摘要:
Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.
摘要翻译:描述了可热成像的元件,其包括在具有亲水表面的基底上(a)第一层,该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂中,和(b)第二层, 在水性碱性显影剂中可膨胀,其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3, 3个H 2,-PO 4 H 2,芳香族OH和具有酸性酰胺或酰亚胺基团的基团。
摘要:
Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.
摘要翻译:描述了可热成像的元件,其包括在具有亲水表面的基底上(a)第一层,该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂中,和(b)第二层, 其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3 H 2,-PO 4 H 2,芳族OH的侧基酸基和具有酸性酰胺的基团或 酰亚胺组。
摘要:
Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.
摘要:
A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
摘要:
A positive-working multi-layer lithographic printing plate precursor has an inner imageable layer disposed over a substrate. This inner imageable layer comprises one or more first polymeric binders that are present in a total amount of at least 50 weight % and up to and including 97 weight %, based on total inner imageable layer dry weight. The precursor also has an ink-receptive outer imageable layer disposed over the inner imageable layer and this ink-receptive outer imageable layer comprises one or more second polymeric binders that are different than the first polymeric binder. Each of the one or more first polymeric binders has a weight average molecular weight of at least 200,000 and can also have a polydispersity of at least 4.
摘要:
A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
摘要:
A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
摘要:
The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60° C.
摘要:
Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.
摘要翻译:热敏元件包括:a)任选预处理的基材; b)正性工作涂层,其包含(i)基于涂层的干重至少40重量%的至少一种可溶于含水碱性显影剂的聚合物,其选自酚醛清漆树脂,官能化酚醛清漆树脂,聚乙烯基苯酚树脂,聚乙烯基 甲酚和具有酚和/或磺酰胺侧基的聚(甲基)丙烯酸酯,(ii)基于涂层的干重为01-20重量%的至少一种(C 4 H 4) -C 20 C 20烷基)苯酚酚醛清漆树脂,和(iii)任选的至少一种选自聚合物颗粒,表面活性剂,造影剂和颜料的其它组分,无机填料,抗氧化剂, 纤维素聚合物的羧酸衍生物,增塑剂和能够吸收650〜1300nm波长的辐射并将其转化成热的物质。
摘要:
Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.
摘要翻译:热敏元件包括:a)任选预处理的基材; b)正性工作涂层,其包含(i)基于涂层的干重至少40重量%的至少一种可溶于含水碱性显影剂的聚合物,其选自酚醛清漆树脂,官能化酚醛清漆树脂,聚乙烯基苯酚树脂,聚乙烯基 甲酚和具有酚和/或磺酰胺侧基的聚(甲基)丙烯酸酯,(ii)基于涂层的干重为01-20重量%的至少一种(C 4 H 4) -C 20 C 20烷基)苯酚酚醛清漆树脂,和(iii)任选的至少一种选自聚合物颗粒,表面活性剂,造影剂和颜料的其它组分,无机填料,抗氧化剂, 纤维素聚合物的羧酸衍生物,增塑剂和能够吸收650〜1300nm波长的辐射并将其转化成热的物质。