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10 条记录 (耗时 0.023 秒)

    Process for fabricating a semiconductor structure having sidewalls
    1.
    发明授权
    Process for fabricating a semiconductor structure having sidewalls 失效
    制造具有侧壁的半导体结构的工艺

    公开(公告)号：US5378312A

    公开(公告)日：1995-01-03

    申请号：US164223

    申请日：1993-12-07

    申请人： George G. Gifford ,  Yeong-Jyh T. Lii ,  Jin J. Wu

    发明人： George G. Gifford ,  Yeong-Jyh T. Lii ,  Jin J. Wu

    IPC分类号： B08B7/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/00

    CPC分类号： H01L21/02071 ,  B08B7/0092 ,  H01L21/31116 ,  Y10S438/963

    摘要： A method of fabricating a semiconductor structure includes the steps of providing a semiconductor substrate having a material disposed thereon, masking the material with a mask having an appropriate pattern for forming a semiconductor structure, etching unmasked portions of the material so as to form the semiconductor structure, wherein the etching produces a film which attaches onto the semiconductor structure and/or on the semiconductor substrate, and removing the film from the semiconductor structure according to the steps of producing a cryogenic jet stream having cryogenic particles therein, and directing the cryogenic jet stream at the film such that the crogenic jet stream impinges on and causes the film to decrease in temperature so that a high temperature gradient develops between the film and the semiconductor structure, the film detaching from the semiconductor structure and fracturing due to contraction caused by the decrease in temperature and high temperature gradient.

    摘要翻译： 一种制造半导体结构的方法包括以下步骤：提供具有设置在其上的材料的半导体衬底，用具有用于形成半导体结构的适当图案的掩模掩蔽该材料，蚀刻材料的未屏蔽部分以形成半导体结构 其中所述蚀刻产生附着到所述半导体结构和/或所述半导体衬底上的膜，并且根据在其中制备其中具有低温颗粒的低温喷射流的步骤从所述半导体结构去除所述膜，以及引导所述低温射流 在膜上使得致动喷流影响并导致膜的温度降低，使得在膜和半导体结构之间产生高温梯度，膜与半导体结构分离并由于减少引起的收缩而断裂 在温度和高温梯度下。

    Aerosol cleaning method
    3.
    发明授权
    Aerosol cleaning method 失效
    气溶胶清洗方法

    公开(公告)号：US5372652A

    公开(公告)日：1994-12-13

    申请号：US76064

    申请日：1993-06-14

    申请人： Kris V. Srikrishnan ,  Jin J. Wu

    发明人： Kris V. Srikrishnan ,  Jin J. Wu

    IPC分类号： B08B5/02 ,  B08B7/00 ,  B08B7/02 ,  B24C1/00 ,  B24C3/22 ,  B24C3/32 ,  B24C5/04 ,  H01L21/00 ,  H01L21/304 ,  B08B5/00

    CPC分类号： H01L21/67028 ,  B08B7/0092 ,  B08B7/02 ,  B24C1/003 ,  B24C3/22 ,  B24C3/322 ,  B24C5/04 ,  Y10S134/902

    摘要： An aerosol cleaning apparatus for cleaning a substrate includes an aerosol producing means having a nozzle head. The nozzle head is positioned at a selected proximity and orientation to the substrate which is held by a rotatable holder. The aerosol spray dislodges particles from the substrate and the rotation of the substrate further assists in the removal of the loosened particles. A method of aerosol cleaning includes rotating a substrate at a preselected speed and spraying an aerosol jet in conjunction with the rotation to help in the removal of particles from the substrate.

    摘要翻译： 用于清洁基板的气溶胶清洁装置包括具有喷嘴头的气溶胶产生装置。 喷嘴头位于与由可旋转的保持器保持的基板的选定的接近和定向。 气溶胶喷雾从基板上移除颗粒，并且基板的旋转进一步有助于去除松散的颗粒。 一种气溶胶清洗方法包括以预先选定的速度旋转基底并与旋转一起喷射气雾剂射流以有助于从基底去除颗粒。

    Apparatus for producing cryogenic aerosol
    5.
    发明授权
    Apparatus for producing cryogenic aerosol 失效
    用于生产低温气溶胶的装置

    公开(公告)号：US5377911A

    公开(公告)日：1995-01-03

    申请号：US76052

    申请日：1993-06-14

    申请人： Tibor L. Bauer ,  William A. Cavaliere ,  Charles R. Dart, II ,  Timothy H. Freebern ,  David C. Linnell ,  James M. Miller ,  Jin J. Wu

    发明人： Tibor L. Bauer ,  William A. Cavaliere ,  Charles R. Dart, II ,  Timothy H. Freebern ,  David C. Linnell ,  James M. Miller ,  Jin J. Wu

    IPC分类号： B05B9/04 ,  B05B9/00 ,  B08B5/02 ,  B08B7/00 ,  B24C1/00 ,  B24C3/32 ,  B24C5/04 ,  F28D7/02 ,  H01L21/00 ,  H01L21/304 ,  B05B1/26 ,  F17C7/02

    CPC分类号： H01L21/67028 ,  B24C1/003 ,  B24C3/322 ,  B24C5/04

    摘要： An apparatus for producing aerosol from a substance includes a heat exchanger for receiving and cooling a substance. The heat exchanger includes a housing; a cryogenic reservoir comprising a solid material mounted within the housing; temperature control means for controllably cooling the reservoir; and energy exchange means for allowing thermal contact between the reservoir and the substance for effectuating transfer of cooling energy from the cryogenic reservoir to the substance for controllably cooling the substance. A delivery line has an inlet for receiving the substance from the heat exchanger at a first pressure. A nozzle is connected to the delivery line for receiving the substance from the delivery line. The nozzle has at least one exit opening which allows passing of the substance therethrough for expanding the substance from the first pressure to a second pressure which is lower than the first pressure for solidifying the substance and producing aerosol. Condensation preventing means is provided for preventing condensation from forming on the delivery line and/or on the nozzle.

    摘要翻译： 用于从物质生产气溶胶的装置包括用于接收和冷却物质的热交换器。 热交换器包括壳体; 低温储存器，包括安装在壳体内的固体材料; 用于可控地冷却储存器的温度控制装置; 以及用于允许储存器和物质之间的热接触的能量交换装置，用于实现将冷却能量从低温储存器转移到用于可控冷却该物质的物质。 输送管线具有用于在第一压力下从热交换器接收物质的入口。 喷嘴连接到输送管线，用于从输送管线接收物质。 喷嘴具有至少一个出口，其允许物质通过其中以将物质从第一压力扩展到低于用于固化物质并产生气溶胶的第一压力的第二压力。 提供防冷凝装置，用于防止在输送管线和/或喷嘴上形成冷凝。

    Aerosol reactor production of uniform submicron powders
    6.
    发明授权
    Aerosol reactor production of uniform submicron powders 失效
    气溶胶反应器生产均匀的亚微米粉末

    公开(公告)号：US4994107A

    公开(公告)日：1991-02-19

    申请号：US248486

    申请日：1988-09-08

    申请人： Richard C. Flagan ,  Jin J. Wu

    发明人： Richard C. Flagan ,  Jin J. Wu

    IPC分类号： B22F9/12 ,  C01B21/068 ,  C01B31/30 ,  C01B33/029

    CPC分类号： B82Y30/00 ,  B22F9/12 ,  C01B21/068 ,  C01B31/30 ,  C01B33/029 ,  C01P2004/03 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64

    摘要： A method of producing submicron nonagglomerated particles in a single stage reactor includes introducing a reactant or mixture of reactants at one end while varying the temperature along the reactor to initiate reactions at a low rate. As homogeneously small numbers of seed particles generated in the initial section of the reactor progress through the reactor, the reaction is gradually accelerated through programmed increases in temperature along the length of the reactor to promote particle growth by chemical vapor deposition while minimizing agglomerate formation by maintaining a sufficiently low number concentration of particles in the reactor such that coagulation is inhibited within the residence time of particles in the reactor. The maximum temperature and minimum residence time is defined by a combination of temperature and residence time that is necessary to bring the reaction to completion. In one embodiment, electronic grade silane and high purity nitrogen are introduced into the reactor and temperatures of approximately 770.degree. K. to 1550.degree. K. are employed. In another embodiment silane and ammonia are employed at temperatures from 750.degree. K. to 1800.degree. K.

    摘要翻译： 在单级反应器中生产亚微米非团聚颗粒的方法包括在一端引入反应物或反应物混合物，同时改变沿反应器的温度以低速率引发反应。 由于在反应器的初始部分中产生的均匀少量的种子颗粒进入反应器，所以通过沿着反应器长度的程序化温度升高逐渐加速反应，以通过化学气相沉积促进颗粒生长，同时通过维持最小化附聚物形成 反应器中数量足够低的颗粒，使得在反应器内的颗粒的停留时间内凝结被抑制。 最高温度和最小停留时间由使反应完成所必需的温度和停留时间的组合来定义。 在一个实施方案中，将电子级硅烷和高纯氮引入反应器中，并且使用约770°至1550°K的温度。 在另一个实施方案中，在750℃至1800℃的温度下使用硅烷和氨。

    Mounting apparatus for cryogenic aerosol cleaning
    7.
    发明授权
    Mounting apparatus for cryogenic aerosol cleaning 失效
    低温气溶胶清洗装置

    公开(公告)号：US5486132A

    公开(公告)日：1996-01-23

    申请号：US076065

    申请日：1993-06-14

    申请人： William A. Cavaliere ,  Robert P. Kuder, II ,  Jin J. Wu

    发明人： William A. Cavaliere ,  Robert P. Kuder, II ,  Jin J. Wu

    IPC分类号： B08B7/02 ,  B01F3/00 ,  B01F3/02 ,  B08B7/00 ,  B24C1/00 ,  B24C9/00 ,  H01L21/00 ,  H01L21/304 ,  B24C3/00

    CPC分类号： H01L21/67028 ,  B01F3/0092 ,  B01F3/022 ,  B24C1/003 ,  B24C9/00 ,  B01F2003/0057

    摘要： An apparatus for mounting to a tool having a surface to be cleaned for producing aerosol from a substance for cleaning the surface, includes a flange for mounting to the tool having the surface to be cleaned. A nozzle is mounted to the flange for receiving the substance. The nozzle has at least one exit opening which allows passing of the substance therethrough for expanding the substance from a first pressure to a second pressure which is lower than the first pressure for solidifying at least a substantial portion of the substance and producing aerosol for cleaning the surface. Condensation preventing means is provided for preventing condensation from forming on surfaces of the apparatus and the surface to be cleaned, and contamination preventing means is provided for preventing contaminants from re-contaminating the surface subsequent to removal therefrom.

    摘要翻译： 一种用于安装到具有用于从用于清洁表面的物质产生气溶胶的待清洁表面的工具的装置，包括用于安装到具有待清洁表面的工具的凸缘。 喷嘴安装到法兰上用于接收物质。 喷嘴具有至少一个出口，允许物质通过其中以将物质从第一压力扩展到低于第一压力的第二压力，用于固化至少大部分物质并产生用于清洁的气溶胶 表面。 提供冷凝防止装置，用于防止在装置表面和被清洁表面上形成冷凝，并且设置防污染装置，用于防止污染物从其中除去后再污染表面。

    Nozzle apparatus for producing aerosol
    8.
    发明授权
    Nozzle apparatus for producing aerosol 失效
    用于生产气溶胶的喷嘴装置

    公开(公告)号：US5366156A

    公开(公告)日：1994-11-22

    申请号：US76053

    申请日：1993-06-14

    申请人： Tibor L. Bauer ,  William A. Cavaliere ,  David C. Linnell ,  Jin J. Wu

    发明人： Tibor L. Bauer ,  William A. Cavaliere ,  David C. Linnell ,  Jin J. Wu

    IPC分类号： B05B9/04 ,  B05B9/00 ,  B08B5/02 ,  B08B7/00 ,  B24C1/00 ,  B24C5/04 ,  H01L21/304 ,  B05B1/26 ,  F17C7/02

    CPC分类号： B24C5/04 ,  B08B7/0092 ,  B24C1/003 ,  Y10S134/902

    摘要： A nozzle apparatus for producing aerosol from a substance includes a delivery line having an inlet for receiving the substance at a first pressure. A nozzle is connected to the delivery line for receiving the substance from the delivery line. The nozzle has at least one exit opening which allows passing of the substance therethrough for expanding the substance from the first pressure to a second pressure which is lower than the first pressure for solidifying the substance and producing aerosol. Condensation preventing means is provided for preventing condensation from forming on the delivery line and/or on the nozzle.

    摘要翻译： 用于从物质生产气溶胶的喷嘴装置包括具有用于在第一压力下接收物质的入口的输送管线。 喷嘴连接到输送管线，用于从输送管线接收物质。 喷嘴具有至少一个出口，其允许物质通过其中以将物质从第一压力扩展到低于用于固化物质并产生气溶胶的第一压力的第二压力。 提供防冷凝装置，用于防止在输送管线和/或喷嘴上形成冷凝。

    Apparatus to clean solid surfaces using a cryogenic aerosol
    10.
    发明授权
    Apparatus to clean solid surfaces using a cryogenic aerosol 失效
    使用低温气溶胶清洁固体表面的设备

    公开(公告)号：US5209028A

    公开(公告)日：1993-05-11

    申请号：US958417

    申请日：1992-10-09

    申请人： Wayne T. McDermott ,  Jin J. Wu ,  Richard C. Ockovic

    发明人： Wayne T. McDermott ,  Jin J. Wu ,  Richard C. Ockovic

    IPC分类号： B08B7/00 ,  B24C3/12 ,  B24C3/32 ,  B24C9/00 ,  H01L21/00

    CPC分类号： H01L21/67017 ,  B08B7/0092 ,  B24C3/12 ,  B24C3/322 ,  B24C9/003

    摘要： The present invention is an apparatus for cleaning semi-conductor solid surfaces using a spray of frozen cryogen, such as argon, to impinge on the solid surface to remove contaminant particles. The apparatus includes an appropriate nozzle positioned in a housing designed for ultra clean conditions including sweep gas supply and evacuation conduits and a support table movably positioned within the housing to controllably convey the semi-conductor solid surface on a track under the spray of frozen cryogen emanating from the nozzle.

    摘要翻译： 本发明是一种使用冷冻冷冻剂（如氩气）的喷雾来清洁半导体固体表面的装置，以冲击固体表面以除去污​​染物颗粒。 该设备包括位于壳体中的适当的喷嘴，其设计用于超洁净状态，包括吹扫气体供应和排空管道以及可移动地定位在壳体内的支撑台，以可控地将半导体固体表面传送到在冷冻致冷剂喷雾下的轨道上 从喷嘴。