COMPOUND SEMICONDUCTOR DEVICE
    1.
    发明申请

    公开(公告)号:US20220246751A1

    公开(公告)日:2022-08-04

    申请号:US17508933

    申请日:2021-10-22

    IPC分类号: H01L29/778 H01L29/78

    摘要: Provided is a compound semiconductor device. The compound semiconductor device according to embodiments of the inventive concept includes a first semiconductor layer having a fin extending in a first direction on a substrate, an upper gate electrode extending in a second direction perpendicular to the first direction on the first semiconductor layer, a second semiconductor layer disposed between a sidewall of the fin and the upper gate electrode, a dielectric layer disposed between a top surface of the fin and the upper gate electrode, and a lower gate structure connected to a bottom surface of the first semiconductor layer by passing through the substrate.