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    SPECTROSCOPIC ELEMENT AND CHARGED PARTICLE BEAM DEVICE USING THE SAME
    2.
    发明申请
    SPECTROSCOPIC ELEMENT AND CHARGED PARTICLE BEAM DEVICE USING THE SAME 有权
    光谱元件和使用其的充电颗粒光束装置

    公开(公告)号：US20150318144A1

    公开(公告)日：2015-11-05

    申请号：US14439993

    申请日：2012-10-31

    申请人： Hitachi, Ltd.

    发明人： Yoshihiro Anan ,  Masanari Koguchi

    IPC分类号： H01J37/244 ,  H01J37/28

    CPC分类号： H01J37/244 ,  G01N23/2252 ,  G21K1/067 ,  G21K2201/064 ,  H01J37/252 ,  H01J37/28 ,  H01J2237/2442 ,  H01J2237/2445

    摘要： To analyze an element to be evaluated with high sensitivity and high accuracy in a short period of time, in an electron beam analyzer including a wavelength dispersive X-ray analyzer in an electron microscope. The electron beam analyzer has one diffraction grating in which a plurality of patterns having maximum X-ray reflectance with respect to the respective X-rays are formed. It simultaneously detects an X-ray as an energy reference and an X-ray spectrum to be evaluated. The positional displacement of X-ray energy due to the installation/replacement of the diffraction grating is corrected using the X-ray spectrum as the energy reference, thereby enabling to perform an analysis with high sensitivity and high accuracy in a short period of time.

    摘要翻译： 在电子显微镜中的包括波长色散X射线分析仪的电子束分析仪中，在短时间内以高灵敏度和高精度分析要评估的元件。 电子束分析仪具有一个衍射光栅，其中形成相对于各X射线具有最大X射线反射率的多个图案。 它同时检测X射线作为能量参考和待评估的X射线光谱。 使用X射线光谱作为能量基准来校正由于衍射光栅的安装/替换引起的X射线能量的位置偏移，从而能够在短时间内以高灵敏度和高精度进行分析。

    SCANNING PROBE MICROSCOPE
    3.
    发明公开
    SCANNING PROBE MICROSCOPE 审中-公开

    公开(公告)号：US20240126061A1

    公开(公告)日：2024-04-18

    申请号：US18380309

    申请日：2023-10-16

    申请人： Hitachi, Ltd.

    发明人： Masanari Koguchi ,  Teruo Kohashi ,  Tomihiro Hashizume

    IPC分类号： G02B21/04 ,  G01Q30/02 ,  G01Q70/14 ,  G02B21/00

    CPC分类号： G02B21/04 ,  G01Q30/025 ,  G01Q70/14 ,  G02B21/0076

    摘要： To provide a scanning probe microscope capable of easily determining a measurement location even when a numerical aperture of an objective lens is relatively large. The scanning probe microscope comprises: a probe which scans a sample; a light source which irradiates the probe with excitation light via an objective lens; and a detector which detects fluorescence generated at the probe. The scanning probe microscope further includes: a reflective member arranged between the objective lens and the sample; and an imaging device which images a reflecting surface of the reflective member.

    CALCULATION SYSTEM AND CALCULATION METHOD
    4.
    发明申请
    CALCULATION SYSTEM AND CALCULATION METHOD 审中-公开
    计算系统和计算方法

    公开(公告)号：US20150293040A1

    公开(公告)日：2015-10-15

    申请号：US14649924

    申请日：2012-12-05

    申请人： HITACHI, LTD.

    发明人： Koji Aramaki ,  Masanari Koguchi ,  Miyako Matsui

    IPC分类号： G01N23/04

    CPC分类号： G01N23/04 ,  G01N2223/1013 ,  G01N2223/205 ,  G01N2223/401 ,  G01N2223/601 ,  G01N2223/631

    摘要： There is provided a calculating system that can calculate only a gradation image of only a measurement target in monitoring large-scale facility using a transmission imaging on the basis of a cosmic ray. In addition to a gradation image on the basis of a flight track of the cosmic ray, a gradation image of the density length on the basis of structure information of a structural object which is not a measurement target is made and used to correct the gradation image on the basis of the flight track of the cosmic ray.

    摘要翻译： 提供了一种计算系统，其仅在基于宇宙射线的情况下使用透射成像监视大型设备的情况下仅计算测量对象的灰度图像。 除了基于宇宙射线的飞行轨迹的灰度图像之外，进行基于不是测量对象的结构对象的结构信息的浓度长度的灰度图像，并用于校正灰度图像 在宇宙射线的飞行轨迹的基础上。

    Charged-particle-beam analysis device and analysis method
    6.
    发明授权
    Charged-particle-beam analysis device and analysis method 有权

    公开(公告)号：US09752997B2

    公开(公告)日：2017-09-05

    申请号：US15308563

    申请日：2014-05-30

    申请人： HITACHI, LTD.

    发明人： Yoshihiro Anan ,  Masanari Koguchi

    IPC分类号： G21K5/00 ,  H01J37/26 ,  G01N23/225

    CPC分类号： G01N23/2252 ,  G01N23/225

    摘要： To provide a charged particle beam analyzer enabling an efficient and high-sensitivity analysis of a microscopic light element contained in a heavy metal sample, the charged particle beam analyzer equipped with a WDX spectrometer includes a storage unit 126 having stored therein a correlation database between average atomic numbers and WDX background intensity values obtained with use of a plurality of standard samples and a WDX background processing means 146 including a means 147 for calculating an average atomic number for a sample 129 and a means for eliminating a WDX background intensity value derived from the average atomic number for the sample 129 and the correlation database from a WDX spectrum for the sample 129.