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公开(公告)号：US20040185373A1
公开(公告)日：2004-09-23
申请号：US10798360
申请日：2004-03-12
发明人： Kunihiko Kodama
IPC分类号： G03C001/76
CPC分类号： G03F7/0392 , G03F7/0046 , Y10S430/122
摘要： A photosensitive composition comprising a compound that generates an acid upon irradiation of an actinic ray or radiation (Component A), a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution (Component B), a performance adjusting agent (Component C) and a solvent (Component D), wherein a, b, c and d, which represents contents of Component A, Component B, Component C and Component D in terms of part by weight respectively, satisfy formulae (1) and (2) shown below, provided that c may be 0.(anullbnullc)/(anullbnullcnulld)null0.03 to 0.10nullnull(1)null(Number of aromatic ring included in molecule of Component Anull1)nullanull/(anullbnullc)null0.05 to 0.80nullnull(2)
摘要翻译： 一种光敏组合物，其包含在光化学射线或辐射照射时产生酸的化合物（组分A），通过酸的作用分解以增加在碱性显影溶液中的溶解度的树脂（组分B），性能调节 试剂（组分C）和溶剂（组分D），其中分别表示组分A，组分B，组分C和组分D的含量的a，b，c和d分别满足式（1） （a + b + c）/（a + b + c + d）= 0.03〜0.10（1）[（成分A的分子中包含的芳香环的数） +1）xa] /（a + b + c）= 0.05〜0.80（2）
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公开(公告)号：US20030044717A1
公开(公告)日：2003-03-06
申请号：US10174944
申请日：2002-06-20
发明人： Kunihiko Kodama
IPC分类号： G03F007/038
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122 , Y10S430/124
摘要： A positive photosensitive composition comprising (A1) a compound that generates an alkanesulfonic acid in which the null-position is substituted with a fluorine atom upon irradiation of an actinic ray or radiation, (A2) an onium salt of an alkanesulfonic acid in which the null-position is not substituted with a fluorine atom, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase a solubility rate in an alkali developing solution.
摘要翻译： 一种正型光敏组合物，其包含（A1）在光化射线或辐射照射时产生其中所述α-位被氟原子取代的烷基磺酸的化合物，（A2）烷基磺酸的鎓盐，其中所述α - 位未被氟原子取代，（B）具有单环或多环脂环族烃结构并通过酸的作用而分解以提高碱显影液中溶解度的树脂。
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公开(公告)号：US20030044715A1
公开(公告)日：2003-03-06
申请号：US10116137
申请日：2002-04-05
发明人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F007/039 , G03F007/30
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.
摘要翻译： 正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物 或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。
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公开(公告)号：US20030008241A1
公开(公告)日：2003-01-09
申请号：US10093411
申请日：2002-03-11
发明人： Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03F007/039
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.
摘要翻译： 一种正性抗蚀剂组合物，其包含（A）具有脂族环状烃基的特定树脂，并且通过酸的作用在碱性显影液中的溶解速度提高，（B）通过照射产生酸的特定化合物 的光化射线或辐射。 该组合物的分辨能力和曝光余量优异，并且可以适用于使用远紫外线，特别是ArF准分子激光束的微光制造。
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公开(公告)号：US20020051933A1
公开(公告)日：2002-05-02
申请号：US09921691
申请日：2001-08-06
发明人： Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F007/038
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/115 , Y10S430/122
摘要： A positive photosensitive composition comprises: (A) a compound generating an acid upon irradiation with one of an actinic ray and radiation; (B) a resin containing a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility to an alkali developer by the action of an acid; and (C) an onium salt of carboxylic acid.
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6.发明申请公开(公告)号：US20040063827A1
公开(公告)日：2004-04-01
申请号：US10669603
申请日：2003-09-25
IPC分类号： C08K005/41
CPC分类号： G03F7/0397 , C08K5/45 , G03F7/0045 , H01L21/312 , Y10S430/106 , Y10S430/122
摘要： A positive resist composition comprising: (A) a resin having alicyclic hydrocarbon groups in side chains, containing specified two types of repeating units, which increases the solubility in an alkali developing solution by the action of an acid; and (B) a particular sulfonium compound having a specified structure and capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）在侧链中具有脂环族烃基的树脂，其含有特定的两种重复单元，其通过酸的作用增加在碱性显影液中的溶解度; 和（B）具有特定结构并且能够在用光化射线或辐射照射时产生酸的特定锍化合物。
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公开(公告)号：US20030224285A1
公开(公告)日：2003-12-04
申请号：US10338737
申请日：2003-01-09
发明人： Hajime Nakao , Yasumasa Kawabe , Toru Fujimori , Kunihiko Kodama
IPC分类号： G03F007/039
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the null-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.
摘要翻译： 一种正型感光性组合物，其包含（A1）在光化射线或辐射照射时产生被至少一个氟原子取代的芳香族磺酸和/或具有至少一个氟原子的基团的化合物，（B）具有 单环或多环脂环族烃结构，并通过酸的作用分解以提高在碱性显影液中的溶解度，（C）具有至少三个羟基或取代羟基和至少一个环状结构的化合物或（A2 ）其中磺酸的α-位没有被氟原子和/或羧酸的鎓盐取代的烷基磺酸的鎓盐。
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公开(公告)号：US20030165776A1
公开(公告)日：2003-09-04
申请号：US10330332
申请日：2002-12-30
IPC分类号： G03F007/038
CPC分类号： G03F7/0045 , G03F7/0382
摘要： A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.
摘要翻译： 一种负性抗蚀剂组合物，其包含（A）碱溶性聚合物，（B）在酸的作用下形成所述碱溶性聚合物（A）的分子之间的交联的交联剂和（C）特定的酸 发电机，其可以通过用电子束或X射线照射满足关于图案形成中的灵敏度，分辨率，图案轮廓和线边缘粗糙度的所有性能要求。
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公开(公告)号：US20030077540A1
公开(公告)日：2003-04-24
申请号：US10150967
申请日：2002-05-21
发明人： Kunihiko Kodama , Kenichiro Sato , Toru Fujimori
IPC分类号： G03F007/004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.
摘要翻译： 一种正型光敏组合物，其包含（A）在光化射线或辐射照射时产生酸的特定酸产生剂，和（B）具有单环或多环脂环烃结构并通过酸作用分解的树脂至 增加在碱性显影液中的溶解度。
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公开(公告)号：US20020006578A1
公开(公告)日：2002-01-17
申请号：US09860440
申请日：2001-05-21
发明人： Kunihiko Kodama , Shinichi Kanna
IPC分类号： G03F007/038
CPC分类号： C07D275/06 , C07C381/12 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过用光化射线或辐射照射产生特定磺酰亚胺化合物的化合物和（B）具有通过酸作用而分解以提高组合物的溶解度的基团的树脂 在碱性显影剂中。 抗蚀剂组合物在使用能够超细加工的短波长光源和正性化学放大抗蚀剂的光刻技术中具有改进的分辨能力和改进的工艺容限，例如曝光裕度和焦深。
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