公开(公告)号：US5980212A

公开(公告)日：1999-11-09

申请号：US773775

申请日：1996-12-26

申请人： Guo Hua Shen ,  Nozomu Takagi ,  Toshihiro Terasawa ,  Tsuyoshi Kotani ,  Hiroyuki Kinpara ,  Katsuji Nakajima ,  Hiroyuki Miho

发明人： Guo Hua Shen ,  Nozomu Takagi ,  Toshihiro Terasawa ,  Tsuyoshi Kotani ,  Hiroyuki Kinpara ,  Katsuji Nakajima ,  Hiroyuki Miho

IPC分类号： H01J41/20 ,  F04B37/02 ,  F04F11/00 ,  H01J7/16

CPC分类号： H01J41/20

摘要： A sputter ion pump in which the ratio of the length L to the diameter D of each anode cell forming a multi-cell anode inserted between two cathodes is defined within a certain range, thereby increasing a critical vacuum level to be evacuated and achieving a higher exhaust speed.

摘要翻译： 一种溅射离子泵，其中形成插入在两个阴极之间的多单元阳极的每个阳极单元的长度L与直径D之比定义在一定范围内，从而增加要抽真空的临界真空度，并实现较高的 排气速度

公开(公告)号：US20100026161A1

公开(公告)日：2010-02-04

申请号：US12446584

申请日：2007-10-18

申请人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

发明人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC分类号： H01J29/48

CPC分类号： H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

摘要： [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

摘要翻译： 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。

公开(公告)号：US08198797B2

公开(公告)日：2012-06-12

申请号：US12446584

申请日：2007-10-18

申请人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

发明人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC分类号： H01J29/46

CPC分类号： H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

摘要： [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

摘要翻译： 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。

公开(公告)号：US20100270143A1

公开(公告)日：2010-10-28

申请号：US12808045

申请日：2009-01-15

申请人： Yukio Kikuchi ,  Guo Hua Shen

发明人： Yukio Kikuchi ,  Guo Hua Shen

IPC分类号： C23C14/35

CPC分类号： H01F41/303 ,  B82Y10/00 ,  B82Y25/00 ,  B82Y40/00 ,  C23C14/351 ,  C23C14/352 ,  G01R33/09 ,  G01R33/098 ,  H01F7/0273 ,  H01F10/3254 ,  H01F10/3295 ,  H01J37/3266 ,  H01J37/34 ,  H01J37/3414 ,  H01L43/12

摘要： A substrate stage that is arranged in a vacuum chamber and that has a substrate mounting surface on which a substrate is mounted, including a first magnetic field applying unit that applies a magnetic field to the substrate, in which the internal magnetization direction of the first magnetic field applying unit and the thickness direction of the substrate match.

摘要翻译： 布置在真空室中并且具有其上安装有基板的基板安装表面的基板台，包括向基板施加磁场的第一磁场施加单元，其中第一磁体的内部磁化方向 场施加单元和衬底的厚度方向匹配。

公开(公告)号：US06616417B2

公开(公告)日：2003-09-09

申请号：US09959879

申请日：2001-11-09

申请人： Guo Hua Shen

发明人： Guo Hua Shen

IPC分类号： H02K4400

CPC分类号： H01J41/18 ,  H01J27/08 ,  H01J2237/1825

摘要： The sputter ion pump includes a vacuum chamber that includes an inner wall having a cylindrical section which is rugged in cross section. The rugged cylindrical section has outer recesses each of which is provided with a permanent magnets, each magnet having a same shape and a same characteristic so that a magnetic pole is directed to a same direction. The rugged cylindrical section has also inner recesses each of which is provided with a cylindrical anode electrode member spaced from the vacuum chamber wall. The rugged cylindrical section of the vacuum chamber wall is formed as a cathode electrode. A cylindrical shield member having a peripheral portion provided with evacuating bores is provided coaxially to the permanent magnets and anode electrodes. The permanent magnets and anode electrode members are arranged with equal spacing in an axis symmetrical configuration.

摘要翻译： 溅射离子泵包括真空室，其包括具有横截面坚固的圆柱形部分的内壁。 凹凸的圆柱形部分具有每个都具有永磁体的外凹槽，每个磁体具有相同的形状和相同的特性，使得磁极被引向相同的方向。 凹凸的圆柱形部分还具有内部凹槽，每个凹槽设置有与真空室壁间隔开的圆柱形阳极电极构件。 真空室壁的凹凸圆柱形部分形成为阴极电极。 具有设置有抽气孔的周边部分的圆筒形屏蔽构件与永磁体和阳极电极同轴地设置。 永磁体和阳极电极构件以轴对称构造相等间隔地布置。