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1.发明公开公开(公告)号：US20240126185A1
公开(公告)日：2024-04-18
申请号：US18463169
申请日：2023-09-07
Applicant: Gigaphoton Inc.
Inventor： Yoshifumi UENO , Shogo KITASAKA , Yuichi NISHIMURA
CPC classification number: G03F7/709 , G03F7/70033 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.
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2.发明公开公开(公告)号：US20240184211A1
公开(公告)日：2024-06-06
申请号：US18510705
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/70033 , G02B5/0891 , G03F1/24 , G03F7/7085
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.
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公开(公告)号：US20240023223A1
公开(公告)日：2024-01-18
申请号：US18327814
申请日：2023-06-01
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO
CPC classification number: H05G2/008 , H05G2/003 , G03F7/70033 , G03F7/7065
Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.
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4.发明公开公开(公告)号：US20230284365A1
公开(公告)日：2023-09-07
申请号：US18165063
申请日：2023-02-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Shogo KITASAKA
CPC classification number: H05G2/006 , H05G2/008 , G03F7/70033
Abstract: An extreme ultraviolet light generation system configured to generate extreme ultraviolet light by irradiating a target substance with laser light includes a nozzle configured to output the target substance, a vibration element that is driven by an input of an electric signal of a rectangular wave and applies vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a first sensor configured to detect energy of the generated extreme ultraviolet light, a second sensor configured to detect energy of the laser light to be radiated to the target substance, and a processor configured to control a duty value of the electric signal for vibrating the vibration element so as to reduce a variation of an energy conversion efficiency calculated based on an output of the first sensor and an output of the second sensor.
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5.发明申请公开(公告)号：US20230101779A1
公开(公告)日：2023-03-30
申请号：US17812924
申请日：2022-07-15
Applicant: GIGAPHOTON INC.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO
Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.
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Patent Agency Ranking
公开(公告)号：US20180284617A1
公开(公告)日：2018-10-04
申请号：US16001239
申请日：2018-06-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
CPC classification number: G03F7/70033 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
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7.发明公开公开(公告)号：US20240184220A1
公开(公告)日：2024-06-06
申请号：US18510706
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/706845 , G03F7/70033 , G03F7/70041 , G03F7/70233 , G03F7/70258 , G03F7/7065 , G03F7/706847 , G03F7/706849 , H05G2/008
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.
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公开(公告)号：US20220232690A1
公开(公告)日：2022-07-21
申请号：US17457342
申请日：2021-12-02
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Hiroaki NAKARAI
Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.
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公开(公告)号：US20210410262A1
公开(公告)日：2021-12-30
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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公开(公告)号：US20190289707A1
公开(公告)日：2019-09-19
申请号：US16434197
申请日：2019-06-07
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.
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