公开(公告)号：US11572490B2

公开(公告)日：2023-02-07

申请号：US16981560

申请日：2018-09-25

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano

IPC: C09G1/02 ,  B24B37/04 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, and a liquid medium, in which a zeta potential of the abrasive grains is positive, and the hydroxy acid has one carboxyl group and one to three hydroxyl groups.

公开(公告)号：US10946494B2

公开(公告)日：2021-03-16

申请号：US15556824

申请日：2016-03-08

Applicant: Hitachi Chemical Company, Ltd.

Inventor： Masayuki Hanano ,  Masaya Nishiyama ,  Yutaka Goh ,  Haruaki Sakurai ,  Tomohiro Iwano

IPC: B24B37/00 ,  C09G1/02 ,  B24B37/04 ,  C09K3/14 ,  H01L21/311 ,  H01L21/3105 ,  B24B37/005

Abstract: A polishing agent for polishing a resin comprises abrasive grains, a water-soluble polymer having an ether bond, an organic solvent and water, wherein the abrasive grains have a positive charge in the polishing agent and an average particle diameter of the abrasive grains is larger than 20 nm.

公开(公告)号：US10131819B2

公开(公告)日：2018-11-20

申请号：US14914898

申请日：2014-08-26

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano

IPC: C09G1/02 ,  C01B33/12 ,  B24B37/04 ,  B24B37/00 ,  H01L21/3105 ,  C01F17/00 ,  C09K3/14

Abstract: A polishing liquid comprising abrasive grains, an additive, and water, wherein the abrasive grains include a hydroxide of a tetravalent metal element, produce absorbance of 1.00 or more for light having a wavelength of 400 nm in a first aqueous dispersion having a content of the abrasive grains adjusted to 1.0 mass %, and produce light transmittance of 50%/cm or more for light having a wavelength of 500 nm in the first aqueous dispersion, and a NO3− concentration of a second aqueous dispersion obtained by retaining the first aqueous dispersion at 60° C. for 72 hours is 200 ppm or less.

公开(公告)号：US09932497B2

公开(公告)日：2018-04-03

申请号：US14401283

申请日：2013-03-26

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano ,  Hisataka Minami ,  Toshiaki Akutsu ,  Koji Fujisaki

IPC: C09G1/02 ,  H01L21/3105 ,  B24B37/04 ,  C09K3/14 ,  H01L21/304

CPC classification number: C09G1/02 ,  B24B37/044 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/304 ,  H01L21/31053

Abstract: A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces a liquid phase having a content of a non-volatile component of 300 ppm or more when centrifuging an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass % for 50 minutes at a centrifugal acceleration of 1.59×105 G.

公开(公告)号：US20150232704A1

公开(公告)日：2015-08-20

申请号：US14424970

申请日：2013-07-30

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Toshiaki Akutsu ,  Hisataka Minami ,  Tomohiro Iwano ,  Koji Fujisaki

IPC: C09G1/02

CPC classification number: C09G1/02 ,  B24B37/044 ,  C01F17/0043 ,  C01P2002/84 ,  C01P2004/64 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053 ,  H01L21/76224

Abstract: A polishing agent according to one embodiment of the present invention contains a liquid medium, an abrasive grain including a hydroxide of a tetravalent metal element, a polymer compound having an aromatic ring and a polyoxyalkylene chain, and a cationic polymer, wherein a weight average molecular weight of the polymer compound is 1000 or more.

Abstract translation: 根据本发明的一个实施方案的抛光剂包含液体介质，包含四价金属元素的氢氧化物的磨料颗粒，具有芳环和聚氧化烯链的聚合物化合物和阳离子聚合物，其中重均分子量 高分子化合物的重量为1000以上。

公开(公告)号：US20150139885A1

公开(公告)日：2015-05-21

申请号：US14401233

申请日：2013-03-26

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano ,  Hisataka Minami ,  Toshiaki Akutsu ,  Koji Fujisaki

IPC: B24B37/04 ,  C09G1/02 ,  C01B33/12 ,  H01L21/304

Abstract: A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, and produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %.

Abstract translation: 包含磨粒，添加剂和水的抛光液，其中所述磨粒包括四价金属元素的氢氧化物，并且在水分散体中产生波长为400nm的光的吸光度为1.00以上且小于1.50。 将磨粒的含量调整为1.0质量％。

公开(公告)号：US10825687B2

公开(公告)日：2020-11-03

申请号：US15841367

申请日：2017-12-14

Applicant: Hitachi Chemical Company, Ltd.

Inventor： Tomohiro Iwano

IPC: H01L21/306 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105 ,  B24B37/04 ,  C09K13/12

Abstract: The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains include a tetravalent metal element hydroxide, and produce a liquid phase with a nonvolatile content of 500 ppm or greater when an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass % has been centrifuged for 50 minutes at a centrifugal acceleration of 1.59×105 G.

公开(公告)号：US10557059B2

公开(公告)日：2020-02-11

申请号：US14401246

申请日：2013-03-26

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano ,  Hisataka Minami ,  Toshiaki Akutsu ,  Koji Fujisaki

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/3105 ,  B24B37/04 ,  C01B33/113

Abstract: A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces absorbance of 0.035 or more for light having a wavelength of 400 nm in a liquid phase obtained when centrifuging an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass % for 50 minutes at a centrifugal acceleration of 1.59×105 G.

公开(公告)号：US20150098887A1

公开(公告)日：2015-04-09

申请号：US14401246

申请日：2013-03-26

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Tomohiro Iwano ,  Hisataka Minami ,  Toshiaki Akutsu ,  Koji Fujisaki

IPC: C09G1/02 ,  B24B37/04 ,  C01B33/113 ,  C09K3/14

Abstract: A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces absorbance of 0.035 or more for light having a wavelength of 400 nm in a liquid phase obtained when centrifuging an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass % for 50 minutes at a centrifugal acceleration of 1.59×105 G.

Abstract translation: 包含磨粒，添加剂和水的抛光液，其中所述磨粒包括四价金属元素的氢氧化物，在具有400nm波长的光的水分散体中产生1.00或更大且小于1.50的吸光度， 将磨粒的含量调整为1.0质量％，对于将磨粒含量调整为1.0质量％的水性分散体离心获得的液相中，对于波长为400nm的光，产生0.035以上的吸光度，为 50分钟，离心加速度为1.59×105G。

公开(公告)号：US20150024596A1

公开(公告)日：2015-01-22

申请号：US14379947

申请日：2013-02-14

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Hisataka Minami ,  Toshiaki Akutsu ,  Tomohiro Iwano ,  Koji Fujisaki

IPC: C09G1/02 ,  H01L21/762 ,  H01L21/306

CPC classification number: C09G1/02 ,  C09K3/1409 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/76224

Abstract: The polishing agent of the invention comprises water, an abrasive grain containing a hydroxide of a tetravalent metal element, and a specific glycerin compound.

Abstract translation: 本发明的研磨剂包括水，包含四价金属元素的氢氧化物的磨料颗粒和特定的甘油化合物。