公开(公告)号：US20100153059A1

公开(公告)日：2010-06-17

申请号：US12594373

申请日：2008-03-11

申请人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

发明人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

IPC分类号： G06F15/00 ,  G01B21/20

CPC分类号： G01N21/95692 ,  G01N2021/95676 ,  G03F1/84

摘要： An apparatus for measuring the positions of marks on a mask is provided, said apparatus comprising a mask holder for holding the mask, a recording unit for recording the marks of the mask held by the mask holder, an actuating module for moving the mask holder and the recording unit relative to each other, and an evaluating module, which numerically calculates the gravity-induced sagging of the mask in the mask holder and determines the positions of the marks on the mask, based on the calculated sagging, the recordings made by the recording unit and the relative movement between the mask holder and the recording unit, wherein, prior to calculating said sagging, the present position of the mask in the mask holder is determined and is taken into consideration in said numerical calculation, and/or the geometrical dimensions of the mask are taken into consideration in said numerical calculation of sagging.

摘要翻译： 提供了一种用于测量掩模上的标记位置的装置，所述装置包括用于保持掩模的掩模保持器，用于记录由掩模保持器保持的掩模的标记的记录单元，用于移动掩模保持器的致动模块和 所述记录单元相对于所述记录单元，以及评估模块，其对所述掩模保持器中的所述掩模的重力引起的下垂进行数值计算，并基于所计算的下垂来确定所述掩模上的所述标记的位置， 记录单元和掩模保持器和记录单元之间的相对运动，其中，在计算所述下垂之前，确定掩模保持器中掩模的当前位置并在所述数值计算中被考虑，和/或几何 在下垂的数值计算中考虑到面罩的尺寸。

公开(公告)号：US08473237B2

公开(公告)日：2013-06-25

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00 ,  G01B11/14

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。

公开(公告)号：US20100241384A1

公开(公告)日：2010-09-23

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。

公开(公告)号：US07755748B2

公开(公告)日：2010-07-13

申请号：US12181774

申请日：2008-07-29

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01B9/00

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： A scattered light measurement device includes an illumination mask providing measuring radiation on an entrance side (1a) of a test component (1) and a detection part (3-6) for detection of light scattered by the test component and disposed on an exit side (1b) of the test component. The illumination mask includes at least one scattered light measurement structure, wherein the scattered light measurement structure has a scattered light marker zone and wherein the scattered light marker zone has a rotationally non-symmetric shape.

摘要翻译： 散射光测量装置包括照射掩模，其在测试部件（1）的入口侧（1a）和检测部（3-6）上提供测量辐射，用于检测由测试部件散射的光并且设置在出射侧 （1b）。 照明掩模包括至少一个散射光测量结构，其中散射光测量结构具有散射光标记区，并且其中散射光标记区具有旋转非对称形状。

公开(公告)号：US20050264819A1

公开(公告)日：2005-12-01

申请号：US10960082

申请日：2004-10-08

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G03F7/20 ,  G01N21/47

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US20080285018A1

公开(公告)日：2008-11-20

申请号：US12181774

申请日：2008-07-29

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01J1/00

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US07408631B2

公开(公告)日：2008-08-05

申请号：US10960082

申请日：2004-10-08

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01B9/00 ,  G01J1/00 ,  G03B27/42

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US08736849B2

公开(公告)日：2014-05-27

申请号：US13062566

申请日：2009-09-18

申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

IPC分类号： G01N21/00 ,  G01B11/14 ,  G03B27/42

CPC分类号： G03F1/84 ,  G03F7/70141

摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

公开(公告)号：US20110242544A1

公开(公告)日：2011-10-06

申请号：US13062566

申请日：2009-09-18

申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

IPC分类号： G01B11/02 ,  G01B11/14 ,  G01J4/00

CPC分类号： G03F1/84 ,  G03F7/70141

摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

公开(公告)号：US20100208935A1

公开(公告)日：2010-08-19

申请号：US12599127

申请日：2008-03-07

申请人： Michael Arnz ,  Gerd Klose

发明人： Michael Arnz ,  Gerd Klose

IPC分类号： G06K9/00 ,  G03F7/20

CPC分类号： G03F7/70633

摘要： A method is provided for determining the relative overlay shift of stacked layers, said method comprising the steps of: a) providing a reference image including a reference pattern that comprises first and second pattern elements; b) providing a measurement image of a measurement pattern, which comprises a first pattern element formed by a first one of the layers and a second pattern element formed by a second one of the layers; c) weighting the reference or measurement image such that a weighted first image is generated, in which the first pattern element is emphasized relative to the second pattern element; d) determining the relative shift of the first pattern element on the basis of the weighted first image and of the measurement or reference image not weighted in step c); e) weighting the reference or measurement image such that a weighted second image is generated, in which the second pattern element is emphasized relative to the first pattern element; f) determining the relative shift of the second pattern element on the basis of the weighted second image and of the measurement or reference image not weighted in step e); g) determining the relative overlay shift on the basis of the relative shifts determined in steps d) and f).

摘要翻译： 提供了一种用于确定堆叠层的相对重叠移位的方法，所述方法包括以下步骤：a）提供包括包括第一和第二图案元素的参考图案的参考图像; b）提供测量图案的测量图像，其包括由所述层中的第一层形成的第一图案元素和由所述层中的第二层形成的第二图案元素; c）对所述参考或测量图像进行加权，使得生成加权的第一图像，其中所述第一图案元素相对于所述第二图案元素被加强; d）基于加权的第一图像和在步骤c）中未加权的测量或参考图像来确定第一图案元素的相对移位; e）对所述参考或测量图像进行加权，使得生成加权的第二图像，其中相对于所述第一图案元素强调所述第二图案元素; f）基于加权的第二图像和在步骤e）中未加权的测量或参考图像来确定第二图案元素的相对移位; g）基于在步骤d）和f）中确定的相对移动来确定相对重叠移位。