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    POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION
    1.
    发明申请
    POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION 有权
    正极性组合物，使用组合物的图案形成方法和化合物在组合物中的使用

    公开(公告)号：US20110183258A1

    公开(公告)日：2011-07-28

    申请号：US12673096

    申请日：2008-08-11

    申请人： Hidenori Takahashi ,  Kenji Wada ,  Sou Kamimura

    发明人： Hidenori Takahashi ,  Kenji Wada ,  Sou Kamimura

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C309/73 ,  C07C69/716 ,  C07D319/12 ,  C07D311/94

    CPC分类号： C07C309/72 ,  C07C69/716 ,  C07C309/65 ,  C07C309/74 ,  C07C311/48 ,  C07C317/44 ,  C07C317/46 ,  C07C323/20 ,  C07C2601/14 ,  C07C2602/08 ,  C07C2602/10 ,  C07C2602/42 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在通过光化射线或辐射照射时能够产生酸的化合物，（B）能够通过酸的作用增加在碱性显影剂中的溶解度的树脂，和（C） 提供具有特定结构的化合物，其通过酸的作用而分解以产生酸，使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物作为正性抗蚀剂组合物，其表现出良好的性能 使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物的图案形成方法，线条粗糙度，图案塌陷，在正常曝光（干曝光）中的灵敏度和分辨率，浸渍曝光和双重曝光。

    Oxime Derivatives And Use Thereof As Latent Acids
    2.
    发明申请
    Oxime Derivatives And Use Thereof As Latent Acids 有权
    肟衍生物及其用作潜伏酸

    公开(公告)号：US20080085458A1

    公开(公告)日：2008-04-10

    申请号：US11632687

    申请日：2005-07-11

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

    IPC分类号： C07C291/06 ,  C07D209/56 ,  G03F1/00

    CPC分类号： C07C309/67 ,  B33Y70/00 ,  C07C309/65 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/66 ,  C07D209/86 ,  C07F9/097 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/12

    摘要： The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.

    摘要翻译： 本发明涉及式I，II或III的新型光酸产生剂化合物，其中R 1是例如C 1 -C 18烷基磺酰基或 苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽基磺酰基或菲基磺酰基，全部任意取代，或R 1是基团X， X 1，X 2和X 3 3彼此独立地为O或S; R'1，例如， 亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R 2是卤素或C 1 -C 10卤代烷基; X是卤素; Ar 1是例如联苯基或芴基，或者是取代的萘基; Ar'1'是亚杂芳基，任选被取代; R 8，R 9，R 10和R 11是例如C 1〜N 未取代或被卤素取代的C 1 -C 6烷基; 或R 8，R 9和R 10是未被取代或被C 1 -C 3烷基取代的苯基， 烷基或卤素; 或R 10和R 11一起是1,2-亚苯基或C 2 -C 6 -C 6亚烷基，其是 未取代或被C 1 -C 4烷基或卤素取代。

    Isocyanate modified blocked sulfonic acid ester as a crosslinking catalyst
    3.
    发明授权
    Isocyanate modified blocked sulfonic acid ester as a crosslinking catalyst 失效
    异氰酸酯改性阻燃磺化酸酯作为交联催化剂

    公开(公告)号：US5102961A

    公开(公告)日：1992-04-07

    申请号：US293650

    申请日：1989-01-05

    申请人： Werner J. Blank

    发明人： Werner J. Blank

    IPC分类号： B01J31/02 ,  B01J31/10 ,  B01J31/12 ,  C07C309/65 ,  C07C309/69 ,  C07C309/73 ,  C07C309/74 ,  C08G12/04 ,  C08G12/06 ,  C08L61/20 ,  C08L61/28

    CPC分类号： B01J31/10 ,  C07C309/73 ,  C07C309/74 ,  B01J2231/341 ,  B01J31/122

    摘要： The present invention is directed to a polymeric isocyanate modified epoxy blocked sulfonic acid ester as a catalyst for the crosslinking of polymers having hydroxyl, carboxyl, and amide functional groups with a crosslinking agent and resin compositions containing the same. More particularly, the present invention is directed to a polymeric isocyanate modified epoxy blocked sulfonic acid ester with a molecular weight of about 1000 preferably prepared from a sulfonic acid, an epoxy resin and a mono- or di-isocyanate and resin compositions containing the polymeric isocyanate modified epoxy blocked sulfonic acid ester catalyst. The catalyst when used in the crosslinking or curing of hydroxyl, carboxyl or amide containing polymers with an acid catalyzed amino-formaldehyde crosslinking agent, such as hexamethoxymethylmelamine ("HMMA"), produced polymeric film coatings which have superior hardness, impact resistance, adhesion, improved blister resistance, salt spray characteristics and flexibility.

    Compounds capable of generating an acid by light irradiation
    7.
    发明授权
    Compounds capable of generating an acid by light irradiation 失效
    能够通过光照射产生酸的化合物

    公开(公告)号：US5237059A

    公开(公告)日：1993-08-17

    申请号：US854853

    申请日：1992-03-20

    申请人： Kan Wakamatsu ,  Yuichi Wakata

    发明人： Kan Wakamatsu ,  Yuichi Wakata

    IPC分类号： B41M5/155 ,  C07C251/34 ,  C07C255/01 ,  C07C309/74 ,  C07C311/29 ,  C07C381/00 ,  C07D207/46 ,  C07D209/48 ,  C09K11/07

    CPC分类号： C07D209/48 ,  C07C309/74 ,  C07C381/00

    摘要： A compound capable of generating an acid by light irradiation selected from the group consisting of oxime sulfonic acid esters of formula (I): ##STR1## wherein R.sup.1 is an alkyl group, each of R.sup.2 and R.sup.3 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group and a cyano group, and R.sup.2 and R.sup.3 may optionally combine to form a ring; and N-hydroxyimidesulfonic acid esters of formula (II): ##STR2## wherein R.sup.1 is an alkyl group, and A is a group selected from the group consisting of a substituted or unsubstituted arylene group, a substituted or unsubstituted alkylene group and a substituted or unsubstituted alkenylene group, wherein the compound capable of generating an acid by light irradiation is useful as an image-forming materials, etc. and has high reactivity to light of from the near ultraviolet region to the visible region.

    摘要翻译： 能够通过光照射产生酸的化合物，其选自式（I）的肟磺酸酯：其中R 1是烷基，R 2和R 3各自选自 取代或未取代的烷基，取代或未取代的芳基和氰基，R 2和R 3可任选地结合形成环; 和式（II）的N-羟基酰亚胺磺酸酯：其中R 1是烷基，A是选自取代或未取代的亚芳基，取代或未取代的亚烷基和 取代或未取代的亚烯基，其中通过光照射产生酸的化合物可用作成像材料等，并且对从近紫外区域到可见光区域的光具有高反应性。

    Oxime derivatives and use thereof as latent acids
    9.
    发明授权
    Oxime derivatives and use thereof as latent acids 有权
    肟衍生物及其用作潜伏酸

    公开(公告)号：US07687220B2

    公开(公告)日：2010-03-30

    申请号：US11632687

    申请日：2005-07-11

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

    IPC分类号： G03F7/028 ,  C07C259/08

    CPC分类号： C07C309/67 ,  B33Y70/00 ,  C07C309/65 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/66 ,  C07D209/86 ,  C07F9/097 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/12

    摘要： The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.

    摘要翻译： 本发明涉及式I，II或III的新型光致酸产生剂化合物，其中R 1为例如C 1 -C 18烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，均为任选取代的，或者R 1为基团X 1 ，X2和X3彼此独立地为O或S; R'1，例如 亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R2是卤素或C1-C10卤代烷基; X是卤素; Ar1为例如联苯基或芴基，或为取代的萘基; Ar'1是杂亚芳基，任选取代; R8，R9，R10和R11例如是未被取代或被卤素取代的C1-C6烷基; 或R 8，R 9和R 10为未被取代或被C 1 -C 4烷基或卤素取代的苯基; 或R 10和R 11一起是1,2-亚苯基或未被取代或被C 1 -C 4烷基或卤素取代的C 2 -C 6亚烷基。

    Method and agent for determining a deaminase enzymatic activity
    10.
    发明授权
    Method and agent for determining a deaminase enzymatic activity 有权
    用于测定脱氨酶酶活性的方法和试剂

    公开(公告)号：US06733986B1

    公开(公告)日：2004-05-11

    申请号：US09530518

    申请日：2000-05-25

    申请人： Lyle Armstrong ,  Arthur James ,  Sylvain Orenga

    发明人： Lyle Armstrong ,  Arthur James ,  Sylvain Orenga

    IPC分类号： C12Q104

    CPC分类号： C07C309/74 ,  C12Q1/045 ,  C12Q1/34 ,  G01N2333/988

    摘要： A method and compound for detecting and identifying and/or quantifying a deaminase enzymatic activity of a microorganism, according to which an inoculum suspected of containing a microorganism with a deaminase activity is brought into contact with a culture medium for microorganisms, wherein the culture medium comprises at least one detection agent for demonstrating, by forming a colored product with a revealing agent, a deaminase enzymatic activity; said detection agent being an L-amino acid of following general formula (I): in which R represents an organic radical containing a cyclic ring, said cyclic ring being substituted with 1 to 3 substituents that are identical or different and each of which limits the diffusion in the culture medium of the &agr;-keto acid produced by the deamination of the at least one detection agent, as compared to where each of said substituents is not present.

    摘要翻译： 用于检测和/或定量微生物的脱氨酶酶活性的方法和化合物，根据该方法和化合物，怀疑含有具有脱氨酶活性的微生物的接种物与微生物培养基接触，其中所述培养基包含 至少一种用于通过形成具有显露剂的着色产物来显示脱氨酶酶活性的检测剂;所述检测剂是以下通式（I）的L-氨基酸：其中R表示含有环状 所述环状环被1至3个相同或不同的取代基取代，每个取代基限定了通过至少一种检测剂脱氨生成的α-酮酸的培养基中的扩散，与 每个所述取代基不存在。