公开(公告)号：US20180009212A1

公开(公告)日：2018-01-11

申请号：US15677042

申请日：2017-08-15

Applicant: FUJIFILM CORPORATION

Inventor： Ryo SAITO

IPC: B41C1/10 ,  B41N1/14

CPC classification number: B41C1/10 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/24 ,  B41C2210/266 ,  B41N1/14 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/09 ,  G03F7/11

Abstract: The purpose of the present invention is to provide a planographic printing plate precursor which suppresses bleeding or transferring of a substance over time while maintaining edge stain preventing performance, a plate-making method of a planographic printing plate, and a printing method using the planographic printing plate. The planographic printing plate precursor includes a support; and an image recording layer formed on the support, in which layer arrangement described in any one of the following i to iv is provided, a hydrophilizatioin agent layer containing a hydrophilization agent is provided in a region in a specific position of the layer arrangement from the end portion of the planographic printing plate precursor to a portion inside the end portion by 1 cm, and the image recording layer includes an infrared absorbing agent and a specific radical polymerizable compound. i: a mode in which the support layer and the image recording layer are provided in this order. ii: a mode in which the support layer, an undercoat, and the image recording layer are provided in this order. iii: a mode in which the support layer, the image recording layer, and a protective layer are provided in this order. iv: a mode in which the support layer, the undercoat, the image recording layer, and the protective layer are provided in this order.

公开(公告)号：US20250028249A1

公开(公告)日：2025-01-23

申请号：US18893990

申请日：2024-09-24

Applicant: FUJIFILM Corporation

Inventor： Akihiko OHTSU ,  Masahiro YOSHIDOME ,  Tetsuya KAMIMURA ,  Ryo SAITO

IPC: G03F7/32 ,  G03F7/42

Abstract: An object of the present invention is to provide a chemical solution that, in the case of being used in a step of bringing a contact-target member and the chemical solution into contact with each other, is less likely to cause a predetermined defect in the contact-target member. A chemical solution according to the present invention includes an organic solvent and a metal-containing particle including a metal element selected from the group consisting of Fe, Ni, and Zn, wherein an I value determined by a method X is 0.010 to 10.000, method X: the chemical solution is applied onto a substrate to prepare a subject; a surface of the subject is analyzed by being scanned with laser using laser-ablation-inductively coupled plasma-mass spectrometry, to obtain charts for the metal elements in which an abscissa axis indicates laser scanning time and an ordinate axis indicates ion detection intensity; the ion detection intensity of the charts is accumulated for the scanning time to determine accumulated ion detection intensities of the metal elements; the accumulated ion detection intensities of the metal elements are added up to determine a total accumulated ion detection intensity; and the total accumulated ion detection intensity is divided by a laser scanning area to obtain an I value in units of counts/mm2.

公开(公告)号：US20230097195A1

公开(公告)日：2023-03-30

申请号：US17902899

申请日：2022-09-05

Applicant: FUJIFILM Corporation

Inventor： Akihiko OHTSU ,  Masahiro YOSHIDOME ,  Yukihisa KAWADA ,  Ryo SAITO

IPC: H01L21/66 ,  H01J49/10 ,  H01J49/00 ,  H01J49/04 ,  G01N21/94 ,  G01N21/95

Abstract: Provided are a method for inspecting a chemical solution, the method being able to analyze minute foreign matter in the chemical solution, a method for producing a chemical solution, a method for controlling a chemical solution, a method for producing a semiconductor device, a method for inspecting a resist composition, the method being able to analyze minute foreign matter in the resist composition, a method for producing a resist composition, a method for controlling a resist composition, and a method for checking a contamination status of a semiconductor manufacturing apparatus, the method being able to control minute foreign matter in the semiconductor manufacturing apparatus.
The method for inspecting a chemical solution includes a step 1X of preparing a chemical solution; a step 2X of applying the chemical solution onto a semiconductor substrate; and a step 3X of measuring whether there is a defect on a surface of the semiconductor substrate to obtain positional information of the defect on the surface of the semiconductor substrate, irradiating, based on the positional information, the defect on the surface of the semiconductor substrate with a laser beam, collecting an analytical sample obtained by the irradiation by using a carrier gas, and subjecting the analytical sample to inductively coupled plasma mass spectrometry.

公开(公告)号：US20150062238A1

公开(公告)日：2015-03-05

申请号：US14529158

申请日：2014-10-31

Applicant: FUJIFILM CORPORATION

Inventor： Kaoru TOJO ,  Ryo SAITO ,  Katsuto SUMI

IPC: C09D11/324 ,  C09D133/00 ,  C08K5/3437 ,  C08K5/23 ,  C08K5/3417 ,  C09D11/322 ,  C08K5/21

CPC classification number: C09D11/324 ,  C08K3/04 ,  C08K5/21 ,  C08K5/23 ,  C08K5/3417 ,  C08K5/3437 ,  C09D11/322 ,  C09D11/40 ,  C09D11/54 ,  C09D133/00

Abstract: A black ink composition includes: carbon black and a water-insoluble resin that covers at least a part of the surface of the carbon black; a cyan pigment and a water-insoluble resin that covers at least a part of the surface of the cyan pigment; a magenta pigment and a water-insoluble resin that covers at least a part of the surface of the magenta pigment; water-insoluble resin particle; and water, wherein a content ratio of the carbon black is from 1.0 to 2.0% by mass with respect to the total mass of the composition, and a total amount of pigments is from 1.8 to 3.5% by mass with respect to the total mass of the composition. The black ink composition can be used in an ink set and an image forming method.

Abstract translation: 黑色油墨组合物包括：炭黑和覆盖碳黑表面的至少一部分的水不溶性树脂; 青色颜料和覆盖青色颜料表面的至少一部分的水不溶性树脂; 品红色颜料和覆盖品红色颜料表面的至少一部分的水不溶性树脂; 水不溶性树脂颗粒; 和水，其中相对于组合物的总质量，炭黑的含量比为1.0-2.0质量％，并且颜料的总量相对于总质量为1.8-3.5质量％ 组成。 黑色油墨组合物可用于油墨组和成像方法中。

公开(公告)号：US20130307899A1

公开(公告)日：2013-11-21

申请号：US13955012

申请日：2013-07-31

Applicant: FUJIFILM CORPORATION

Inventor： Ryo SAITO ,  Yasufumi OOISHI

IPC: C09D11/00

CPC classification number: C09D11/38 ,  B41J2/2107 ,  B41M5/0011 ,  B41M5/0017 ,  B41M5/0023 ,  B41M7/009 ,  C01P2004/51 ,  C09C1/56 ,  C09C1/565 ,  C09C3/10 ,  C09D7/62 ,  C09D11/322 ,  C09D11/40 ,  C09D11/54

Abstract: An ink jet composition which contains a pigment selected from the group consisting of a self-dispersing pigment and a resin-coated pigment in which at least a portion of a surface of a pigment particle is coated with a water-insoluble resin; at least one selected from the group consisting of polyvinylpyrrolidone, polyvinyl alcohol and polyethylene glycol, the content of which is from 0.01% by mass to less than 1.00% by mass based on the total mass of the composition; a resin particle that is insoluble or hardly soluble in water; a wax particle that is insoluble or hardly soluble in water; and water.

Abstract translation: 一种喷墨组合物，其含有选自自分散颜料和树脂涂布颜料的颜料，其中颜料颗粒的至少一部分表面被水不溶性树脂涂布; 选自聚乙烯吡咯烷酮，聚乙烯醇和聚乙二醇中的至少一种，其含量基于组合物的总质量为0.01质量％至小于1.00质量％; 不溶于水或难溶于水的树脂颗粒; 不溶于水或难溶于水的蜡颗粒; 和水。

公开(公告)号：US20230395366A1

公开(公告)日：2023-12-07

申请号：US18451810

申请日：2023-08-17

Applicant: FUJIFILM Corporation

Inventor： Akihiko OHTSU ,  Masahiro YOSHIDOME ,  Yukihisa KAWADA ,  Ryo SAITO

IPC: H01L21/02 ,  H01L21/66 ,  G01N21/95 ,  G01N21/88

CPC classification number: H01L21/02098 ,  H01L22/24 ,  H01L22/12 ,  G01N21/9501 ,  G01N2021/8838 ,  G01N21/8851 ,  G01N2021/8835 ,  G01N2021/8861 ,  G01N21/8806

Abstract: Provided are a defect removal device and a defect removal method capable of removing defects of a semiconductor substrate with high accuracy, and a pattern forming method and a method of manufacturing an electronic device using the semiconductor substrate from which defects on a surface are removed. The defect removal device includes: a first light source unit that emits incidence light for detecting a defect on a semiconductor substrate; a surface defect measurement unit including a detection unit that detects the defect on the semiconductor substrate based on radiated light radiated by reflection or scattering of the incidence light from the defect of the semiconductor substrate; a removal unit that irradiates the semiconductor substrate with laser light to remove the defect based on position information of the defect on the semiconductor substrate; and an alignment unit that adjusts optical axes of the incidence light and the laser light, in which the optical axes of the incidence light and the laser light are adjusted by the alignment unit such that the incidence light and the laser light are emitted to the semiconductor substrate.

公开(公告)号：US20230369086A1

公开(公告)日：2023-11-16

申请号：US18357183

申请日：2023-07-24

Applicant: FUJIFILM Corporation

Inventor： Akihiko OHTSU ,  Masahiro YOSHIDOME ,  Yukihisa KAWADA ,  Ryo SAITO

IPC: H01L21/67 ,  H01L21/66 ,  H01J49/10 ,  G01N21/95

CPC classification number: H01L21/67288 ,  H01L22/12 ,  H01J49/105 ,  G01N21/9501

Abstract: Provided are an analysis apparatus and an analysis method capable of analyzing a smaller defect on a surface of a semiconductor substrate. An analysis apparatus includes a surface defect measurement unit that measures presence or absence of a defect on a surface of a semiconductor substrate, and obtains positional information on the surface of the semiconductor substrate for the defect on the surface of the semiconductor substrate, and an analysis section that performs inductively coupled plasma mass spectrometry by irradiating the defect on the surface of the semiconductor substrate with laser light based on the positional information of the defect on the surface of the semiconductor substrate, and collecting an analysis sample obtained by the irradiation using a carrier gas.

公开(公告)号：US20160121596A1

公开(公告)日：2016-05-05

申请号：US14994265

申请日：2016-01-13

Applicant: FUJIFILM Corporation

Inventor： Ryo SAITO

IPC: B41C1/10

CPC classification number: B41C1/10 ,  B41C1/1025 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/26 ,  G03F7/0045 ,  G03F7/11

Abstract: Provided is a lithographic printing plate precursor having extremely excellent and excellent on-board developability even after the lithographic printing plate precursor is preserved for a long period of time, and excellent preservation stability, by a lithographic printing plate precursor including, on a support, an image recording layer containing (A) a thermoplastic fine particle polymer, (B) an infrared ray absorbing dye, and (C) a polyglycerol compound, in which the infrared ray absorbing dye is an infrared ray absorbing dye expressed by the Formula (I) as defined herein, and the polyglycerol compound is a compound having three or more structural units selected from structural units expressed by the Formulae (1) and (2) as defined herein.

Abstract translation: 本发明提供一种平版印刷版原版，即使在平版印刷版原版保存长时间后也具有极好的和优异的板上显影性，并且通过包含在载体上的平版印刷版原版具有优异的保存稳定性 含有（A）热塑性微粒聚合物，（B）红外线吸收染料和（C）聚甘油化合物的图像记录层，其中红外线吸收染料是由式（I）表示的红外线吸收染料， 如本文所定义，并且聚甘油化合物是具有三个或更多个结构单元的化合物，所述结构单元选自由本文定义的式（1）和（2）表示的结构单元。