Process for preparing photoactive coumarin derivatives
    3.
    发明授权
    Process for preparing photoactive coumarin derivatives 失效
    制备光活性香豆素衍生物的方法

    公开(公告)号:US5726296A

    公开(公告)日:1998-03-10

    申请号:US813098

    申请日:1997-03-07

    CPC分类号: G03F7/022 C07D311/56

    摘要: Novel processes for the preparation of a new class of coumarin derivatives, which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications, are disclosed and claimed. The process involves a multi-step synthetic method for the preparation of ether, ester, carbonate, or sulfonate derivative of 5-hydroxy, 6-hydroxy, or 7-hydroxy-3-diazo-4-oxo-3,4-dihydrocoumarin starting from the corresponding dihydroxyacetophenone. The compounds formed from the process of the present invention exhibit very high photosensitivity in the deep ultraviolet (DUV) region (ca. 250 nm), and therefore, are useful as photoactive compounds in DUV photoresist formulations.

    摘要翻译: 新的制备新型香豆素衍生物的新方法被公开并要求保护,其可用作各种应用中的光敏化合物,包括光致抗蚀剂和其它光电子应用。 该方法涉及一种用于制备5-羟基,6-羟基或7-羟基-3-重氮基-4-氧代-3,4-二氢香豆素的醚,酯,碳酸酯或磺酸酯衍生物的多步合成方法 从相应的二羟基苯乙酮。 由本发明方法形成的化合物在深紫外(DUV)区域(约250nm)中表现出非常高的光敏性,因此可用作DUV光致抗蚀剂制剂中的光活性化合物。

    Photoactive coumarin derivatives
    4.
    发明授权
    Photoactive coumarin derivatives 失效
    光敏香豆素衍生物

    公开(公告)号:US5726295A

    公开(公告)日:1998-03-10

    申请号:US813097

    申请日:1997-03-07

    摘要: A new class of 3,4-dihydrocoumarin derivatives which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications are disclosed and claimed. Preferred embodiments include ether, ester, carbonate, and sulfonate derivatives of 5-hydroxy, 6-hydroxy, and 7-hydroxy-3-diazo-4-oxo-3,4-dihydrocoumarins. These compounds exhibit very high photosensitivity in the deep ultraviolet (DUV) region (ca. 250 nm), and therefore, are useful as photoactive compounds in DUV photoresist formulations.

    摘要翻译: 公开和要求保护的新一类3,4-二氢香豆素衍生物,其可用作各种应用中的光活性化合物,包括光刻胶和其它光电应用。 优选的实施方案包括5-羟基,6-羟基和7-羟基-3-重氮基-4-氧代-3,4-二氢香豆素的醚,酯,碳酸酯和磺酸酯衍生物。 这些化合物在深紫外(DUV)区域(约250nm)中表现出非常高的光敏性,因此可用作DUV光致抗蚀剂制剂中的光活性化合物。