THROUGH-SUBSTRATE VIA AND REDISTRIBUTION LAYER WITH METAL PASTE
    2.
    发明申请
    THROUGH-SUBSTRATE VIA AND REDISTRIBUTION LAYER WITH METAL PASTE 有权
    通过基底和重新分配层与金属膏

    公开(公告)号:US20110210452A1

    公开(公告)日:2011-09-01

    申请号:US13126286

    申请日:2009-10-21

    IPC分类号: H01L23/48 H01L21/768

    摘要: The invention relates to a semiconductor device for use in a stacked configuration of the semiconductor device and a further semiconductor device. The semiconductor device comprises: a substrate (5) comprising at least part of an electronic circuit (7) provided at a first side thereof. The substrate (5) comprises a passivation layer (19) at the first side and a substrate via that extends from the first side to a via depth beyond a depth of the electronic circuit (7) such that it is reconfigurable into a through-substrate via (10) by backside thinning of the substrate (5). The semiconductor device further comprises: a patterned masking layer (15) on the first side of the substrate (5). The patterned masking layer (15) comprises at least a trench (16) extending fully through the patterned masking layer (15). The trench has been filled with a redistribution conductor (20). The substrate via and the redistribution conductor (20) comprise metal paste (MP) and together form one piece. The effect of the features of the semi-conductor device of the invention is that there is no physical interface between those the through-substrate via (10) and the redistribution conductor (20). As a consequence of the invention the parasitic resistance of this electrical connection is reduced, which results in a better electrical performance of the semiconductor device. The invention further relates to a method of manufacturing such semiconductor device. And the invention relates to a semiconductor assembly comprising a stacked configuration of a plurality of such semiconductor devices.

    摘要翻译: 本发明涉及一种用于半导体器件和另一半导体器件的叠层结构的半导体器件。 半导体器件包括:衬底(5),其包括设置在其第一侧的电子电路(7)的至少一部分。 衬底(5)包括在第一侧处的钝化层(19)和衬底通孔,其从第一侧延伸到超过电子电路(7)的深度的通孔深度,使得其可重新配置成贯穿衬底 通过(10)通过衬底(5)的背面变薄。 半导体器件还包括:在衬底(5)的第一侧上的图案化掩模层(15)。 图案化掩模层(15)包括至少一个完全延伸穿过图案化掩模层(15)的沟槽(16)。 沟槽已经填充有再分布导体(20)。 衬底通孔和再分布导体(20)包括金属膏(MP)并且一起形成一片。 本发明的半导体器件的特征的效果在于通孔(10)和再分布导体(20)之间没有物理界面。 作为本发明的结果,该电连接的寄生电阻降低,这导致半导体器件的更好的电性能。 本发明还涉及制造这种半导体器件的方法。 本发明涉及包括多个这样的半导体器件的叠层结构的半导体组件。

    ACTIVE CARRIER FOR CARRYING A WAFER AND METHOD FOR RELEASE
    3.
    发明申请
    ACTIVE CARRIER FOR CARRYING A WAFER AND METHOD FOR RELEASE 审中-公开
    用于承载波浪的主动载波和释放方法

    公开(公告)号:US20130323907A1

    公开(公告)日:2013-12-05

    申请号:US13876254

    申请日:2011-09-27

    IPC分类号: H01L21/683 H01L21/77

    摘要: In the field of release and pickup of ultrathin semiconductor dies, there is provided an active carrier (1) for carrying a wafer (20) and a method for using such a carrier (1). The wafer (20) comprises a particular die arrangement (P). The active carrier (1) comprises a base plate (2) and a number of energizers (7) constructed on or in this base plate (2). The energizers (7) are laid out in an arrangement corresponding to the die arrangement (P). The energizers (7) can locally energize an adhesive layer (3) in proximity to a selected die (14) from the die arrangement (P). By this local energizing of the adhesive layer (P), the selected die is loosened from the adhesive layer (3). Furthermore the active carrier (1) comprises a plurality of externally addressable contacts (12) and conduction pathways (9). The conduction pathways (9) connect the contacts (12) to the energizers (7) thereby allowing individual control over said energizers (7) by addressing said contacts (12).

    摘要翻译: 在超薄半导体管芯的释放和拾取领域中,提供了用于承载晶片(20)的有源载体(1)和使用这种载体(1)的方法。 晶片(20)包括特定的管芯装置(P)。 活动载体(1)包括基板(2)和在该基板(2)上或底板(2)上构造的多个激发器(7)。 激励器(7)以对应于管芯装置(P)的布置布置。 激发器(7)可以从模具装置(P)局部地激励靠近所选择的模具(14)的粘合剂层(3)。 通过该粘合剂层(P)的局部通电,所选择的模具从粘合剂层(3)松开。 此外,有源载体(1)包括多个可外部寻址的触点(12)和传导路径(9)。 传导路径(9)将触点(12)连接到激励器(7),由此通过寻址所述触点(12)来允许单独控制所述激励器(7)。