公开(公告)号：US10199479B2

公开(公告)日：2019-02-05

申请号：US14928681

申请日：2015-10-30

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Gunter Grasshoff ,  Catherine Labelle

IPC: H01L21/28 ,  H01L29/66 ,  H01L21/768 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/321

Abstract: A method includes performing a first chemical mechanical polishing process to define a polished replacement gate structure having a dished upper surface, wherein the polished dished upper surface of the polished replacement gate structure has a substantially curved concave configuration. A gate cap layer is formed above the polished replacement gate structure, wherein a bottom surface of the gate cap layer corresponds to the polished dished upper surface of the polished replacement gate structure.

公开(公告)号：US20160056263A1

公开(公告)日：2016-02-25

申请号：US14928681

申请日：2015-10-30

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Gunter Grasshoff ,  Catherine Labelle

IPC: H01L29/66 ,  H01L21/321 ,  H01L21/311 ,  H01L21/3105

CPC classification number: H01L29/66545 ,  H01L21/31055 ,  H01L21/31116 ,  H01L21/3212 ,  H01L21/76834 ,  H01L21/76897

Abstract: A method includes performing a first chemical mechanical polishing process to define a polished replacement gate structure having a dished upper surface, wherein the polished dished upper surface of the polished replacement gate structure has a substantially curved concave configuration. A gate cap layer is formed above the polished replacement gate structure, wherein a bottom surface of the gate cap layer corresponds to the polished dished upper surface of the polished replacement gate structure.

Abstract translation: 一种方法包括执行第一化学机械抛光工艺以限定具有碟形上表面的经抛光的替换栅极结构，其中抛光的替代栅极结构的抛光抛光上表面具有基本上弯曲的凹形构造。 在抛光的替代栅极结构上方形成栅极覆盖层，其中栅极盖层的底表面对应于抛光的替换栅极结构的抛光抛光上表面。

公开(公告)号：US20150050811A1

公开(公告)日：2015-02-19

申请号：US14527129

申请日：2014-10-29

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Sohan Mehta ,  Tong Qing Chen ,  Vikrant Chauhan ,  Ravi Srivastava ,  Catherine Labelle ,  Mark Kelling

IPC: H01L21/311

CPC classification number: H01L21/311 ,  H01L21/31144 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An illustrative test structure is disclosed herein that includes a plurality of first line features and a plurality of second line features. In this embodiment, each of the second line features have first and second opposing ends and the first and second line features are arranged in a grating pattern such that the first ends of the first line features are aligned to define a first side of the grating structure and the second ends of the first features are aligned to define a second side of the grating structure that is opposite the first side of the grating structure. The first end of the second line features has a first end that extends beyond the first side of the grating structure while the second end of the second line features has a first end that extends beyond the second side of the grating structure.

Abstract translation: 本文公开了包括多个第一线特征和多个第二线特征的说明性测试结构。 在该实施例中，每个第二线特征具有第一和第二相对端，并且第一和第二线特征被布置成光栅图案，使得第一线特征的第一端对准以限定光栅结构的第一侧 并且第一特征的第二端对齐以限定与光栅结构的第一侧相对的光栅结构的第二侧。 第二线特征的第一端具有延伸超过光栅结构的第一侧的第一端，而第二线特征的第二端具有延伸超过光栅结构的第二侧的第一端。