公开(公告)号：US08476589B2

公开(公告)日：2013-07-02

申请号：US13539291

申请日：2012-06-29

申请人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

发明人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

IPC分类号： H01J37/244

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/028 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/2802

摘要： A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

摘要翻译： 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35，其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角β1与第二 延伸穿过交点51的第二直线552与第二基板352的中心和物平面19之间的仰角β2超过14°。

公开(公告)号：US20120326032A1

公开(公告)日：2012-12-27

申请号：US13539291

申请日：2012-06-29

申请人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

发明人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

IPC分类号： H01J37/285

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/028 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/2802

摘要： A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

摘要翻译： 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35，其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角＆ 在相交点51延伸的第二直线552和第二基板352的中心与物平面19之间的第二仰角＆amp; bgr2大于14°。

公开(公告)号：US20120326030A1

公开(公告)日：2012-12-27

申请号：US13337268

申请日：2011-12-26

申请人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

发明人： Gerd Benner ,  Stefan Meyer ,  Steffen Niederberger ,  Dirk Preikszas

IPC分类号： H01J37/26

CPC分类号： H01J37/244 ,  G01N23/2252 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/028 ,  H01J2237/2445 ,  H01J2237/24495 ,  H01J2237/2802

摘要： A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a centre of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a centre of the second substrate 352 and the object plane 19 by more than 14°.

摘要翻译： 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35，其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角＆ 在相交点51延伸的第二直线552和第二基板352的中心与物平面19之间的第二仰角＆amp; bgr2大于14°。

公开(公告)号：US20080296509A1

公开(公告)日：2008-12-04

申请号：US12070055

申请日：2008-02-14

申请人： Rasmus Schroder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

发明人： Rasmus Schroder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

IPC分类号： H01J3/14

CPC分类号： H01J37/26 ,  H01J37/295 ,  H01J2237/041 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2455 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2809

摘要： A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

摘要翻译： 描述了用于移动粒子束的至少一部分的相位的相移元件，以及具有这种类型的相移元件的粒子束装置。 在具有相移元件的相移元件和粒子束装置中，避免了影响粒子束的分量，使得实现适当的信息内容，并且相位对比度基本上与空间频率无关。 相移元件可以具有至少一个用于产生非均匀或各向异性电位的装置。 根据本文所述的系统的粒子束装置可以设置有相移元件。

公开(公告)号：US5483073A

公开(公告)日：1996-01-09

申请号：US172122

申请日：1993-12-22

申请人： Gerd Benner

发明人： Gerd Benner

IPC分类号： H01J37/04 ,  H01J37/26 ,  H01J37/147

CPC分类号： H01J37/04 ,  H01J37/26

摘要： The invention is directed to a method for illuminating an object with a focused electron beam as well as to an electron-optical illuminating apparatus therefor. The crossover of an electron source is imaged, greatly demagnified, into the object plane via four imaging stages. The two first condenser stages define a zoom system. The cross section of the crossover image in the input image plane of the third condenser stage can be varied by varying the corresponding lens excitation. The third condenser stage images the crossover image from the input image plane into the input image plane of the objective. A multiple diaphragm is mounted between the third condenser stage and the input image plane of the objective. This multiple diaphragm has several apertures which are, in part, off-axis. The electron beam can be deflected by magnetic deflecting systems in such a manner that only the electron beam, which is transmitted through one diaphragm aperture of the multiple diaphragm, contributes an amount to the illumination of the object. In this way, the aperture of the illuminating beam component can be varied independently of the imaging scale with which the crossover is imaged on the object.

摘要翻译： 本发明涉及一种用聚焦电子束照射物体的方法及其电子 - 光学照明装置。 电子源的交叉通过四个成像阶段成像，大大地缩小到物平面。 两个第一个冷凝器阶段定义了一个缩放系统。 可以通过改变对应的透镜激发来改变第三电容器级的输入图像平面中的交叉图像的横截面。 第三个聚光阶段将交叉图像从输入图像平面成像到物镜的输入图像平面。 多个隔膜安装在第三聚光镜台与物镜的输入像平面之间。 该多个隔膜具有多个部分地偏轴的孔。 电子束可以由磁偏转系统偏转，使得只有通过多个隔膜的一个光阑孔径传播的电子束才能对物体的照明贡献一定量。 以这种方式，照明光束分量的光圈可以独立于在对象上成像交叉的成像标度而变化。

公开(公告)号：US08173963B2

公开(公告)日：2012-05-08

申请号：US12931046

申请日：2011-01-20

申请人： Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

发明人： Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

IPC分类号： G01N23/00

CPC分类号： H01J37/26 ,  H01J37/295 ,  H01J2237/041 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2455 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2809

摘要： A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

摘要翻译： 描述了用于移动粒子束的至少一部分的相位的相移元件，以及具有这种类型的相移元件的粒子束装置。 在具有相移元件的相移元件和粒子束装置中，避免了影响粒子束的分量，使得实现适当的信息内容，并且相位对比度基本上与空间频率无关。 相移元件可以具有至少一个用于产生非均匀或各向异性电位的装置。 根据本文所述的系统的粒子束装置可以设置有相移元件。

公开(公告)号：US20110233402A1

公开(公告)日：2011-09-29

申请号：US12931046

申请日：2011-01-20

申请人： Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

发明人： Rasmus Schröder ,  Bastian Barton ,  Gerd Benner ,  Harald Rose

IPC分类号： H01J37/26

CPC分类号： H01J37/26 ,  H01J37/295 ,  H01J2237/041 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/2455 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2809

摘要： A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

摘要翻译： 描述了用于移动粒子束的至少一部分的相位的相移元件，以及具有这种类型的相移元件的粒子束装置。 在具有相移元件的相移元件和粒子束装置中，避免了影响粒子束的分量，使得实现适当的信息内容，并且相位对比度基本上与空间频率无关。 相移元件可以具有至少一个用于产生非均匀或各向异性电位的装置。 根据本文所述的系统的粒子束装置可以设置有相移元件。

公开(公告)号：US20090039257A1

公开(公告)日：2009-02-12

申请号：US11659145

申请日：2005-07-28

申请人： Erik Essers ,  Gerd Benner ,  Volker Drexel

发明人： Erik Essers ,  Gerd Benner ,  Volker Drexel

IPC分类号： G21K7/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2449

摘要： An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

摘要翻译： 电子束装置具有用于产生电子束的电子枪，用于将电子束聚焦在物体上的物镜和用于检测被物体背面散射的物体或电子发射的电子的至少一个检测器。 可以使用四极装置和设置在电子束装置中的这些装置的某些配置来简化和改进由物体发射或反向散射的电子的检测。

公开(公告)号：US06657211B2

公开(公告)日：2003-12-02

申请号：US09906188

申请日：2001-07-16

申请人： Gerd Benner

发明人： Gerd Benner

IPC分类号： H01J3730

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： The present invention relates to a method for electron beam lithography that consists of a combination of electron beam projection lithography and electron beam writing. In a first step, the exposure of the substrate takes place by imaging of a mask. In a second step, structures not present on the mask are written on the substrate by electron beam writing. The invention furthermore relates to an electron-optical lithography system that can be used both for projection lithography and for electron beam writing. The system has a projective system by means of which a mask plane can be imaged on a reduced scale in a substrate plane. The system furthermore has an electron-optical illumination system by means of which selectively either a large field in the mask plane can be illuminated or the electron beam can be focused in the mask plane or can be shaped to a desired beam profile.

公开(公告)号：US20120049062A1

公开(公告)日：2012-03-01

申请号：US13274066

申请日：2011-10-14

申请人： Gerd Benner ,  Marko Matijevic

发明人： Gerd Benner ,  Marko Matijevic

IPC分类号： H01J37/28

CPC分类号： H01J37/26 ,  G01N23/04 ,  H01J37/04 ,  H01J2237/0492 ,  H01J2237/2614

摘要： A phase contrast electron microscope has an objective with a back focal plane, a first diffraction lens, which images the back focal plane of the objective magnified into a diffraction intermediate image plane, a second diffraction lens whose principal plane is mounted in the proximity of the diffraction intermediate image plane and a phase-shifting element which is mounted in or in the proximity of the diffraction intermediate image plane. Also, a phase contrast electron microscope has an objective having a back focal plane, a first diffraction lens, a first phase-shifting element and a second phase-shifting element which is mounted in or in the proximity of the diffraction intermediate image plane. The first diffraction lens images the back focal plane of the objective magnified into a diffraction intermediate image plane and the first phase-shifting element is mounted in the back focal plane of the objective.

摘要翻译： 相位对比电子显微镜具有后焦面的目的，第一衍射透镜，其将物镜的后焦平面成像成衍射中间像平面，第二衍射透镜的主平面安装在 衍射中间像平面和安装在衍射中间像平面附近的相移元件。 此外，相位对比电子显微镜具有安装在衍射中间像平面附近或附近的具有后焦平面，第一衍射透镜，第一相移元件和第二相移元件的物镜。 第一衍射透镜将物镜的后焦平面成像成放大为衍射中间像平面，第一相移元件安装在物镜的后焦平面上。