MAGNETIC FIELD SENSOR USING MAGNETIC TUNNELING JUNCTION (MTJ) STRUCTURES AND PASSIVE RESISTORS

    公开(公告)号:US20230076514A1

    公开(公告)日:2023-03-09

    申请号:US17469221

    申请日:2021-09-08

    Abstract: The present disclosure relates to integrated circuits, and, more particularly, to a magnetic field sensor using magnetic tunneling junction (MTJ) structures and passive resistors, and methods of manufacture and operation. The structure includes: a first portion of a circuit including a first MTJ structure and a first resistor coupled in series between a first voltage source and a second voltage source; and a second portion of the circuit including a second MTJ structure and a second resistor coupled in series between the first voltage source and the second voltage source. The first portion and the second portion are coupled in parallel between the first voltage source and the second voltage source.

    SPIN DIODE DEVICES
    7.
    发明申请

    公开(公告)号:US20220209102A1

    公开(公告)日:2022-06-30

    申请号:US17134582

    申请日:2020-12-28

    Abstract: According to various embodiments, a spin diode device may include a magnetic tunnel junction stack. The magnetic tunnel junction stack may include a lower magnetic layer, a tunnel barrier layer over the lower magnetic layer, and an upper magnetic layer over the tunnel barrier layer. The lower magnetic layer may include a lower magnetic film. The tunnel barrier layer comprising an insulating material. The upper magnetic layer may include an upper magnetic film. Each of the lower magnetic film and the upper magnetic film may have perpendicular magnetic anisotropy.

    SEMICONDUCTOR DEVICES AND METHODS OF FORMING SEMICONDUCTOR DEVICES

    公开(公告)号:US20210247470A1

    公开(公告)日:2021-08-12

    申请号:US16787226

    申请日:2020-02-11

    Abstract: A semiconductor device may be provided including a first series portion and a second series portion electrically connected in parallel with the first series portion. The first series portion may include a first MTJ stack and a first resistive element electrically connected in series. The second series portion may include a second MTJ stack and a second resistive element electrically connected in series. The first resistive element may include a third MTJ stack and the second resistive element may include a fourth MTJ stack. The first, second, third, and fourth MTJ stacks may include a same number of layers, which may include a fixed layer, a free layer, and a tunnelling barrier layer between the fixed layer and the free layer. Alternatively, the first resistive element may include a first transistor and the second resistive element may include a second transistor.

    MAGNETIC TUNNEL JUNCTION DEVICES AND METHODS OF FORMING THEREOF

    公开(公告)号:US20210159393A1

    公开(公告)日:2021-05-27

    申请号:US16695333

    申请日:2019-11-26

    Abstract: In a non-limiting embodiment, a semiconductor device may include a magnetic tunnel junction (MTJ) stack. The MTJ stack may include a reference layer comprising a magnetic layer, a first tunneling barrier layer arranged over the reference layer, a free layer comprising a magnetic layer arranged over the first tunneling barrier layer, and a capping layer arranged over the reference layer, the first tunneling barrier layer and the free layer. The capping layer may be a non-magnetic layer. According to various non-limiting embodiments, the capping layer may include a rare earth element. According to various non-limiting embodiments, the MTJ stack may further include a second tunneling barrier layer arranged between the free layer and the capping layer. The capping layer may contact the second tunneling barrier layer.

    MEMORY DEVICE AND METHOD OF FORMING THE SAME

    公开(公告)号:US20210057645A1

    公开(公告)日:2021-02-25

    申请号:US16548854

    申请日:2019-08-23

    Abstract: A memory device may be provided, including a first planar electrode, a second planar electrode, and a switching element arranged between the first planar electrode and the second planar electrode to where a first side of the switching element is arranged over the first planar electrode and where a second side of the switching element is arranged under the second planar electrode. The switching element is thicker at the first side than the second side, and the switching element is configured to provide a conductive filament formation region.

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