公开(公告)号：US08053747B2

公开(公告)日：2011-11-08

申请号：US12579636

申请日：2009-10-15

申请人： Einstein Noel Abarra ,  Masahiro Shibamoto

发明人： Einstein Noel Abarra ,  Masahiro Shibamoto

IPC分类号： H01L21/00

CPC分类号： H01J37/317 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/0822 ,  H01J2237/3156 ,  H01J2237/316

摘要： A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator.

摘要翻译： 一种清洗基板处理装置的方法，其中第一离子束发生器和第二离子束发生器彼此相对布置以夹持其上放置基板的平面，并且处理基板的两个表面，包括 从第一离子束发生器和第二离子束发生器之间的位置退回衬底的步骤，以及通过从第一离子束发生器向第二离子束发生器发射离子束来清洁第二离子束发生器。

公开(公告)号：US20100096568A1

公开(公告)日：2010-04-22

申请号：US12579636

申请日：2009-10-15

申请人： Einstein Noel ABARRA ,  Masahiro Shibamoto

发明人： Einstein Noel ABARRA ,  Masahiro Shibamoto

IPC分类号： H01J37/36

CPC分类号： H01J37/317 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/0822 ,  H01J2237/3156 ,  H01J2237/316

摘要： A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator.

摘要翻译： 一种清洗基板处理装置的方法，其中第一离子束发生器和第二离子束发生器彼此相对布置以夹持其上放置基板的平面，并且处理基板的两个表面，包括 从第一离子束发生器和第二离子束发生器之间的位置退回衬底的步骤，以及通过从第一离子束发生器向第二离子束发生器发射离子束来清洁第二离子束发生器。

公开(公告)号：US07625450B2

公开(公告)日：2009-12-01

申请号：US10957864

申请日：2004-10-04

申请人： Shinji Furukawa ,  Masahiro Shibamoto

发明人： Shinji Furukawa ,  Masahiro Shibamoto

IPC分类号： C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  B05B5/025 ,  C23C16/00

CPC分类号： C23C14/564 ,  C23C14/568 ,  C23C16/54

摘要： The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.

摘要翻译： 本发明提供了一种多层膜形成装置，其包括：基板保持架储存室，用于与多膜成形装置中的路径分开地存储多个基板保持器，从而可以进行生产而不受去除膜的处理 积聚在基板保持器的表面上，更换基板保持器的过程，或者通过去除积聚在基板保持器的表面上的膜或者更换基板保持器的过程，因此可以进行高通量生产 。 在多层膜形成装置的路径上设置分支路径，并且设置用于存储多个基板保持件的基板保持架存放室，该基板保持器能够使基板保持器从路径中回收并且将基板保持器馈送到路径 。

公开(公告)号：US07517438B2

公开(公告)日：2009-04-14

申请号：US11113630

申请日：2005-04-25

申请人： Masahiro Shibamoto ,  Sinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

发明人： Masahiro Shibamoto ,  Sinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

IPC分类号： C23C14/34

CPC分类号： G11B5/7325 ,  G11B5/8404

摘要： This invention presents a magnetic recording disk where an anisotropy-allowing layer to allow magnetic anisotropy to a magnetic recording layer is provided between a substrate and the magnetic recording layer. This invention also presents a magnetic-recording-disk manufacturing method comprising a step to prepare an anisotropy-allowing layer to allow magnetic anisotropy to a magnetic recording layer, prior to a step to prepare the magnetic recording layer. This invention also presents a magnetic-recording-disk manufacturing system comprising an anisotropy-allowing-layer preparation chamber, in which an anisotropy-allowing layer to allow magnetic anisotropy to a magnetic recording layer is prepared on a substrate, prior to preparation of the magnetic recording layer. In this invention, the anisotropy-allowing layer is made of; nitride of niobium, tantalum, niobium alloy or tantalum alloy, or nitride-including niobium, tantalum, niobium alloy or tantalum alloy.

公开(公告)号：US20100028529A1

公开(公告)日：2010-02-04

申请号：US12502328

申请日：2009-07-14

申请人： Kazuto Yamanaka ,  Masahiro Shibamoto ,  Ayumu Miyoshi ,  Satoshi Hitomi ,  David Djulianto Djayaprawira

发明人： Kazuto Yamanaka ,  Masahiro Shibamoto ,  Ayumu Miyoshi ,  Satoshi Hitomi ,  David Djulianto Djayaprawira

IPC分类号： B05D3/06 ,  C23C16/452

CPC分类号： G11B5/8404

摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.

摘要翻译： 本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。 根据本发明的实施例的基板处理装置包括：将离子束施加到要被处理的基板的一个表面的第一离子束发生器，以及将离子束施加到待处理的另一表面的第二离子束发生器 ，其经由衬底彼此相对布置，并且第一离子束发生器中的第一栅极和第二离子束发生器中的第二栅极被配置为彼此不对称。

公开(公告)号：US20080178796A1

公开(公告)日：2008-07-31

申请号：US12031474

申请日：2008-02-14

申请人： Shinji Furukawa ,  Masahiro Shibamoto

发明人： Shinji Furukawa ,  Masahiro Shibamoto

IPC分类号： C23C14/50

CPC分类号： C23C14/564 ,  C23C14/568 ,  C23C16/54

摘要： The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.

摘要翻译： 本发明提供了一种多层膜形成装置，其包括：基板保持架储存室，用于与多膜成形装置中的路径分开地存储多个基板保持器，从而可以进行生产而不受去除膜的处理 积聚在基板保持器的表面上，更换基板保持器的过程，或者通过去除积聚在基板保持器的表面上的膜或者更换基板保持器的过程，因此可以进行高通量生产 。 在多层膜形成装置的路径上设置分支路径，并且设置用于存储多个基板保持件的基板保持架存放室，该基板保持器能够使基板保持器从路径中回收并且将基板保持器馈送到路径 。

公开(公告)号：US06740209B2

公开(公告)日：2004-05-25

申请号：US10205604

申请日：2002-07-26

申请人： Masahiro Shibamoto ,  Shinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

发明人： Masahiro Shibamoto ,  Shinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

IPC分类号： C23C1434

CPC分类号： H01J37/3429 ,  C23C14/352 ,  C23C14/505 ,  H01J37/3408

摘要： This application discloses a multi-layer film deposition apparatus comprising; plural cathodes comprising targets respectively, a main rotation mechanism for rotating each cathode together, and a substrate holder to hold a substrate onto which a multi-layer film is deposited by sputtering. The targets are arranged at positions where their center axes are on a circumference. The main rotation mechanism rotates the cathodes around the axis in common to the circumference. The substrate is located at a position within an area in view to the direction of the axis. The area is formed of two loci of points on the rotated targets. One of the locus is drawn by the point nearest to the axis, and the other locus is drawn by the point furthest from the axis.

摘要翻译： 本申请公开了一种多层成膜装置，包括： 分别包括靶的多个阴极，用于将每个阴极一起旋转的主旋转机构和用于保持通过溅射沉积多层膜的基板的基板保持器。 目标被布置在其中心轴在圆周上的位置。 主旋转机构将阴极围绕轴线共同旋转到圆周。 基板位于与轴线方向相对的区域内的位置。 该区域由旋转目标上的两个点组成。 其中一个轨迹由最靠近轴的点绘制，另一个轨迹由距离轴最远的点绘制。

公开(公告)号：US08956515B2

公开(公告)日：2015-02-17

申请号：US13028877

申请日：2011-02-16

申请人： Masahiro Shibamoto

发明人： Masahiro Shibamoto

IPC分类号： H01J37/34 ,  G11B5/851 ,  C23C14/34

CPC分类号： G11B5/851 ,  C23C14/3464 ,  H01J37/3405 ,  H01J37/3429 ,  H01J37/347

摘要： Provided is a sputtering apparatus which can form a multilayer film giving high productivity and with less spiral pattern by effective use of targets, and a method of forming multilayer film using the apparatus. An embodiment is a multilayer-film sputtering apparatus comprising: a rotatable cathode unit (30) having cathodes (7a and 7b) arranged on the same circumference with respect to the rotational center, and having a power-supply mechanism for supplying power to each cathode; a sensor (14) for detecting the position of cathode; and a rotation mechanism for rotating the cathode unit (30).

摘要翻译： 本发明提供一种溅射装置，其可以通过有效地使用目标而形成具有高生产率和较少螺旋图案的多层膜，以及使用该装置形成多层膜的方法。 一种实施方案是一种多层膜溅射装置，包括：具有相对于旋转中心布置在同一圆周上的阴极（7a和7b）的可旋转阴极单元（30），并且具有用于向每个阴极供电的供电机构 ; 用于检测阴极位置的传感器（14）; 以及用于旋转阴极单元（30）的旋转机构。

公开(公告)号：US08281740B2

公开(公告)日：2012-10-09

申请号：US12502344

申请日：2009-07-14

申请人： Kazuto Yamanaka ,  Masahiro Shibamoto ,  Ayumu Miyoshi ,  Satoshi Hitomi ,  David Djulianto Djayaprawira

发明人： Kazuto Yamanaka ,  Masahiro Shibamoto ,  Ayumu Miyoshi ,  Satoshi Hitomi ,  David Djulianto Djayaprawira

IPC分类号： C23C16/00

CPC分类号： G11B5/8404 ,  H01J27/024 ,  H01J37/04 ,  H01J37/09 ,  H01J37/3053 ,  H01J37/32422 ,  H01J2237/022 ,  H01J2237/0453 ,  H01J2237/0822 ,  H01J2237/0825

摘要： The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.

摘要翻译： 本发明提供一种基板处理装置，其能够抑制经由基板彼此相对布置的离子束发生器的内部的相互污染和/或损坏，以及磁记录介质制造方法。 根据本发明的实施例的基板处理装置包括将离子束施加到待加工基板W的一个表面的第一离子束发生器和将另一个表面施加离子束的第二离子束发生器 经由基板W彼此相对布置的第一离子束发生器中的第一格栅的区域和第二离子束发生器中的第二格栅的区域，每个区域对应于基板的开口 W，被遮挡。

公开(公告)号：US20110168545A1

公开(公告)日：2011-07-14

申请号：US13028877

申请日：2011-02-16

申请人： Masahiro Shibamoto

发明人： Masahiro Shibamoto

IPC分类号： C23C14/34

CPC分类号： G11B5/851 ,  C23C14/3464 ,  H01J37/3405 ,  H01J37/3429 ,  H01J37/347

摘要： Provided is a sputtering apparatus which can form a multilayer film giving high productivity and with less spiral pattern by effective use of targets, and a method of forming multilayer film using the apparatus. An embodiment is a multilayer-film sputtering apparatus comprising: a rotatable cathode unit (30) having cathodes (7a and 7b) arranged on the same circumference with respect to the rotational center, and having a power-supply mechanism for supplying power to each cathode; a sensor (14) for detecting the position of cathode; and a rotation mechanism for rotating the cathode unit (30).

摘要翻译： 本发明提供一种溅射装置，其可以通过有效地使用目标而形成具有高生产率和较少螺旋图案的多层膜，以及使用该装置形成多层膜的方法。 一种实施方案是一种多层膜溅射装置，包括：具有相对于旋转中心布置在同一圆周上的阴极（7a和7b）的可旋转阴极单元（30），并且具有用于向每个阴极供电的供电机构 ; 用于检测阴极位置的传感器（14）; 以及用于旋转阴极单元（30）的旋转机构。