ion implantation devices, systems, and methods, and in particular to an ion source that is useful for generating an aluminum ion beam.