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公开(公告)号：US20030232277A1
公开(公告)日：2003-12-18
申请号：US10422789
申请日：2003-04-25
IPC分类号： G03F007/039 , G03F007/038
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A1）含有至少一种由所述具体式表示的重复单元的树脂，并另外含有至少一种由特定式表示的重复单元，其通过以下方式增加了在碱性显影液中的溶解度 酸的作用，和（B）能够通过光化射线或辐射的作用产生酸的化合物。
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公开(公告)号：US20040053161A1
公开(公告)日：2004-03-18
申请号：US10642182
申请日：2003-08-18
IPC分类号： G03F007/20 , G03F007/30 , G03F007/038
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/12
摘要： A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution by the action of an acid, (b) a compound capable of generating an acid upon irradiation with actinic rays or a radiation, (c) a low-molecular compound having a molecular weight of 3,000 or lower, wherein the value determined with the specific calculation formula is from 0.1 to 0.5, and (d) a solvent.
摘要翻译： 一种化学放大型抗蚀剂组合物，其包含：（a）包含具有侧链的重复单元的树脂，所述侧链含有特定部分结构，并且通过酸的作用增加在碱性显影液中的溶解度，（b）能够产生 （3）分子量为3000以下的低分子化合物，其特征在于，计算式为0.1〜0.5，（d）为溶剂。
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公开(公告)号：US20030219679A1
公开(公告)日：2003-11-27
申请号：US10417209
申请日：2003-04-17
IPC分类号： G03F007/004
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/122
摘要： A positive-working resist composition comprising (A1) a resin containing a repeating unit represented by the specific general formula, wherein the resin increases the solubility in an alkali developing solution by the action of an acid.
摘要翻译： 一种正性抗蚀剂组合物，其包含（A1）含有由特定通式表示的重复单元的树脂，其中所述树脂通过酸的作用增加了在碱性显影液中的溶解度。
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公开(公告)号：US20030203308A1
公开(公告)日：2003-10-30
申请号：US10378920
申请日：2003-03-05
发明人： Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F007/004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A photosensitive resin composition of the present invention comprises (A) a resin having a repeating unit represented by formula (IA) and a repeating unit containing an acid decomposable group and copolymerizable with formula (IA), which is decomposed under the action of an acid to increase the solubility in an alkali developer, (B1) a compound capable of generating an aliphatic or aromatic sulfonic acid substituted by at least one fluorine atom upon irradiation with actinic rays or radiation, (B2) a compound capable of generating an aliphatic or aromatic sulfonic acid containing no fluorine atom, or an aliphatic or aromatic carboxylic acid upon irradiation with actinic rays or radiation, and (C) a solvent.
摘要翻译： 本发明的感光性树脂组合物包含（A）具有式（IA）所示重复单元的树脂和含有酸分解基团并且可与式（IA）共聚的重复单元，其在酸的作用下分解 为了提高在碱性显影剂中的溶解性，（B1）能够在用光化射线或辐射照射时能够产生被至少一个氟原子取代的脂肪族或芳香族磺酸的化合物，（B2）能够产生脂肪族或芳香族的化合物 不含氟原子的磺酸，或在光化射线或辐射照射时为脂肪族或芳香族羧酸，（C）溶剂。
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公开(公告)号：US20040175645A1
公开(公告)日：2004-09-09
申请号：US10373170
申请日：2003-02-26
IPC分类号： G03F007/038
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108 , Y10S430/115 , Y10S430/165
摘要： The photosensitive resin composition comprising: (A) a resin containing (A1) a repeating unit having at least two groups represented by the specific general formula; and (B) a compound capable of generating an acid by the action with one of an actinic ray and a radiation.
摘要翻译： 该感光性树脂组合物包含：（A）含有（A1）具有至少两个由具体通式表示的基团的重复单元的树脂; 和（B）能够通过用光化射线和辐射之一的作用产生酸的化合物。
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公开(公告)号：US20030194641A1
公开(公告)日：2003-10-16
申请号：US10372240
申请日：2003-02-25
IPC分类号： G03F007/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition comprising (A) a resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution, having a repeating unit represented by formula (Y) defined in the specification, (B) a compound capable of generating an acid upon irradiation of an actinic ray or radiation, and (C) a solvent.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过酸的作用分解以提高在碱性显影液中的溶解度的树脂，其具有由说明书中定义的式（Y）表示的重复单元，（B）具有化合物 在光化射线或辐射照射时产生酸，和（C）溶剂。
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公开(公告)号：US20020006578A1
公开(公告)日：2002-01-17
申请号：US09860440
申请日：2001-05-21
发明人： Kunihiko Kodama , Shinichi Kanna
IPC分类号： G03F007/038
CPC分类号： C07D275/06 , C07C381/12 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过用光化射线或辐射照射产生特定磺酰亚胺化合物的化合物和（B）具有通过酸作用而分解以提高组合物的溶解度的基团的树脂 在碱性显影剂中。 抗蚀剂组合物在使用能够超细加工的短波长光源和正性化学放大抗蚀剂的光刻技术中具有改进的分辨能力和改进的工艺容限，例如曝光裕度和焦深。
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公开(公告)号：US20010055726A1
公开(公告)日：2001-12-27
申请号：US09851113
申请日：2001-05-09
发明人： Shinichi Kanna , Kunihiko Kodama
IPC分类号： G03F007/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/115
摘要： A positive radiation-sensitive composition comprising: (a) a resin whose solubility in an alkali developer increases by the action of an acid; (b) a compound which generates a carboxylic acid having a molecular weight of 100 or less upon irradiation with an actinic ray or a radiant ray; (c) a surfactant; and (d) a solvent.
摘要翻译： 一种正性辐射敏感性组合物，其包含：（a）其在碱性显影剂中的溶解度通过酸的作用而增加的树脂; （b）在用光化射线或辐射线照射时产生分子量为100以下的羧酸的化合物; （c）表面活性剂; 和（d）溶剂。
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公开(公告)号：US20040009430A1
公开(公告)日：2004-01-15
申请号：US10455459
申请日：2003-06-06
IPC分类号： G03F007/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/114 , Y10S430/115
摘要： The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light , where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).
摘要翻译： 本发明的感光性树脂组合物是优异的感光性树脂组合物，其在使用160nm以下的曝光光源的情况下显示出显着的透射性，更具体地说，线边缘粗糙度和显影时间依赖性小的F2准分子激光， 基础形成问题得到改善; 并且包含通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，其中树脂含有特定的重复单元; 其中化合物包括选自特定化合物（B1），（B2），（B3）和（B3）中的至少两种化合物， （B4）。
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公开(公告)号：US20030134224A1
公开(公告)日：2003-07-17
申请号：US10187291
申请日：2002-07-02
发明人： Kazuyoshi Mizutani , Shinichi Kanna
IPC分类号： G03F007/004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition comprises (A) a resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation.
摘要翻译： 正型抗蚀剂组合物包含（A）包含特定重复单元的树脂和（B）在用光化射线和辐射之一照射时能够产生酸的化合物。
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