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    Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials
    4.
    发明授权
    Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials 有权
    制备MoO2粉末的方法，由MoO 2粉末制成的产品，MoO 2薄膜的沉积以及使用这种材料的方法

    公开(公告)号：US07754185B2

    公开(公告)日：2010-07-13

    申请号：US11334140

    申请日：2006-01-18

    申请人： Lawrence F. McHugh ,  Prabhat Kumar ,  David Meendering ,  Richard Wu ,  Gerhard Wötting ,  Richard Nicholson

    发明人： Lawrence F. McHugh ,  Prabhat Kumar ,  David Meendering ,  Richard Wu ,  Gerhard Wötting ,  Richard Nicholson

    IPC分类号： C01G39/02 ,  B22F3/15

    CPC分类号： C01G39/02 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/40 ,  H01L51/5206

    摘要： The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press/sintering, hot pressing, and/or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2 disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDP), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.

    摘要翻译： 本发明涉及通过在旋转或船式炉中使用氢作为还原剂还原钼酸铵或三氧化钼的高纯度MoO 2粉末。 使用通过压制/烧结，热压和/或HIP将粉末固结制成用作溅射靶的盘，板或板。 使用合适的溅射方法或其它物理方法将MoO 2盘，板或板形式溅射在基板上，以提供具有所需膜厚度的薄膜。 在透明性，导电性，功函数，均匀性和表面粗糙度方面，薄膜具有与铟锡氧化物（ITO）和掺杂锌的ITO相当或优于电，光学，表面粗糙度和均匀性的性质。 含有MoO2和MoO2的薄膜可用于有机发光二极管（OLED），液晶显示器（LCD），等离子体显示面板（PDP），场发射显示器（FED），薄膜太阳能电池，低电阻率欧姆接触 ，以及其他电子和半导体器件。