公开(公告)号：US5346804A

公开(公告)日：1994-09-13

申请号：US871008

申请日：1992-04-20

申请人： Geog Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Charlotte Eckes

发明人： Geog Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Charlotte Eckes

IPC分类号： C07D207/408 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  C07D207/40 ,  C07D207/404 ,  C07D207/44 ,  C07D207/452 ,  C07D317/24 ,  C09K9/02 ,  G03F7/004 ,  G03C1/73 ,  G03C1/725 ,  G03F7/025 ,  G03F7/027

CPC分类号： C07D207/404 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  C07D207/452 ,  C07D317/24 ,  G03F7/0045 ,  C07C2101/14 ,  C07C2102/28 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/126

摘要： A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,R.sup.2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R.sup.1 --SO.sub.2 --O--).sub.n X--, or R.sub.3 O--,R.sup.3 and R.sup.4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH.sub.2 or CH groups are optionally replaced by one or more of NR.sup.5, O, S, CO, CO--O, CO--NH, O--CO--NH, CO--NH--CO, NH--CO--NH, SO.sub.2, SO.sub.2 --O or SO.sub.2 --NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R.sup.3 and R.sup.4 are mutually linked to form an unsubstituted or substituted heterocyclic ring,R.sup.5 is an acyl radical,n is an integer from 1 to 3, andX is an alkylene, cyloalkylene, or arylene group.and which, in combination with alkali-soluble binders, give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.

摘要翻译： 一种辐射敏感性混合物，其包含式Ⅰ化合物，其在照射磺酸时产生并且可被后者可裂解（Ⅰ），其中R1是未取代或取代的烷基，氟化烷基，全氟烷基或芳基，R2是 氢原子，未取代或取代的烷基或未取代或取代的芳基，（R1-SO2-O-）nX-或R3O-，R3和R4相同或不同，为未取代或取代的烷基，环烷基烷基， 其中1至3个脂族CH 2或CH基团任选被NR 5，O，S，CO，CO-O，CO-NH，O-CO-NH，CO-NH-CO中的一种或多种替代的环烯基烷基或芳烷基 ，NH-CO-NH，SO2，SO2-O或SO2-NH，或未取代或取代的烯基，炔基，环烷基或环烯基，或R3和R4相互连接形成未取代或取代的杂环，R5是酰基 自由基，n为1〜3的整数，X为亚烷基，亚环烷基或亚芳基。 并且与碱溶性粘合剂组合，得到特别用于记录UV辐射和高能辐射材料的正性混合物。 该材料的高分辨率与高图像对比度以及优异的储存稳定性相结合。

公开(公告)号：US6063545A

公开(公告)日：2000-05-16

申请号：US871032

申请日：1992-04-20

申请人： Horst Roeschert ,  Juergen Fuchs ,  Walter Spiess ,  Charlotte Eckes ,  Georg Pawlowski ,  Ralph Dammel

发明人： Horst Roeschert ,  Juergen Fuchs ,  Walter Spiess ,  Charlotte Eckes ,  Georg Pawlowski ,  Ralph Dammel

IPC分类号： G03F7/00 ,  C07C303/28 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  G03F7/004 ,  G03F7/028 ,  G03F7/038 ,  H01L21/027 ,  G03C1/73

CPC分类号： G03F7/038 ,  C07C303/28 ,  Y10S430/122

摘要： A negative-working radiation-sensitive mixture containinga) a compound which generates a strong acid under the action of actinic radiation,b) a compound having at least two groups crosslinkable by means of acid andc) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions,wherein the compound (a) comprises a di-, tri- or tetra-hydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R--SO.sub.3 H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.

摘要翻译： 一种负性辐射敏感性混合物，其包含a）在光化辐射的作用下产生强酸的化合物，b）具有至少两个可通过酸交联的基团的化合物，和c）不溶于水的聚合物粘合剂 并且在碱性水溶液中可溶或至少可溶胀，其中化合物（a）包含可被进一步取代的二 - ，三 - 或四 - 羟基苯，或含有二 - ，三 - 或四 - 羟基苯基 分别用式R-SO 3 H的2,3或4个磺酸酯化，并且在宽光谱范围内被高分辨率和高灵敏度区分。 它还显示出高的热稳定性，并且在暴露时不会形成任何腐蚀性光解产物。 用该混合物生产的辐射敏感记录材料适用于制备光致抗蚀剂，电子部件，印版或用于化学研磨。

公开(公告)号：US5346806A

公开(公告)日：1994-09-13

申请号：US871011

申请日：1992-04-20

申请人： Georg Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Charlotte Eckes

发明人： Georg Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Charlotte Eckes

IPC分类号： C09K9/02 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/73 ,  G03C1/725 ,  G03F7/025 ,  G03F7/027

CPC分类号： C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C309/77 ,  G03F7/039 ,  C07C2101/14 ,  C07C2102/28 ,  C07C2102/44 ,  C07C2103/68 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/126

摘要： Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--,R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group,X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O,Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6,R.sup.4 is an acyl radical,R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical,R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical,k is 0, 1, 2, 3 or 4,m is an integer greater than 1 andn is 1, 2 or 3,generate sulfonic acids under irradiation and are cleavable by the latter. In combination with alkali-soluble binders, they give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The recording materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.

摘要翻译： 具有式I（I）的重复单元的二元磺酸衍生物，其中R 1是烷基，卤代烷基或芳基，R 2是氢原子，烷基，烯基或芳基或基团（R 1 -SO 2 - 环烷基亚烷基，亚芳基亚烷基，亚炔基，亚环烷基或亚芳基，X是亚烷基，亚环烷基或亚芳基，Y是O，S，CO，CO-O， SO2，SO2-O，NR4，CO-NH，O-CO-NR5，NH-CO-NR5或NR5-CO-O，Z是O，CO-NR6，O-CO-NR6或NH-CO-NR6， R4是酰基，R5是氢原子或烷基 - ，环烷基，烯基，炔基或芳基，R6是烷基，环烷基，烯基，炔基或芳基，k是0,1,2,3或4 ，m是大于1且n为1,2或3的整数，在照射下产生磺酸并可被后者切割。 与碱溶性粘合剂组合使用时，它们可以提供特别用于UV辐射和高能辐射记录材料的正性混合物。 记录材料通过高分辨率和高图像对比度以及优异的存储稳定性来区分。

公开(公告)号：US5198325A

公开(公告)日：1993-03-30

申请号：US199296

申请日：1988-05-26

申请人： Bernd Hupfer ,  Gerhard Buhr ,  Charlotte Eckes

发明人： Bernd Hupfer ,  Gerhard Buhr ,  Charlotte Eckes

IPC分类号： C08F2/48 ,  C08F2/50 ,  G03F7/029

CPC分类号： G03F7/0295

摘要： A photopolymerizable mixture for producing relief structures composed of highly heat-resistant polymers is described which is composed essentially of a soluble prepolymer containing photosensitive radicals bound in an ester-like manner to carboxyl groups, monomers and a photoinitiator, wherein the photoinitiator carries at least one trihalomethyl group which reacts when exposed to light. Of advantage is the fact that, even after exposure times which are by a factor of 4 to 5 shorter compared with conventional photopolymerizable mixtures, sharp-edged resist images can be obtained with a resolution of less than 3 .mu.m.

摘要翻译： 描述了一种用于生产由高耐热聚合物组成的浮雕结构的可光聚合混合物，其基本上由含有以类似羧基的光敏基团结合的可溶性预聚物，单体和光引发剂组成，其中光引发剂携带至少一种 当暴露于光时反应的三卤代甲基。 其优点在于，与常规的可光聚合混合物相比，即使曝光时间比4至5倍更短的事实，可以以小于3μm的分辨率获得锐利边缘的抗蚀剂图像。