公开(公告)号：US10392560B2

公开(公告)日：2019-08-27

申请号：US15407850

申请日：2017-01-17

Applicant: ENTEGRIS, INC.

Inventor： Jeffrey A. Barnes ,  Emanuel I. Cooper ,  Li-Min Chen ,  Steven Lippy ,  Rekha Rajaram ,  Sheng-Hung Tu

IPC: C09K13/10 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/06 ,  C09K13/08 ,  C23F1/02 ,  C23F1/30 ,  C23F1/40 ,  H01L21/02 ,  C11D11/00 ,  C11D7/02 ,  C11D7/08 ,  C11D7/32 ,  H01L21/311

Abstract: Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.