公开(公告)号：US20230016801A1

公开(公告)日：2023-01-19

申请号：US17848193

申请日：2022-06-23

Applicant: Fujimi Incorporated

Inventor： Shogo Tsubota ,  Masaaki Ito ,  Keiji Ashitaka ,  Jun Shinoda ,  Yusuke Kawasaki

IPC: C09G1/02 ,  C09C1/30

Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.

公开(公告)号：US11554967B2

公开(公告)日：2023-01-17

申请号：US16071214

申请日：2017-01-19

Applicant: FUJIMI INCORPORATED

Inventor： Shogo Tsubota ,  Robert Hepburn

IPC: C01G25/02 ,  C01F7/36

Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.

公开(公告)号：US12012337B2

公开(公告)日：2024-06-18

申请号：US18094542

申请日：2023-01-09

Applicant: FUJIMI INCORPORATED

Inventor： Shogo Tsubota ,  Robert Hepburn

IPC: C01G25/02 ,  C01F7/36

CPC classification number: C01G25/02 ,  C01F7/36 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/16

Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.

公开(公告)号：US11518682B2

公开(公告)日：2022-12-06

申请号：US16818114

申请日：2020-03-13

Applicant: FUJIMI INCORPORATED

Inventor： Yusuke Kawasaki ,  Shogo Tsubota ,  Masaaki Ito ,  Jun Shinoda ,  Keiji Ashitaka

IPC: C01B33/145 ,  C01B33/141 ,  C01B33/14

Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.

公开(公告)号：US11767224B2

公开(公告)日：2023-09-26

申请号：US17950784

申请日：2022-09-22

Applicant: FUJIMI INCORPORATED

Inventor： Yusuke Kawasaki ,  Shogo Tsubota ,  Masaaki Ito ,  Jun Shinoda ,  Keiji Ashitaka

IPC: C01B33/145 ,  C01B33/141 ,  C01B33/14

CPC classification number: C01B33/145 ,  C01B33/141 ,  C01B33/1412 ,  C01B33/14 ,  C01P2004/03 ,  C01P2004/62 ,  C01P2004/64

Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.

公开(公告)号：US20140308155A1

公开(公告)日：2014-10-16

申请号：US14359495

申请日：2012-11-19

Applicant: FUJIMI INCORPORATED

Inventor： Hitoshi Morinaga ,  Hiroshi Asano ,  Maiko Asai ,  Shogo Tsubota ,  Kazusei Tamai

IPC: C09G1/02

CPC classification number: C09G1/02 ,  B24B29/00 ,  B24B37/044

Abstract: An efficient polishing method for polishing an alloy material to have an excellent mirror surface is provided. The alloy material contains a main component and 0.1% by mass or more of an element that has a Vickers hardness (HV) different from the Vickers hardness of the main component by 5 or more. A polishing composition used in the polishing method contains abrasive grains and an oxidant. The alloy material is preferably an aluminum alloy, a titanium alloy, a stainless steel, a nickel alloy, or a copper alloy. It is also preferable that the alloy material is subjected to preliminary polishing before being subjected to polishing in which the polishing composition is used.

Abstract translation: 提供了一种用于抛光合金材料以具有优异镜面的高效抛光方法。 该合金材料含有主要成分，0.1质量％以上的维氏硬度（HV）与主成分的维氏硬度不同的维氏硬度（HV）为5以上。 用于抛光方法的抛光组合物含有磨粒和氧化剂。 合金材料优选为铝合金，钛合金，不锈钢，镍合金或铜合金。 还优选在进行使用抛光组合物的研磨之前对合金材料进行预研磨。

公开(公告)号：US11499070B2

公开(公告)日：2022-11-15

申请号：US15544389

申请日：2016-01-19

Applicant: FUJIMI INCORPORATED

Inventor： Keiji Ashitaka ,  Shogo Tsubota

IPC: C09G1/02 ,  B24B37/00 ,  C01B33/146 ,  C09K3/14 ,  H01L21/304 ,  B24B37/04 ,  C01B33/148 ,  C01B33/149 ,  C07F7/02 ,  H01L21/3105 ,  H01L21/768

Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

公开(公告)号：US10913857B2

公开(公告)日：2021-02-09

申请号：US16465790

申请日：2018-09-28

Applicant: FUJIMI INCORPORATED

Inventor： Shogo Tsubota ,  Souma Taguchi ,  Keiji Ashitaka ,  Naoya Miwa

IPC: C09C1/30 ,  C01B32/956

Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.

公开(公告)号：US09611406B2

公开(公告)日：2017-04-04

申请号：US14363060

申请日：2012-11-15

Applicant: FUJIMI INCORPORATED

Inventor： Kazusei Tamai ,  Keiji Ashitaka ,  Shogo Tsubota

IPC: C09G1/02 ,  B24B37/04 ,  H01L21/3105 ,  C09K3/14

CPC classification number: C09G1/02 ,  B24B37/044 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053

Abstract: A polishing composition of the present invention contains abrasive grains each having a surface with protrusions. Parts of the abrasive grains have larger particle diameters than the volume-based average particle diameter of the abrasive grains, and the average of values respectively obtained by dividing a height of each protrusion on the surface of each abrasive grain belonging to the parts of the abrasive grains by the width of a base portion of the same protrusion is 0.170 or more. Protrusions on the surfaces of abrasive grains belonging to the parts of the abrasive grains that have larger particle diameters than the volume-based average particle diameter of the abrasive grains have an average height of 3.5 nm or more. The polishing composition has a content of an organic alkali of 100 mmol or less per kilogram of the abrasive grains in the polishing composition.

公开(公告)号：US20250002756A1

公开(公告)日：2025-01-02

申请号：US18756412

申请日：2024-06-27

Applicant: FUJIMI INCORPORATED

Inventor： Shota Suzuki ,  Tatsuhiko Hirano ,  Shogo Tsubota ,  Masaaki Ito ,  Yusuke Kawasaki ,  Keiji Ashitaka

IPC: C09G1/02

Abstract: An object of the present invention is to provide a polishing composition and a polishing method, with which SiN can be selectively polished at a high polishing removal rate as compared with SiO2.
The polishing composition contains colloidal silica in which an organic acid is fixed on a surface and a pH adjusting agent, in which an average aspect ratio of the colloidal silica in which the organic acid is fixed on the surface is 1.38 or more.