Stepper with exposure time monitor
    1.
    发明授权
    Stepper with exposure time monitor 有权
    步进式曝光时间监视器

    公开(公告)号:US06266132B1

    公开(公告)日:2001-07-24

    申请号:US09401586

    申请日:1999-09-22

    IPC分类号: G03B2772

    CPC分类号: G03F7/70008 G03F7/70525

    摘要: A method for detecting a degraded light source is provided. An exposure time associated with the light source is monitored. The exposure time is compared to at least one control limit. A degraded condition is identified based on the exposure time violating the control limit. A processing tool includes a stepper and an automatic process controller. The stepper has a light source and is adapted to illuminate a wafer for an exposure time. The automatic process controller is adapted to monitor the exposure time, compare the exposure time to at least one control limit, and identify a degraded condition based on the exposure time violating the control limit.

    摘要翻译: 提供了一种用于检测劣化光源的方法。 监测与光源相关的曝光时间。 将曝光时间与至少一个控制限制进行比较。 根据违反控制限制的曝光时间确定退化状态。 一种加工工具包括步进机和自动过程控制器。 步进器具有光源并适于照射晶片以获得曝光时间。 自动过程控制器适于监视曝光时间,将曝光时间与至少一个控制限制进行比较,并根据违反控制限制的曝光时间识别劣化状态。

    Insulative panel incorporating a support beam
    2.
    发明授权
    Insulative panel incorporating a support beam 失效
    带有支撑梁的绝缘板

    公开(公告)号:US07377082B1

    公开(公告)日:2008-05-27

    申请号:US10990730

    申请日:2004-11-17

    IPC分类号: E04B2/00 E04C2/34

    CPC分类号: E04C2/292

    摘要: A panel for constructing patio rooms, and the like, has a reinforcing offset I-beam extending along a first edge of the insulative board. A second lateral edge of the board has a reduced thickness portion which fits into the open side of the I-beam and forms two pockets which accommodate the engagement of two sets of spring fingers which positionally locate and secure adjacent panels together.

    摘要翻译: 用于构造露台室等的面板具有沿着绝缘板的第一边缘延伸的加强偏移I型梁。 板的第二横向边缘具有减小的厚度部分,该部分装配到工字梁的开口侧,并形成两个凹穴,其容纳两组弹簧夹的接合,这两个弹簧指位置定位并将相邻的面板固定在一起。

    VAPOR-TIGHT LIGHTING FIXTURE
    3.
    发明申请
    VAPOR-TIGHT LIGHTING FIXTURE 有权
    蒸气灯照明设备

    公开(公告)号:US20120250302A1

    公开(公告)日:2012-10-04

    申请号:US13479704

    申请日:2012-05-24

    IPC分类号: F21S8/00 B23P6/00

    摘要: This invention provides a vapor-tight luminaire with a housing that defines a continuous and unbroken sealed tubular lens extending in a longitudinal direction. The housing includes a pair of end cap structures removably and sealably mounted on each of opposing respective housing ends. The housing removably supports a lamp assembly that can include various reflector arrangements. The lamp assembly can include fluorescent tubular lamps and can include electronics, such as a ballast circuit. Illustratively, a supporting rail suspended from each of the opposing housing ends by respective posts slidably supports the lamp assembly. In this manner each of the housing and the lamp assembly are constructed and arranged to allow the lamp assembly to be passed into and out of the housing along the supporting rail when at least one of the end cap structures is removed from the respective one of the housing ends.

    摘要翻译: 本发明提供了一种具有壳体的气密灯具,其限定了沿纵向方向延伸的连续且不间断的密封管状透镜。 壳体包括可拆卸地且可密封地安装在每个相对的相应壳体端部上的一对端盖结构。 壳体可拆卸地支撑可以包括各种反射器布置的灯组件。 灯组件可以包括荧光管灯,并且可以包括电子器件,例如镇流器电路。 说明性地,通过相应的柱从每个相对的壳体端部悬挂的支撑轨可滑动地支撑灯组件。 以这种方式,壳体和灯组件中的每一个被构造和布置成允许灯组件沿着支撑轨道进入和离开壳体,当至少一个端盖结构从相应的一个 住房结束。

    Tool and method for golf green maintenance
    4.
    发明授权
    Tool and method for golf green maintenance 失效
    高尔夫绿色维护的工具和方法

    公开(公告)号:US07033288B1

    公开(公告)日:2006-04-25

    申请号:US10785245

    申请日:2004-02-23

    IPC分类号: A63B57/00

    CPC分类号: A63B57/50 A63B2225/30

    摘要: A multipurpose tool assembly to perform a divot repair operation, a coring operation and/or a green surface smoothing operation on a golf green. There is an elongate operating section having on one end a divot repair tool portion and on the other end a coring tool portion. The operating section can be connected to the handle in either of two configurations to perform either the divot repair operation or the coring operation.

    摘要翻译: 一种多用途工具组件,用于对高尔夫球绿色执行纹理修复操作,取芯操作和/或绿色表面平滑操作。 有一个细长的操作部分,其一端具有一个修边工具部分,另一端有一个取芯工具部分。 操作部分可以以两种配置中的任意一种方式连接到手柄,以执行皮卡修复操作或取芯操作。

    Mark protection with transparent film
    5.
    发明授权
    Mark protection with transparent film 有权
    标记保护透明膜

    公开(公告)号:US06207966B1

    公开(公告)日:2001-03-27

    申请号:US09205010

    申请日:1998-12-04

    IPC分类号: G01B1100

    摘要: An alignment mark protection structure (95) is disclosed which is used to ensure an integrity of an alignment scheme for a substrate (50) which is to be subjected to lithographic processing. The alignment mark protection structure (95) comprises the substrate (50) and an alignment mark (52) associated with the substrate (50). The alignment mark (52) reflects an alignment light (208) which is then used to determine an optimum alignment between the substrate (50) and a lithographic mask (214). A cap (100) overlies the alignment mark (52) and is substantially transparent with respect to the alignment light (208). The cap (100) protects the underlying alignment mark (52) from lithographic process-induced damage during processing and thus reduces alignment light noise, thereby improving the alignment between a mask (214) and the substrate (50) and minimizing the registration error associated with overlying layers formed on the substrate (50).

    摘要翻译: 公开了一种对准标记保护结构(95),其用于确保待经受光刻处理的基板(50)的对准方案的完整性。 对准标记保护结构(95)包括衬底(50)和与衬底(50)相关联的对准标记(52)。 对准标记(52)反射对准光(208),然后将对准光(208)用于确定基板(50)和光刻掩模(214)之间的最佳对准。 盖(100)覆盖对准标记(52),并且相对于对准光(208)基本上是透明的。 盖(100)在处理期间保护下面的对准标记(52)免受光刻处理引起的损坏,从而减少对准光噪声,从而改善掩模(214)和基板(50)之间的对准并使与之相关联的注册误差最小化 其中覆盖层形成在基底(50)上。

    Golf green repair device method and apparatus
    6.
    发明授权
    Golf green repair device method and apparatus 失效
    高尔夫绿色修复装置的方法和装置

    公开(公告)号:US07731609B2

    公开(公告)日:2010-06-08

    申请号:US11740191

    申请日:2007-04-25

    IPC分类号: A63B57/00

    CPC分类号: A63B57/50

    摘要: A golf green repair tool with a depth limiting feature that has an earth engagement surface that has a forward slant to reposition the raised portion around a crater to the center region of the crater. A prong portion is adapted to be thrusted toward the center region of the crater and the repair tool is adapted to do minimal damage to the turf mat and provides a desirable method to repair craters left by impacting golf balls by properly repositioning of the displaced portions.

    摘要翻译: 一种具有深度限制特征的高尔夫绿色修复工具,其具有接地接合表面,该接地表面具有向前倾斜以将突出部分围绕火山口重新定位到火山口的中心区域。 尖头部分适于被推向火山口的中心区域,并且修理工具适于对草坪垫做出最小的损伤,并且通过适当地重新定位移位部分来提供通过冲击高尔夫球来修复留下的凹坑的期望方法。

    GOLF GREEN REPAIR DEVICE METHOD AND APPARATUS
    7.
    发明申请
    GOLF GREEN REPAIR DEVICE METHOD AND APPARATUS 失效
    高尔夫绿色修复装置方法和装置

    公开(公告)号:US20080268985A1

    公开(公告)日:2008-10-30

    申请号:US11740191

    申请日:2007-04-25

    IPC分类号: A63B57/00

    CPC分类号: A63B57/50

    摘要: A golf green repair tool with a depth limiting feature that has an earth engagement surface that has a forward slant to reposition the raised portion around a crater to the center region of the crater. A prong portion is adapted to be thrusted toward the center region of the crater and the repair tool is adapted to do minimal damage to the turf mat and provides a desirable method to repair craters left by impacting golf balls by properly repositioning of the displaced portions.

    摘要翻译: 一种具有深度限制特征的高尔夫绿色修复工具,其具有接地接合表面,该接地表面具有向前倾斜以将突出部分围绕火山口重新定位到火山口的中心区域。 尖头部分适于被推向火山口的中心区域,并且修理工具适于对草坪垫做出最小的损伤,并且通过适当地重新定位移位部分来提供通过冲击高尔夫球来修复留下的凹坑的期望方法。

    Prioritizing an application of correction in a multi-input control system
    8.
    发明授权
    Prioritizing an application of correction in a multi-input control system 失效
    在多输入控制系统中确定校正的优先级

    公开(公告)号:US06912436B1

    公开(公告)日:2005-06-28

    申请号:US10261156

    申请日:2002-09-30

    IPC分类号: G05B13/04 G06F19/00

    CPC分类号: G05B13/042

    摘要: A method and an apparatus for selectively applying correction to a process control. Manufacturing data relating to the processing of a workpiece is acquired. The manufacturing data includes metrology data relating to the processed workpiece. An adjustment for at least a first or a second control input parameter is determined based upon the manufacturing data. The first and second control input parameters are organized to isolate the first control input parameter from the second control input parameter for adjusting at least one of the first and the second control input parameters, using a controller.

    摘要翻译: 一种用于选择性地对过程控制应用校正的方法和装置。 获取与工件的处理有关的制造数据。 制造数据包括与加工的工件相关的计量数据。 基于制造数据确定至少第一或第二控制输入参数的调整。 组织第一和第二控制输入参数以将第一控制输入参数与第二控制输入参数隔离,以使用控制器调整第一和第二控制输入参数中的至少一个。

    Method and apparatus for run-to-run controlling of overlay registration
    9.
    发明授权
    Method and apparatus for run-to-run controlling of overlay registration 有权
    覆盖登记的运行控制方法和装置

    公开(公告)号:US06405096B1

    公开(公告)日:2002-06-11

    申请号:US09371550

    申请日:1999-08-10

    IPC分类号: G06F1900

    CPC分类号: G03F7/70633 H01L22/20

    摘要: The present invention provides for a method and apparatus for correction of overlay control errors. Semiconductor devices are processed based upon control input parameters. The processed semiconductor devices are examined in a review station. The control input parameters are modified in response to the examination of the processed semiconductor devices. New control input parameters are implemented for a subsequent run of the semiconductor device processing step based upon the modification of the control input parameters.

    摘要翻译: 本发明提供了一种用于校正重叠控制误差的方法和装置。 基于控制输入参数来处理半导体器件。 处理的半导体器件在检查站中进行检查。 响应于对被处理的半导体器件的检查,修改控制输入参数。 基于控制输入参数的修改,实现新的控制输入参数用于随后的半导体器件处理步骤的运行。

    Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate
    10.
    发明授权
    Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate 有权
    降低在半导体衬底中形成的对准标记对化学机械抛光损伤的敏感性的方法

    公开(公告)号:US06271602B1

    公开(公告)日:2001-08-07

    申请号:US09386861

    申请日:1999-08-31

    IPC分类号: H01L23544

    摘要: A method for processing a semiconductor substrate is presented wherein an alignment mark is formed in an alignment mark area of the semiconductor substrate. The alignment mark area is contained within a window area of the semiconductor substrate. The upper surface of the semiconductor substrate within the window area is recessed below the upper surface of the semiconductor substrate outside of the window area, preferably by exposing the upper surface of the semiconductor substrate within the window area to an etchant. Such recession forms an alignment mark trench within the window area. Being substantially recessed below the original surface of the semiconductor substrate, an alignment mark formed in such a manner may be substantially protected from chemical-mechanical polishing damage during subsequent processing steps.

    摘要翻译: 提出了一种用于处理半导体衬底的方法,其中在半导体衬底的对准标记区域中形成对准标记。 对准标记区域包含在半导体衬底的窗口区域内。 窗口区域内的半导体衬底的上表面优选地通过将窗口区域内的半导体衬底的上表面暴露于蚀刻剂而在窗口区域外凹入到半导体衬底的上表面之下。 这种衰退在窗口区域内形成对准标记沟槽。 基本上凹进到半导体衬底的原始表面之下,以这种方式形成的对准标记可以在后续处理步骤中基本上被保护而免受化学机械抛光损伤。