公开(公告)号：US20070042292A1

公开(公告)日：2007-02-22

申请号：US11504809

申请日：2006-08-16

申请人： Eiji Yoneda ,  Hirokazu Sakakibara ,  Hiromitsu Nakashima ,  Hiroki Nakagawa ,  Yukio Nishimura

发明人： Eiji Yoneda ,  Hirokazu Sakakibara ,  Hiromitsu Nakashima ,  Hiroki Nakagawa ,  Yukio Nishimura

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2041

摘要： A radiation-sensitive resin composition which is a resist having properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing, and the like is provided. The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of the following formulas (1-1) and (1-2), an additive of the following formula (1-3), and an acid generator, in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an acid, and in the formula (1-3), n is an integer from 1-8 and A individually represents a hydroxyl group and the like.

摘要翻译： 提供了作为抗敏剂的耐辐射敏感性树脂组合物，其具有优异的灵敏度，图案的线边缘粗糙度，抑制图案折叠的能力等。 辐射敏感性树脂组合物包含具有下式（1-1）和（1-2）的重复单元的酸解离基团的聚合物，下式（1-3）的添加剂和酸发生剂 在式（1-1）中，R 1表示甲基等，X表示特定的多环脂肪族烃基等，式（1-2）中，R' SUP> 1表示甲基等，Z表示可通过酸的作用而离解的酸解离基，在式（1-3）中，n为1-8的整数 A独立地表示羟基等。

公开(公告)号：US08435718B2

公开(公告)日：2013-05-07

申请号：US13272501

申请日：2011-10-13

申请人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

发明人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/40

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

摘要： An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group. R1—O—R2  (1)

摘要翻译： 上层形成组合物包括树脂和溶剂。 该树脂可溶于用于由上层形成组合物覆盖以形成通过辐射照射的图案的光致抗蚀剂膜的显影剂。 溶剂溶解在溶剂中的树脂。 溶剂包括由式（1）表示的化合物。 R 1和R 2各自独立地表示碳原子数1〜8的烃基或卤代烃基。 R1-O-R2（1）

公开(公告)号：US20090202945A1

公开(公告)日：2009-08-13

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/039 ,  C08F20/22

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US08697343B2

公开(公告)日：2014-04-15

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/26 ,  G03F7/039

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US20120028198A1

公开(公告)日：2012-02-02

申请号：US13272501

申请日：2011-10-13

申请人： Atsushi NAKAMURA ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

发明人： Atsushi NAKAMURA ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

IPC分类号： G03F7/20 ,  C08K5/06

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

摘要： An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group. R1—O—R2  (1)

摘要翻译： 上层形成组合物包括树脂和溶剂。 该树脂可溶于用于通过暴露于辐射形成图案的上层形成组合物覆盖的光致抗蚀剂膜的显影剂中。 溶剂溶解在溶剂中的树脂。 溶剂包括由式（1）表示的化合物。 R 1和R 2各自独立地表示碳原子数1〜8的烃基或卤代烃基。 R1-O-R2（1）

公开(公告)号：US08076053B2

公开(公告)日：2011-12-13

申请号：US12091712

申请日：2006-10-25

申请人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

发明人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/40 ,  G03F7/11

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

摘要： An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10−3 Pa·s at 20° C. In addition, the solvent does not cause intermixing of the photoresist film and the upper layer-forming composition. The solvent contains an ether or a hydrocarbon.

摘要翻译： 提供了形成在光致抗蚀剂上的上层形成组合物，同时几乎不与光致抗蚀剂膜混合，并且提供光致抗蚀剂图案化方法。 上层形成组合物在液浸光刻期间稳定地保持在介质如水中不被洗脱，并容易溶解在碱性显影剂中。 上层形成组合物覆盖用于通过暴露于辐射形成图案的光致抗蚀剂膜。 该组合物包含可溶于光致抗蚀剂膜的显影剂中的树脂和溶解有树脂的溶剂。 溶剂在20℃下的粘度小于5.2×10-3Pa·s。此外，溶剂不会引起光致抗蚀剂膜和上层形成组合物的混合。 溶剂含有醚或烃。

公开(公告)号：US08580482B2

公开(公告)日：2013-11-12

申请号：US13338569

申请日：2011-12-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US20110223537A1

公开(公告)日：2011-09-15

申请号：US13044573

申请日：2011-03-10

申请人： Takuma Ebata ,  Hiroki Nakagawa ,  Yasuhiko Matsuda ,  Kazuki Kasahara ,  Kenji Hoshiko ,  Hiromitsu Nakashima ,  Norihiko Ikeda ,  Kaori Sakai ,  Saki Harada

发明人： Takuma Ebata ,  Hiroki Nakagawa ,  Yasuhiko Matsuda ,  Kazuki Kasahara ,  Kenji Hoshiko ,  Hiromitsu Nakashima ,  Norihiko Ikeda ,  Kaori Sakai ,  Saki Harada

IPC分类号： G03F7/004 ,  C08F34/02

CPC分类号： C08F20/28 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0397 ,  G03F7/2041

摘要： A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a′), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.

摘要翻译： 辐射敏感性树脂组合物包括聚合物，光致酸发生剂和酸扩散控制剂。 聚合物包括由下式（a-1）表示的第一重复单元。 酸扩散控制器包括由下式（C-1）表示的碱和可光降解碱中的至少一种，其中每个R 1表示氢原子等，R表示由上式（a' ），各R 19表示碳原子数为1〜5的链状烃基等，A表示碳原子数1〜30的二价链状烃基等，m和n为0〜3的整数（m + n = 1至3），其中R 2和R 3各自表示具有1至20个碳原子的一价链烃基等。

公开(公告)号：US20100266953A1

公开(公告)日：2010-10-21

申请号：US12832035

申请日：2010-07-07

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/004

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是具有羧基的重复单元（I），具有磺基的重复单元（II）和通过在氟代烷基中共聚有碳原子数1〜20的氟代烷基（甲基）丙烯酸酯）而得到的重复单元的共聚物 除了具有侧链的重链单元以外，其具有至少在α-位具有氟烷基的醇羟基，所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US07781142B2

公开(公告)日：2010-08-24

申请号：US11664296

申请日：2005-09-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R1和R2中的至少一个为 具有1至4个碳原子的氟代烷基和式（2）中的R 3表示具有1至20个碳原子的氟烷基。