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    Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device
    3.
    发明授权
    Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device 有权
    用于补偿衬底不平坦度的光刻设备和方法，确定图案形成装置不平坦度的影响，以及确定热负荷对图案形成装置的影响

    公开(公告)号：US08345265B2

    公开(公告)日：2013-01-01

    申请号：US12616185

    申请日：2009-11-11

    申请人： Dirk-Jan Bijvoet

    发明人： Dirk-Jan Bijvoet

    IPC分类号： G01B11/24

    CPC分类号： G03F7/70875 ,  G03F7/707 ,  G03F7/70783 ,  G03F9/7003 ,  G03F9/7034

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor configured to measure a height level, curvature and/or angle of a surface of a patterning device supported on the support.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上;以及传感器，被配置为测量支撑在支撑体上的图案形成装置的表面的高度水平，曲率和/或角度。

    Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
    4.
    发明授权
    Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device 有权
    装置制造方法，用于保持图案形成装置的方法和包括用于将分子施加到图案形成装置的夹持区域上的涂敷器的光刻装置

    公开(公告)号：US07933000B2

    公开(公告)日：2011-04-26

    申请号：US11600325

    申请日：2006-11-16

    申请人： Johannes Onvlee ,  Dirk-Jan Bijvoet

    发明人： Johannes Onvlee ,  Dirk-Jan Bijvoet

    IPC分类号： G03B27/62

    CPC分类号： G03F7/707

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to a clamp area of the patterning device.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 提供了诸如加湿器的施加器，以将诸如水分子的分子提供到图案形成装置的夹持区域。

    LITHOGRAPHIC APPARATUS AND METHODS FOR COMPENSATING SUBSTRATE UNFLATNESS, DETERMINING THE EFFECT OF PATTERNING DEVICE UNFLATNESS, AND DETERMINING THE EFFECT OF THERMAL LOADS ON A PATTERNING DEVICE
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHODS FOR COMPENSATING SUBSTRATE UNFLATNESS, DETERMINING THE EFFECT OF PATTERNING DEVICE UNFLATNESS, AND DETERMINING THE EFFECT OF THERMAL LOADS ON A PATTERNING DEVICE 有权
    用于补偿基板不透光性，确定图案装置不透光性的影响的光刻装置和方法，以及确定热载荷对图案装置的影响

    公开(公告)号：US20100129741A1

    公开(公告)日：2010-05-27

    申请号：US12616185

    申请日：2009-11-11

    申请人： Dirk-Jan Bijvoet

    发明人： Dirk-Jan Bijvoet

    IPC分类号： G03F7/20 ,  G03B27/54

    CPC分类号： G03F7/70875 ,  G03F7/707 ,  G03F7/70783 ,  G03F9/7003 ,  G03F9/7034

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor configured to measure a height level, curvature and/or angle of a surface of a patterning device supported on the support.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上;以及传感器，被配置为测量支撑在支撑体上的图案形成装置的表面的高度水平，曲率和/或角度。

    LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING LAYER
    6.
    发明申请
    LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING LAYER 有权
    具有VISCO-ELASTIC DAMPING LAYER的卡盘的平面设备

    公开(公告)号：US20090231567A1

    公开(公告)日：2009-09-17

    申请号：US12370741

    申请日：2009-02-13

    申请人： Peter Paul HEMPENIUS ,  Dirk-Jan Bijvoet ,  Youssef Karel Maria De Vos ,  Ramidin Izair Kamidi

    发明人： Peter Paul HEMPENIUS ,  Dirk-Jan Bijvoet ,  Youssef Karel Maria De Vos ,  Ramidin Izair Kamidi

    IPC分类号： G03B27/54 ,  G03B27/62

    CPC分类号： G03F7/7095 ,  G03F7/707 ,  G03F7/70783

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

    摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持基板的工作台，被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，配置成将物体（例如，图案形成装置）保持和定位到支撑件或基板上的基板上的卡盘 桌子，卡盘包括基座和约束层。 包括粘弹性材料的阻尼层设置在基部和约束层之间。

    System and method for an improved illumination system in a lithographic apparatus
    7.
    发明授权
    System and method for an improved illumination system in a lithographic apparatus 有权
    用于光刻设备中改进的照明系统的系统和方法

    公开(公告)号：US07355677B2

    公开(公告)日：2008-04-08

    申请号：US11007588

    申请日：2004-12-09

    申请人： Dirk-Jan Bijvoet

    发明人： Dirk-Jan Bijvoet

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70825 ,  G03F7/70291

    摘要： An array of individually controllable elements for use in lithography in which each of the individually controllable elements is comprised of a planar reflector mounted on supports on a substrate by way of elongate hinges.

    摘要翻译： 用于光刻的单独可控元件的阵列，其中每个可独立控制的元件由通过细长铰链安装在基板上的支撑件上的平面反射器构成。

    Lithographic apparatus, device manufacturing method and position control method
    8.
    发明授权
    Lithographic apparatus, device manufacturing method and position control method 失效
    光刻设备，器件制造方法和位置控制方法

    公开(公告)号：US08330940B2

    公开(公告)日：2012-12-11

    申请号：US12580082

    申请日：2009-10-15

    申请人： Dirk-Jan Bijvoet

    发明人： Dirk-Jan Bijvoet

    IPC分类号： G03B27/62 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

    CPC分类号： G03B27/58 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7085

    摘要： A lithographic apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation to form a patterned beam of radiation; a positioning device configured to move the support in a first direction; a measurement device configured to measure a relative position of the patterning device with respect to the support and to generate a measuring signal, the measurement device including a reference unit constructed and arranged to be coupled to the patterning device at a fixed relative position, and a position sensor configured to measure the position of the reference unit with respect to the support, wherein the positioning device is constructed and arranged to correct a position of the support based on the measuring signal.

    摘要翻译： 光刻设备包括被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为对辐射束进行图案化以形成图案化的辐射束; 定位装置，其构造成沿着第一方向移动所述支撑件; 测量装置，其被配置为测量图案形成装置相对于支撑件的相对位置并产生测量信号，所述测量装置包括参考单元，所述参考单元构造和布置成在固定的相对位置处联接到图案形成装置，以及 位置传感器被配置为测量参考单元相对于支撑件的位置，其中定位装置被构造和布置成基于测量信号校正支撑件的位置。

    Lithographic apparatus and device manufacturing method
    9.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号：US07884919B2

    公开(公告)日：2011-02-08

    申请号：US11350278

    申请日：2006-02-09

    申请人： Peter Hempenius ,  Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Youssef Karel Maria De Vos

    发明人： Peter Hempenius ,  Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Youssef Karel Maria De Vos

    IPC分类号： G03B27/42

    CPC分类号： G03F7/707

    摘要： A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.

    摘要翻译： 一种器件制造方法包括将图案从图案形成装置转移到衬底上。 该方法包括将图案形成装置和支撑件组合在一起，并且在图案形成装置和支撑件之间施加基本上静止的力以保持图案形成装置。 图案形成装置现在被基本上动态的力激发以使其能够滑动。 然后，图案形成装置对准，并且图案从图案形成装置转移到基板上。 图案形成装置可以用交替的加速度激发。 当图案形成装置被激发时，允许图案形成装置相对于支撑件沉降，从而改善它们之间的摩擦，以减少图案形成装置的滑动或局部滑动的风险。

    Lithographic apparatus and device manufacturing method
    10.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07733463B2

    公开(公告)日：2010-06-08

    申请号：US11418452

    申请日：2006-05-05

    申请人： Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Arjan Martin Van Der Wel

    发明人： Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Arjan Martin Van Der Wel

    IPC分类号： G03B27/62 ,  G03B27/64 ,  G03F1/00

    CPC分类号： G03F7/707

    摘要： A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.

    摘要翻译： 公开了一种构造成支撑图案化物体的支撑件，所述图案形成物体能够将辐射束在其横截面中赋予图案以形成图案化的辐射束，其中所述支撑件包括多个具有多个局部 在使用中分别设置有图案形成对象的接触区域和被构造成将图案形成对象夹持到多个接触区域的夹具，其中每个结构被构造成使得每个局部接触区域的局部剪切刚度基本上 在每个局部接触区域分别与局部摩擦极限平衡。