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    Ion beam generator
    1.
    发明授权
    Ion beam generator 有权
    离子束发生器

    公开(公告)号：US08378576B2

    公开(公告)日：2013-02-19

    申请号：US12897400

    申请日：2010-10-04

    申请人： Einstein Noel Abarra ,  Yasushi Miura ,  Eiji Fujiyama ,  Naoyuki Suzuki ,  Yasuyuki Taneda ,  Yasushi Kamiya

    发明人： Einstein Noel Abarra ,  Yasushi Miura ,  Eiji Fujiyama ,  Naoyuki Suzuki ,  Yasuyuki Taneda ,  Yasushi Kamiya

    IPC分类号： H05B31/26

    CPC分类号： H01J27/08

    摘要： [Objection of the invention]An ion beam generator, a thermal distortion in a grid assembly is reduced. [Structure to solve the objection]Thermal expansion coefficients αP, αM and αG, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: αP>αM≧αG. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.

    摘要翻译： 本发明的目的在于减少电网组件中的热变形的离子束发生器。 [解决异议的结构]选择放电室，安装台（40）和提取栅极电极组件（20）的侧壁（1A）的热膨胀系数αP，αM和αG具有以下关系：αP>αM ≧αG。 例如，放电室侧壁的材料为不锈钢铝，栅格材料为Mo，W或C，平台材料为Ti或Mo。

    Apparatus and method for processing substrate using ion beam
    2.
    发明授权
    Apparatus and method for processing substrate using ion beam 有权
    使用离子束处理衬底的设备和方法

    公开(公告)号：US09312102B2

    公开(公告)日：2016-04-12

    申请号：US13315567

    申请日：2011-12-09

    申请人： Yasushi Kamiya ,  Einstein Noel Abarra ,  Yuta Konno

    发明人： Yasushi Kamiya ,  Einstein Noel Abarra ,  Yuta Konno

    IPC分类号： H01J37/302 ,  H01J37/305

    CPC分类号： H01J37/302 ,  G05B15/02 ,  H01J37/3053 ,  H01J2237/0044 ,  H01J2237/043 ,  H01J2237/334

    摘要： A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.

    摘要翻译： 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。