公开(公告)号：US20050287816A1

公开(公告)日：2005-12-29

申请号：US10879367

申请日：2004-06-28

申请人： Guy Blalock ,  Gurtej Sandhu ,  Jon Daley

发明人： Guy Blalock ,  Gurtej Sandhu ,  Jon Daley

IPC分类号： G03F7/09 ,  H01L21/027 ,  H01L21/31 ,  H01L21/469 ,  H01L21/4763 ,  H01L21/768

CPC分类号： G03F7/091 ,  H01L21/0276

摘要： This invention includes methods of forming patterned photoresist layers over semiconductor substrates. In one implementation, a porous antireflective coating is formed over a semiconductor substrate. A photoresist footer-reducing fluid is provided within pores of the porous antireflective coating. A positive photoresist is formed over the porous antireflective coating having the fluid therein. The positive photoresist is patterned and developed to form a patterned photoresist layer, with the fluid within the pores being effective to reduce photoresist footing in the patterned photoresist layer than would otherwise occur in the absence of the fluid within the pores. Other aspects and implementations are contemplated.

摘要翻译： 本发明包括在半导体衬底上形成图案化光致抗蚀剂层的方法。 在一个实施方案中，在半导体衬底上形成多孔抗反射涂层。 在多孔抗反射涂层的孔内提供光致抗蚀剂页脚还原液。 在其中具有流体的多孔抗反射涂层上形成正性光致抗蚀剂。 正性光致抗蚀剂被图案化和显影以形成图案化的光致抗蚀剂层，孔内的流体有效地减少图案化光致抗蚀剂层中的光致抗蚀剂底脚，而不是在孔内不存在流体的情况下发生。 考虑了其他方面和实现。

公开(公告)号：US20060246734A1

公开(公告)日：2006-11-02

申请号：US11477287

申请日：2006-06-28

申请人： Guy Blalock ,  Gurtej Sandhu ,  Jon Daley

发明人： Guy Blalock ,  Gurtej Sandhu ,  Jon Daley

IPC分类号： H01L21/302 ,  H01L21/31 ,  H01L21/4763 ,  G03C5/00

CPC分类号： G03F7/091 ,  H01L21/0276

摘要： This invention includes methods of forming patterned photoresist layers over semiconductor substrates. In one implementation, a porous antireflective coating is formed over a semiconductor substrate. A photoresist footer-reducing fluid is provided within pores of the porous antireflective coating. A positive photoresist is formed over the porous antireflective coating having the fluid therein. The positive photoresist is patterned and developed to form a patterned photoresist layer, with the fluid within the pores being effective to reduce photoresist footing in the patterned photoresist layer than would otherwise occur in the absence of the fluid within the pores. Other aspects and implementations are contemplated.

摘要翻译： 本发明包括在半导体衬底上形成图案化光致抗蚀剂层的方法。 在一个实施方案中，在半导体衬底上形成多孔抗反射涂层。 在多孔抗反射涂层的孔内提供光致抗蚀剂页脚还原液。 在其中具有流体的多孔抗反射涂层上形成正性光致抗蚀剂。 正性光致抗蚀剂被图案化和显影以形成图案化的光致抗蚀剂层，孔内的流体有效地减少图案化光致抗蚀剂层中的光致抗蚀剂底脚，而不是在孔内不存在流体的情况下发生。 考虑了其他方面和实现。

公开(公告)号：US08552538B2

公开(公告)日：2013-10-08

申请号：US12656719

申请日：2010-02-16

申请人： Jon Daley ,  Yoshiki Hishiro

发明人： Jon Daley ,  Yoshiki Hishiro

IPC分类号： H01L23/58

CPC分类号： H01L21/0335 ,  G03F7/40

摘要： A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.

公开(公告)号：US07943921B2

公开(公告)日：2011-05-17

申请号：US11304593

申请日：2005-12-16

申请人： Jon Daley ,  Kristy A. Campbell

发明人： Jon Daley ,  Kristy A. Campbell

IPC分类号： H01L47/00

CPC分类号： H01L45/1246 ,  H01L27/2463 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/144 ,  H01L45/1608 ,  H01L45/1666

摘要： A phase change memory element and method of forming the same. The memory element includes first and second electrodes. A first layer of phase change material is between the first and second electrodes. A second layer including a metal-chalcogenide material is also between the first and second electrodes and is one of a phase change material and a conductive material. An insulating layer is between the first and second layers. There is at least one opening in the insulating layer providing contact between the first and second layers.

摘要翻译： 一种相变存储元件及其形成方法。 存储元件包括第一和第二电极。 第一层相变材料位于第一和第二电极之间。 包括金属 - 硫族化物材料的第二层也在第一和第二电极之间，并且是相变材料和导电材料之一。 绝缘层位于第一和第二层之间。 绝缘层中至少有一个开口提供第一和第二层之间的接触。

公开(公告)号：US07643333B2

公开(公告)日：2010-01-05

申请号：US11745209

申请日：2007-05-07

申请人： Jon Daley

发明人： Jon Daley

IPC分类号： G11C11/00 ,  G11C5/06

CPC分类号： G11C13/0069 ,  G11C13/0011 ,  G11C13/0033 ,  G11C13/0097 ,  G11C16/3431 ,  G11C2013/009 ,  G11C2213/79

摘要： A method of erasing a chalcogenide variable resistance memory cell is provided. The chalcogenide variable resistance memory cell includes a p-doped substrate with an n-well and a chalcogenide variable resistance memory element. The method includes the step of applying to the variable resistance memory element a voltage that is less than a fixed voltage of the substrate. The applied voltage induces an erase current to flow from the p-doped substrate through the n-well and through the variable resistance memory element.

摘要翻译： 提供了擦除硫族化物可变电阻存储单元的方法。 硫族化物可变电阻存储单元包括具有n阱和硫族化物可变电阻存储元件的p掺杂衬底。 该方法包括向可变电阻存储元件施加小于衬底的固定电压的电压的步骤。 施加的电压引起擦除电流从p掺杂衬底流过n阱并通过可变电阻存储元件。

公开(公告)号：US07579615B2

公开(公告)日：2009-08-25

申请号：US11199251

申请日：2005-08-09

申请人： Jon Daley ,  Kristy A. Campbell ,  Joseph F. Brooks

发明人： Jon Daley ,  Kristy A. Campbell ,  Joseph F. Brooks

IPC分类号： H01L45/00

CPC分类号： H01L27/101 ,  H01L27/2454 ,  H01L27/2472 ,  H01L29/66666 ,  H01L29/7827 ,  H01L45/085 ,  H01L45/1233 ,  H01L45/143

摘要： An access transistor for a resistance variable memory element and methods of forming the same are provided. The access transistor has first and second source/drain regions and a channel region vertically stacked over the substrate. The access transistor is associated with at least one resistance variable memory element.

摘要翻译： 提供了一种用于电阻可变存储元件的存取晶体管及其形成方法。 存取晶体管具有第一和第二源/漏区和垂直堆叠在衬底上的沟道区。 存取晶体管与至少一个电阻可变存储元件相关联。

公开(公告)号：US07289349B2

公开(公告)日：2007-10-30

申请号：US11601747

申请日：2006-11-20

申请人： Kristy A. Campbell ,  Jon Daley ,  Joseph F. Brooks

发明人： Kristy A. Campbell ,  Jon Daley ,  Joseph F. Brooks

IPC分类号： G11C7/00

CPC分类号： G11C13/003 ,  G11C13/0011 ,  G11C13/0033 ,  G11C13/0069 ,  G11C16/3431 ,  G11C2013/009 ,  G11C2213/72 ,  G11C2213/76

摘要： A memory device having a memory portion connected in series with a threshold device between. The memory portion stores at least one bit of data based on at least two resistance states. The threshold device is configured to switch from a high resistance state to a low resistance state upon application of a voltage and, when the voltage is removed, to re-assume the high resistance state. Additionally, the threshold device can be configured to switch in response to both negative and positive applied voltages across the first and second electrodes. Memory elements having a memory portion and threshold device between first and second electrodes and methods for forming the memory elements are also provided.

公开(公告)号：US20070158631A1

公开(公告)日：2007-07-12

申请号：US11304593

申请日：2005-12-16

申请人： Jon Daley ,  Kristy Campbell

发明人： Jon Daley ,  Kristy Campbell

IPC分类号： H01L29/02 ,  H01L47/00

CPC分类号： H01L45/1246 ,  H01L27/2463 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/144 ,  H01L45/1608 ,  H01L45/1666

摘要： A phase change memory element and method of forming the same. The memory element includes first and second electrodes. A first layer of phase change material is between the first and second electrodes. A second layer including a metal-chalcogenide material is also between the first and second electrodes and is one of a phase change material and a conductive material. An insulating layer is between the first and second layers. There is at least one opening in the insulating layer providing contact between the first and second layers.

摘要翻译： 一种相变存储元件及其形成方法。 存储元件包括第一和第二电极。 第一层相变材料位于第一和第二电极之间。 包括金属 - 硫族化物材料的第二层也在第一和第二电极之间，并且是相变材料和导电材料之一。 绝缘层位于第一和第二层之间。 绝缘层中至少有一个开口提供第一和第二层之间的接触。

公开(公告)号：US20050224923A1

公开(公告)日：2005-10-13

申请号：US10819936

申请日：2004-04-08

申请人： Jon Daley ,  Yoshiki Hishiro

发明人： Jon Daley ,  Yoshiki Hishiro

IPC分类号： G03F7/40 ,  H01L23/58

CPC分类号： H01L21/0335 ,  G03F7/40

摘要： A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.

摘要翻译： 公开了一种用于处理光致抗蚀剂图案的稳定溶液以及防止轮廓异常，倾倒和抵抗基脚的方法。 稳定溶液包含非挥发性组分，例如在光致抗蚀剂材料已经显影之后施加的非挥发性颗粒或聚合物。 通过在显影之后但干燥之前用含有非挥发性成分的溶液处理光致抗蚀剂，非挥发性组分填充相邻抗蚀剂图案之间的空间，并在干燥期间保留在基材上。 非挥发性组分为抗蚀剂提供结构和机械支撑，以防止液体表面张力产生变形或塌陷。

公开(公告)号：US08847193B2

公开(公告)日：2014-09-30

申请号：US14033913

申请日：2013-09-23

申请人： Jon Daley ,  Kristy A. Campbell

发明人： Jon Daley ,  Kristy A. Campbell

IPC分类号： H01L47/00 ,  H01L45/00

CPC分类号： H01L45/1246 ,  H01L27/2463 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/144 ,  H01L45/1608 ,  H01L45/1666

摘要： A phase change memory element and method of forming the same. The memory element includes first and second electrodes. A first layer of phase change material is between the first and second electrodes. A second layer including a metal-chalcogenide material is also between the first and second electrodes and is one of a phase change material and a conductive material. An insulating layer is between the first and second layers. There is at least one opening in the insulating layer providing contact between the first and second layers.

摘要翻译： 一种相变存储元件及其形成方法。 存储元件包括第一和第二电极。 第一层相变材料位于第一和第二电极之间。 包括金属 - 硫族化物材料的第二层也在第一和第二电极之间，并且是相变材料和导电材料之一。 绝缘层位于第一和第二层之间。 绝缘层中至少有一个开口提供第一和第二层之间的接触。