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公开(公告)号：US20070042292A1
公开(公告)日：2007-02-22
申请号：US11504809
申请日：2006-08-16
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition which is a resist having properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing, and the like is provided. The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of the following formulas (1-1) and (1-2), an additive of the following formula (1-3), and an acid generator, in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an acid, and in the formula (1-3), n is an integer from 1-8 and A individually represents a hydroxyl group and the like.
摘要翻译： 提供了作为抗敏剂的耐辐射敏感性树脂组合物，其具有优异的灵敏度，图案的线边缘粗糙度，抑制图案折叠的能力等。 辐射敏感性树脂组合物包含具有下式（1-1）和（1-2）的重复单元的酸解离基团的聚合物，下式（1-3）的添加剂和酸发生剂 在式（1-1）中，R 1表示甲基等，X表示特定的多环脂肪族烃基等，式（1-2）中，R' SUP> 1表示甲基等，Z表示可通过酸的作用而离解的酸解离基，在式（1-3）中，n为1-8的整数 A独立地表示羟基等。
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公开(公告)号：US20090053649A1
公开(公告)日：2009-02-26
申请号：US11579646
申请日：2005-05-02
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.
摘要翻译： 作为具有对于线间距图案和隔离空间图案的宽焦点（DOF）的宽灵敏度，分辨率等的抗蚀剂的基本性能优异的辐射敏感性树脂组合物， 由于烘烤温度的波动引起的线宽变化最小，并且具有不发生线型破坏现象的小线宽限制，并且提供可用作该组合物的树脂成分的含内酯共聚物。 含有内酯的共聚物由以下化合物（1-1），（2-1）和（3-1）的共聚物表示。 辐射敏感性树脂组合物包含（a）含内酯共聚物和（b）光酸产生剂。
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公开(公告)号：US08597867B2
公开(公告)日：2013-12-03
申请号：US11579646
申请日：2005-05-02
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.
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4.发明授权Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition 有权酸产生剂，磺酸，磺酸衍生物和辐射敏感树脂组合物公开(公告)号：US06908722B2
公开(公告)日：2005-06-21
申请号：US10183441
申请日：2002-06-28
申请人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
发明人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
IPC分类号： C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/004 , G03F7/039 , G03F7/075 , G03F7/00
CPC分类号： C07C309/23 , C07C309/17 , C07C309/19 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/114 , Y10S430/115
摘要： A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
摘要翻译： 一种含有下式（I）的结构的新型光酸产生剂，其中R为氟含量为50重量％以下的一价有机基团，硝基，氰基或氢原子，Z 1和Z 2各自独立地为氟原子或具有1-10个碳原子的直链或支链全氟烷基。 当用于化学增强的辐射敏感性树脂组合物中时，光致酸产生剂显示出高透明度，较高的可燃性，并且没有生物累积性，并且产生在抗蚀涂层中表现出高酸度，高沸点，适度短扩散长度的酸，以及低 对掩模图案密度的依赖。
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公开(公告)号：US07217492B2
公开(公告)日：2007-05-15
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： G03F7/038 , G03F7/039 , C07C303/00 , C07C307/00 , C07C315/00
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译： 公开了具有下式（1）的阳离子部分的鎓盐化合物。 其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar 1和Ar 2为（取代的）芳族烃基，P为-O-SO 2， （O）R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。 鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。 含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。
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公开(公告)号：US20050053861A1
公开(公告)日：2005-03-10
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： C07C317/14 , C07C381/12 , C07D317/72 , C07D319/08 , C07D333/46 , G03C1/76 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译： 公开了具有下式（1）的阳离子部分的鎓盐化合物。 其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳族烃基，P为-O-SO2R，-OS（O） R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。 鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。 含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。
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公开(公告)号：US07314701B2
公开(公告)日：2008-01-01
申请号：US10679367
申请日：2003-10-07
申请人： Kenichi Yokoyama , Fumihisa Miyajima , Tomoki Nagai , Eiji Yoneda
发明人： Kenichi Yokoyama , Fumihisa Miyajima , Tomoki Nagai , Eiji Yoneda
CPC分类号： G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid-dissociable group dissociates or (C-b) an alkali-soluble resin and an alkali solubility controller, and a negative tone radiation-sensitive resin composition comprising (A), (B), (D) an alkali-soluble resin, and (E) a compound that can crosslink the alkali-soluble resin in the presence of an acid. The radiation-sensitive resin composition of the present invention is a chemically amplified resist exhibiting high resolution and high storage stability as a composition, and suitable for microfabrication sensible to active radiations, for example, ultraviolet rays such as g-lines and i-lines, deep ultraviolet rays represented by a KrF excimer laser, ArF excimer laser, F2 excimer laser, and EUV excimer laser, and electron beams.
摘要翻译： 一种正色散辐射敏感性树脂组合物，其包含（A）1-取代咪唑，（B）光酸产生剂和（Ca）由酸解离基团保护的树脂，其不溶或几乎不溶于碱，但可溶于 （Cb）碱溶性树脂和碱溶性控制剂，以及包含（A），（B），（D）碱溶性树脂的负色调辐射敏感性树脂组合物， 和（E）可在酸存在下使碱溶性树脂交联的化合物。 本发明的放射线敏感性树脂组合物是作为组合物具有高分辨率和高储存稳定性的化学放大抗蚀剂，适用于对活性辐射敏感的微细加工，例如，γ-线和i线等紫外线， 由KrF准分子激光器，ArF准分子激光器，F 2激子和EUV准分子激光器表示的深紫外线以及电子束。
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公开(公告)号：US5968375A
公开(公告)日：1999-10-19
申请号：US990763
申请日：1997-12-15
申请人： Eiji Yoneda
发明人： Eiji Yoneda
摘要： The present invention relates to a method for welding comprising the steps of: contacting a plurality of workpieces to be welded having different heat capacities so as to form a boundary portion therebetween; placing a welding electrode in proximity to the boundary portion; generating an arc discharge between the welding electrode and the boundary portion; and supplying gas to the boundary portion, wherein more gas being supplied to one of the workpieces having a lower heat capacity than another workpiece having a higher heat capacity.
摘要翻译： 焊接方法技术领域本发明涉及一种焊接方法，包括以下步骤：接触多个不同热容的被焊接工件，以在其间形成边界部分; 将焊接电极放置在所述边界部分附近; 在焊接电极和边界部分之间产生电弧放电; 以及向所述边界部分供应气体，其中向具有较高热容量的另一工件的热容量较低的一个工件供给更多的气体。
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公开(公告)号：US5912935A
公开(公告)日：1999-06-15
申请号：US908695
申请日：1997-08-08
申请人： Takeshi Isobe , Yoshiharu Mae , Toshimichi Takahashi , Yoshitaka Suda , Akio Sando , Eiji Yoneda
发明人： Takeshi Isobe , Yoshiharu Mae , Toshimichi Takahashi , Yoshitaka Suda , Akio Sando , Eiji Yoneda
CPC分类号： G21C21/02 , G21C3/06 , G21Y2002/103 , G21Y2002/303 , G21Y2004/10 , G21Y2004/201 , G21Y2004/40 , Y02E30/40 , Y10T428/12806
摘要： A fuel rod for a light water reactor comprises a cladding tube which comprises a zirconium alloy having a composition including 0.6 to 2.0% by weight of Nb, 0.5 to 1.5% by weight of Sn, 0.05 to 0.3% by weight of Fe, and the balance being Zr and incidental impurities; uranium oxide fuel pellets packed in the cladding tube; and end plugs closing both ends of the cladding tube. The cladding tube is sealed by TIG welding with the end plugs. Precipitates having grain diameters of 0.01 to 0.5 .mu.m and comprise intermetallic compounds containing Zr, Nb and Fe are present at grain boundaries in the structure of heat affected zones of the cladding tube, the heat affected zone being adjacent to a bead formed by TIG welding.
摘要翻译： 一种用于轻水反应器的燃料棒包括一个包层管，它包括一种锆合金，其组成包括Nb为0.6-2.0％，Sn为0.5-1.5％，Fe为0.05-0.3％，以及 余量为Zr和杂质; 包裹在包壳管内的氧化铀燃料颗粒; 并且封闭封装管的两端的端塞。 包层管通过TIG焊接与端塞密封。 晶粒直径为0.01〜0.5μm，含有Zr，Nb，Fe的金属间化合物的沉淀物存在于包覆管的热影响区域的结构的晶界处，热影响区域与由TIG焊接形成的焊道相邻 。
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公开(公告)号：US5319178A
公开(公告)日：1994-06-07
申请号：US976338
申请日：1992-11-13
申请人： Akio Sando , Minoru Murata , Eiji Yoneda
发明人： Akio Sando , Minoru Murata , Eiji Yoneda
摘要： A welding apparatus for welding an end plug on the end of a pellet filled nuclear fuel rod includes a holding mechanism, an abutting member, a torch and a pressing mechanism. The holding mechanism is for holding the external periphery of the fuel rod with the end plug attached thereto. The abutting member is disposed opposite to the holding mechanism, and the end plug of the fuel rod butts up against the abutting member. The torch is disposed between the holding mechanism and the abutting member, and is placed diametrically opposite to the external surface of the fuel rod. The holding mechanism and the abutting member are made so that the distance therebetween can be adjusted, and the pressing mechanism is provided on one of the holding mechanism or the abutting member, and operates to move the holding mechanism and the abutting member to approach each other. In a welding apparatus of such a design, the fuel rod is held by the holding mechanism, and the pressing mechanism pushes the holding mechanism toward the abutting member, and while retaining such a position at a constant compressive force, welding of the end plug is performed. Therefore, the welding is performed without being affected by the variations in the compressive force caused by welding heat distortions, thereby providing a weld of high integrity and quality.
摘要翻译： 用于焊接填充颗粒填充的核燃料棒的端部上的端塞的焊接装置包括保持机构，抵接构件，手电筒和按压机构。 保持机构用于保持安装有端塞的燃料棒的外周。 抵接构件与保持机构相对设置，并且燃料棒的端塞抵靠抵靠构件。 手柄设置在保持机构和抵接构件之间，并且与燃料棒的外表面径向相对设置。 保持机构和抵接构件被制成使得可以调节它们之间的距离，并且按压机构设置在保持机构或抵接构件中的一个上，并且操作以使保持机构和抵接构件相互靠近 。 在这种设计的焊接装置中，燃料棒由保持机构保持，并且按压机构将保持机构推向抵接部件，并且在以一定的压缩力保持这样的位置的同时，端塞的焊接 执行。 因此，焊接不受焊接热变形引起的压缩力的变化的影响，从而提供高完整性和高质量的焊接。
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