Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding
    1.
    发明授权
    Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding 有权
    通过选择顶部包层的波导芯宽度来控制波导双折射的方法和装置

    公开(公告)号:US07609917B2

    公开(公告)日:2009-10-27

    申请号:US12079930

    申请日:2008-03-28

    IPC分类号: G02B6/12 G02B6/10 G02B6/34

    CPC分类号: G02B6/12023 G02B6/126

    摘要: A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. In one example, a dopant concentration within a top cladding material is between 3-6% (wt.). Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.

    摘要翻译: 本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。 在一个实例中,顶部包层材料内的掺杂剂浓度在3-6%(重量)之间。 给定一个调整的顶部包层组成,预先选择波导芯的宽度,使得双折射最小化,即零或接近零。 通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。 根据这种应力分布,确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。 对于给定的波导宽度范围,该关系确定偏振相关波长的零值或近零值。 因此,可以选择波导的宽度使得偏振相关波长最小化。

    Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top clad
    2.
    发明授权
    Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top clad 有权
    通过选择顶部包层的波导芯宽度来控制波导双折射的方法和装置

    公开(公告)号:US06850670B2

    公开(公告)日:2005-02-01

    申请号:US09894049

    申请日:2001-06-28

    IPC分类号: G02B6/12 G02B6/126 G02B6/34

    CPC分类号: G02B6/126 G02B2006/121

    摘要: A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. A tuned top cladding describes a pre-existing dopant concentration within a top cladding material. Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.

    摘要翻译: 本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。 调谐的顶部包层描述了顶部包层材料中预先存在的掺杂剂浓度。 给定一个调整的顶部包层组成,预先选择波导芯的宽度,使得双折射最小化,即零或接近零。 通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。 根据这种应力分布,确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。 对于给定的波导宽度范围,该关系确定偏振相关波长的零值或近零值。 因此,可以选择波导的宽度使得偏振相关波长最小化。

    Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding
    3.
    发明申请
    Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding 有权
    通过选择顶部包层的波导芯宽度来控制波导双折射的方法和装置

    公开(公告)号:US20080240655A1

    公开(公告)日:2008-10-02

    申请号:US12079930

    申请日:2008-03-28

    IPC分类号: G02B6/34 G02B6/10

    CPC分类号: G02B6/12023 G02B6/126

    摘要: A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. In one example, a dopant concentration within a top cladding material is between 3-6% (wt.). Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.

    摘要翻译: 本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。 在一个实例中,顶部包层材料内的掺杂剂浓度在3-6%(重量)之间。 给定一个调整的顶部包层组成,预先选择波导芯的宽度,使得双折射最小化,即零或接近零。 通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。 根据这种应力分布,确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。 对于给定的波导宽度范围,该关系确定偏振相关波长的零值或近零值。 因此,可以选择波导的宽度使得偏振相关波长最小化。

    Reducing polarization dependent loss caused by polarization dependent wavelength shift using core over-etch for planar lightwave circuit fabrication

    公开(公告)号:US06542687B2

    公开(公告)日:2003-04-01

    申请号:US09873068

    申请日:2001-05-31

    IPC分类号: G02B610

    摘要: A method of making a polarization insensitive optical waveguide structure. An optical core layer is formed on a substrate, wherein the optical core layer has a higher refractive index than the substrate. A mask is formed over the optical core layer. The unmasked areas of the optical core layer are then over-etched to define the core, wherein the over-etching removes the unmasked area of the optical core layer and a portion of the substrate disposed beneath the unmasked area, and defines the optical core. The mask is subsequently removed from the optical core. A cladding layer is then formed over the optical core and the substrate, the cladding layer having a lower refractive index than the optical core, to form a polarization insensitive optical waveguide structure. The amount of over-etching can be controlled to control an amount of substrate disposed beneath the unmasked area of the optical core layer that is removed. The amount of substrate removed, in turn, controls the polarization sensitivity of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined to minimize the polarization dependent wavelength shift and the polarization dependent loss of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined in accordance with a blanket stress of the cladding layer. The over-etching can be within a range between 7.5 percent and 30 percent.

    Top cap process for reducing polarization dependent wavelength shift in planar lightwave circuits
    5.
    发明授权
    Top cap process for reducing polarization dependent wavelength shift in planar lightwave circuits 有权
    用于减小平面光波电路中的偏振相关波长偏移的顶盖工艺

    公开(公告)号:US06826345B1

    公开(公告)日:2004-11-30

    申请号:US10165903

    申请日:2002-06-10

    IPC分类号: G02B610

    CPC分类号: G02B6/126 G02B2006/121

    摘要: One aspect of the invention relates to a PLC containing at least one waveguide on a bottom clad layer, each waveguide having a top cap layer on an upper surface thereof, and a top clad layer over the waveguides having the top cap on the upper portion thereof. The presence of the top cap reduces waveguide birefringence and resultant polarization dependence in PLCs, particularly for reducing polarization dependent wavelength shift in AWGs. Another aspect of the invention relates to methods of making PLCs involving forming a waveguide layer on a bottom clad layer, forming a top cap layer on the waveguide layer, patterning the waveguide layer and the top cap layer using a mask to form waveguides having a top cap on an upper portion thereof, and forming a top clad layer over the waveguides having the top cap on the upper portion thereof.

    摘要翻译: 本发明的一个方面涉及一种在底部包层上含有至少一个波导的PLC,每个波导在其上表面上具有顶盖层,并且在该波导上方的顶部覆盖层在其上部具有顶盖 。 顶盖的存在降低了PLC中的波导双折射和合成极化依赖性,特别是为了减少AWG中的偏振相关波长偏移。 本发明的另一方面涉及制造PLC的方法,其涉及在底部包层上形成波导层,在波导层上形成顶盖层,使用掩模对波导层和顶盖层进行图案化以形成具有顶部的波导 盖在其上部,并且在其上部具有顶盖的波导上形成顶部包层。

    Pixel via and methods of forming the same
    8.
    发明授权
    Pixel via and methods of forming the same 有权
    像素通道和形成方法

    公开(公告)号:US09134527B2

    公开(公告)日:2015-09-15

    申请号:US13079599

    申请日:2011-04-04

    IPC分类号: G02B26/00 B81B7/00

    摘要: This disclosure provides systems, methods and apparatuses for pixel vias. In one aspect, a method of forming an electromechanical device having a plurality of pixels includes depositing an electrically conductive black mask on a substrate at each of four corners and along at least one edge region of each pixel, depositing a dielectric layer over the black mask, depositing an optical stack including a stationary electrode over the dielectric layer, and depositing a mechanical layer over the optical stack. The method further includes providing a conductive via in a first pixel of the plurality of pixels, the via disposed in the dielectric layer and electrically connecting the stationary electrode to the black mask, the via disposed in a position along an edge of the first pixel, spaced offset from the edge of the first pixel in a direction towards the center of the first pixel.

    摘要翻译: 本公开提供了用于像素通孔的系统,方法和装置。 在一个方面,一种形成具有多个像素的机电装置的方法包括在四个角中的每一个并且沿着每个像素的至少一个边缘区域在基板上沉积导电黑色掩模,在黑色掩模上沉积介电层 在电介质层上沉积包括固定电极的光学堆叠,并在光学堆叠上沉积机械层。 所述方法还包括在所述多个像素的第一像素中提供导电通孔,所述通孔设置在所述电介质层中,并且将所述固定电极电连接到所述黑色掩模,所述通孔设置在沿着所述第一像素的边缘的位置, 在朝向第一像素的中心的方向上偏离第一像素的边缘。

    IMOD PIXEL ARCHITECTURE FOR IMPROVED FILL FACTOR, FRAME RATE AND STICTION PERFORMANCE
    9.
    发明申请
    IMOD PIXEL ARCHITECTURE FOR IMPROVED FILL FACTOR, FRAME RATE AND STICTION PERFORMANCE 审中-公开
    改进填充因子,框架速率和姿态性能的IMOD像素架构

    公开(公告)号:US20140071139A1

    公开(公告)日:2014-03-13

    申请号:US13614973

    申请日:2012-09-13

    CPC分类号: G02B26/001

    摘要: Pixels that include display elements that are configured with different structural dimensions corresponding to the color of light they provide are disclosed. In one implementation, a display device includes an array having a plurality of electromechanical pixels disposed on a substrate, each pixel including at least a first display element and a second display element. Each of the first and second display elements interferometrically modulating light by moving a reflective element between a relaxed position spaced apart from the substrate to an actuated position further away from the substrate than the relaxed position by applying a voltage across the reflective element and a stationary electrode. The stationary electrode of each display element is sized to provide actuation of the movable reflective element using the same actuation voltage even though the electrical gap through which the reflective element moves is different within a pixel.

    摘要翻译: 公开了包括配置有不同结构尺寸的显示元件的像素,其对应于它们提供的光的颜色。 在一个实施方式中,显示装置包括具有设置在基板上的多个机电像素的阵列,每个像素至少包括第一显示元件和第二显示元件。 第一和第二显示元件中的每一个通过在反射元件和电极之间施加电压使反射元件在与基板间隔开的松弛位置与远离基板的致动位置之间移动而干涉地调制光, 。 每个显示元件的固定电极的尺寸设置成使用相同的致动电压来提供可移动反射元件的致动,即使反射元件移动的电隙在像素内是不同的。

    ELECTROMECHANICAL SYSTEMS DEVICE WITH NON-UNIFORM GAP UNDER MOVABLE ELEMENT
    10.
    发明申请
    ELECTROMECHANICAL SYSTEMS DEVICE WITH NON-UNIFORM GAP UNDER MOVABLE ELEMENT 审中-公开
    机电系统装置与可移动元件下的非均匀接缝

    公开(公告)号:US20130088498A1

    公开(公告)日:2013-04-11

    申请号:US13269285

    申请日:2011-10-07

    IPC分类号: G06T1/00 G02B26/00 H01L21/30

    CPC分类号: G02B26/001

    摘要: Systems, methods and apparatus are provided for electromechanical systems devices having a non-uniform gap under a mechanical layer. An electromechanical systems device includes a movable element supported at its edges over a substrate by at least two support structures. The movable element can be spaced from the substrate by a gap having two or more different heights in two or more corresponding distinct regions. The gap has a first height in a first region below the gap, such as an active area of the device, and a second height in a second region adjacent the support structure. In an interferometric modulator implementation, the second region can be encompasses within an anchor region with a black mask.

    摘要翻译: 为在机械层下具有不均匀间隙的机电系统装置提供系统,方法和装置。 机电系统装置包括通过至少两个支撑结构在其衬底上的边缘处支撑的可移动元件。 可移动元件可以在两个或更多个相应的不同区域中与衬底间隔开具有两个或更多个不同高度的间隙。 间隙在间隙下方的第一区域中具有第一高度,例如装置的有效面积,以及与支撑结构相邻的第二区域中的第二高度。 在干涉式调制器实现中,第二区域可以包围在具有黑色掩模的锚定区域内。