公开(公告)号：US20070247605A1

公开(公告)日：2007-10-25

申请号：US11410282

申请日：2006-04-25

Applicant: Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

Inventor： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G02B27/0068 ,  G03F7/70266

Abstract: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

Abstract translation: 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

公开(公告)号：US20060176458A1

公开(公告)日：2006-08-10

申请号：US11375039

申请日：2006-03-15

Applicant: Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

Abstract translation: 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。

公开(公告)号：US20050264778A1

公开(公告)日：2005-12-01

申请号：US10857614

申请日：2004-06-01

Applicant: Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US20050259232A1

公开(公告)日：2005-11-24

申请号：US10847661

申请日：2004-05-18

Applicant: Bob Streefkerk ,  Sjoerd Donders ,  Erik Loopstra ,  Johannes Mulkens

Inventor： Bob Streefkerk ,  Sjoerd Donders ,  Erik Loopstra ,  Johannes Mulkens

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Abstract translation: 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。

公开(公告)号：US20070268471A1

公开(公告)日：2007-11-22

申请号：US11710408

申请日：2007-02-26

Applicant: Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Donders ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Roelof Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Helmar Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20060268250A1

公开(公告)日：2006-11-30

申请号：US11499780

申请日：2006-08-07

Applicant: Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Johannes Mulkens ,  Hans Jansen ,  Jacobus Johannus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Johannes Mulkens ,  Hans Jansen ,  Jacobus Johannus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20050175776A1

公开(公告)日：2005-08-11

申请号：US10986178

申请日：2004-11-12

Applicant: Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

Inventor： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Abstract translation: 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

Applicant: Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

Inventor： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20070201012A1

公开(公告)日：2007-08-30

申请号：US11529587

申请日：2006-09-29

Applicant: Erik Loopstra ,  Johannes Mulkens

Inventor： Erik Loopstra ,  Johannes Mulkens

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。

公开(公告)号：US20050132914A1

公开(公告)日：2005-06-23

申请号：US10743266

申请日：2003-12-23

Applicant: Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

Inventor： Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

IPC: G03F7/20 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

Abstract: A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.

Abstract translation: 检测器检测投影光束或对准光束的路径中的液体。 然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。 可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。