公开(公告)号：US08198797B2

公开(公告)日：2012-06-12

申请号：US12446584

申请日：2007-10-18

申请人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

发明人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC分类号： H01J29/46

CPC分类号： H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

摘要： [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

摘要翻译： 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。

公开(公告)号：US20100026161A1

公开(公告)日：2010-02-04

申请号：US12446584

申请日：2007-10-18

申请人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

发明人： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC分类号： H01J29/48

CPC分类号： H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

摘要： [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

摘要翻译： 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。

公开(公告)号：US07888642B2

公开(公告)日：2011-02-15

申请号：US12188567

申请日：2008-08-08

申请人： Mamoru Nakasuji ,  Nabuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

发明人： Mamoru Nakasuji ,  Nabuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC分类号： H01J49/48 ,  G21K5/04

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

摘要翻译： 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US07829871B2

公开(公告)日：2010-11-09

申请号：US12177733

申请日：2008-07-22

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

IPC分类号： H01J40/14 ,  G02B26/08

CPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

摘要翻译： 诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像 一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底 用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及 用于在基板2006上显示或存储缺陷位置的控制系统2017。

公开(公告)号：US20100213370A1

公开(公告)日：2010-08-26

申请号：US11884367

申请日：2006-02-17

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

IPC分类号： H01J37/26 ,  H01J37/141 ,  H01J37/147 ,  G01N23/22 ,  H01J37/06

CPC分类号： H01J37/244 ,  G01N23/225 ,  G02F2001/136254 ,  H01J37/226 ,  H01J2237/15 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01L27/146 ,  H01L27/14601

摘要： The present invention provides an electron beam apparatus which can capture images at high speeds even using an area sensor which senses a small number of frames per second, by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. For this purpose, the detecting device 26 of the electron beam apparatus comprises a plurality of unit detectors 24-1 each including an area sensor CCD 1 (˜CCD 14), a bundle of optical fibers 25 having one end coupled to a detection plane of the area sensor, an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the sub-visual fields are focused. An electromagnetic deflector deflects the secondary electron beam emitted from the sub-visual fields each time the electron beam is irradiated to a next sub-visual field to move the secondary electron beams over the surfaces of the FOPs of the unit detectors. Since image information can be fetched from each unit detector during exposure of the other unit detectors, images can be captured at high speeds.

摘要翻译： 本发明提供了一种电子束装置，其即使使用通过偏转器偏转一次电子束来照射形成的每个子视场，也可以高速捕获图像，甚至使用每秒感测少量帧数的区域传感器 通过划分样品表面上的评估区域，并且通过检测装置检测在每个子视野中包含样品表面上的信息的二次电子。 为此，电子束装置的检测装置26包括多个单元检测器24-1，每个单元检测器24-1包括区域传感器CCD 1（〜CCD 14），一束光纤25，其一端耦合到检测平面 区域传感器，涂覆在光纤束的另一端并形成有闪烁体的FOP，其上从副视野发射的二次电子束聚焦。 每当电子束照射到下一个副视野时，电磁偏转器偏转从副视野发射的二次电子束，以将二次电子束移动到单位检测器的FOP的表面上。 由于在其他单元检测器的曝光期间可以从每个单元检测器获取图像信息，因此可以高速捕获图像。

公开(公告)号：US07598471B2

公开(公告)日：2009-10-06

申请号：US11714885

申请日：2007-03-07

申请人： Muneki Hamashima ,  Takao Kato ,  Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake

发明人： Muneki Hamashima ,  Takao Kato ,  Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake

IPC分类号： B23H9/00 ,  B23H1/04

CPC分类号： F01N3/2828 ,  F01N2260/18 ,  F01N2330/06 ,  H01J37/06 ,  H01J37/28

摘要： A method of machining a cathode used in an electron gun. The method includes steps of placing an object to be machined, which is a material of the cathode, and a machining electrode in an electrically insulating oil; applying a discharge current to the machining electrode; and machining the object to be machined to have a shape corresponding to the shape of the machining electrode by means of electric discharge machining of the machining electrode. The machining electrode includes a disk, recesses formed on a front surface of the disk, a protrusion provided on a back surface of the disk, and a hole for mounting a lead wire for applying discharge current to the machining electrode. Bumps corresponding to the shape of the recesses of the machining electrode are formed on the object to be machined by means of the electric discharge machining.

摘要翻译： 一种加工电子枪阴极的方法。 该方法包括以下步骤：将作为阴极材料的待加工对象和电绝缘油中的加工电极放置; 向加工电极施加放电电流; 并且通过加工电极的放电加工将被加工物加工成具有与加工电极的形状对应的形状。 加工电极包括盘，形成在盘的前表面上的凹部，设置在盘的后表面上的突起，以及用于安装用于向加工电极施加放电电流的引线的孔。 通过放电加工在被加工物体上形成与加工电极的凹部的形状相对应的凸起。

公开(公告)号：US20090218506A1

公开(公告)日：2009-09-03

申请号：US11996701

申请日：2006-07-24

申请人： Mamoru Nakasuji ,  Takeshi Murakami ,  Tohru Satake ,  Tsutomu Karimata ,  Toshifumi Kimba ,  Matsutaro Miyamoto ,  Hiroshi Sobukawa ,  Satoshi Mori

发明人： Mamoru Nakasuji ,  Takeshi Murakami ,  Tohru Satake ,  Tsutomu Karimata ,  Toshifumi Kimba ,  Matsutaro Miyamoto ,  Hiroshi Sobukawa ,  Satoshi Mori

IPC分类号： H01J1/50 ,  A61N5/00 ,  H01J3/14

CPC分类号： H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/057

摘要： An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.

摘要翻译： 从电子枪（G）发射的电子束通过非分散维恩滤波器（5-1），电磁偏转器（11-1），光束分离器（12- 1）和作为物镜的平板电脑镜头（17-1）。 束分离器（12-1）被构造成使得二次电子束通过分束器的距离比一次电子束通过分束器的距离大约三倍。 因此，即使将分束器中的磁场设定为使一次电子束偏转等于或小于约10度的小角度，二次电子束可以偏转大约30度，使得初级和次级 电子束充分分离。 此外，由于一次电子束以小角度偏转，所以在一次电子束中产生较小的像差。 因此，由于一次电光学系统的光路长度，可以减小空间电荷的影响和偏转像差的发生。

公开(公告)号：US20090101816A1

公开(公告)日：2009-04-23

申请号：US12073892

申请日：2008-03-11

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/00 ,  A61N5/00

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US07521692B2

公开(公告)日：2009-04-21

申请号：US11896519

申请日：2007-09-04

申请人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

发明人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/222 ,  G01N21/956 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2447 ,  H01R13/2421 ,  H04N5/2253 ,  Y10S439/935

摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

摘要翻译： 电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与 销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块， 连接力可以保持在如此低的水平，以防止传感器中的破损。 引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。 该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。 此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。 优选地，行计数的数量可以几乎等于积分级数。

公开(公告)号：US20090014649A1

公开(公告)日：2009-01-15

申请号：US11909409

申请日：2006-03-22

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

IPC分类号： G01N23/00

CPC分类号： H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2446 ,  H01J2237/28

摘要： Secondary electrons emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator (77), and is deflected again in a perpendicular direction by an aberration correction electrostatic deflector (711) to form a magnified image on the principal plane of an auxiliary lens (712). The secondary electron beam diverged from the auxiliary lens (712) passes through axial chromatic aberration correction lenses (714-717) and images on a principal plane of an auxiliary lens (718) for a magnifying lens (719). The magnified image is formed in a position spaced apart from the optical axis. Therefore, when the secondary electron beam diverged from the auxiliary lens (712) is incident on the axial chromatic aberration correction lenses without any change, large abaxial aberration occurs. To avoid it, the auxiliary lens (712) is used to form the image of an NA aperture (724) in substantially a middle (723) in the light axis direction of the axial chromatic aberration correction lenses (714-717).

摘要翻译： 通过电子束照射从样品（W）发射的二次电子被光束分离器（77）偏转，并通过像差校正静电偏转器（711）在垂直方向上再次偏转，以在主平面上形成放大图像 的辅助透镜（712）。 从辅助透镜（712）发散的二次电子束通过轴向色差校正透镜（714-717）和用于放大透镜（719）的辅助透镜（718）的主平面上的图像。 放大图像形成在与光轴间隔开的位置。 因此，当从辅助透镜（712）发散的二次电子束没有任何变化地入射到轴向色像差校正透镜时，发生大的背轴像差。 为了避免这种情况，辅助透镜（712）用于在轴向色像差校正透镜（714-717）的光轴方向上形成基本上中间（723）中的NA孔径（724）的图像。