METHOD FOR MANUFACTURING POWER SEMICONDUCTOR DEVICE

    公开(公告)号:US20220223696A1

    公开(公告)日:2022-07-14

    申请号:US17574271

    申请日:2022-01-12

    Abstract: Disclosed is a method for manufacturing a power semiconductor device. The method includes forming a lower active layer on a substrate, forming an upper active layer on both sides of the lower active layer, forming a source electrode, a drain electrode, and a gate electrode on the upper active layer and the lower active layer, and forming a heat dissipating and electrical ground electrode penetrating the substrate and the lower active layer and connected to a lower surface of the lower active layer. The upper active layer may be epitaxially grown at a high doping concentration by a selective deposition method using a mask layer that exposes a portion of the lower active layer as a blocking layer.

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