公开(公告)号：US20170108444A1

公开(公告)日：2017-04-20

申请号：US15317065

申请日：2015-05-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Yuta URANO ,  Toshifumi HONDA

IPC: G01N21/88 ,  G01N23/225 ,  G01B11/06 ,  G02B27/09 ,  G02B21/10 ,  G02B21/00 ,  G02B21/26 ,  G02B27/58 ,  G01N21/95 ,  G01B21/00

CPC classification number: G01N21/8806 ,  G01B11/0608 ,  G01B11/2513 ,  G01B11/2527 ,  G01B11/30 ,  G01B15/08 ,  G01B21/00 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N23/2251 ,  G01N2021/8822 ,  G01N2021/8825 ,  G01N2021/8861 ,  G01N2021/8867 ,  G01N2201/068 ,  G01N2223/33 ,  G01N2223/418 ,  G01N2223/6116 ,  G01N2223/646 ,  G02B21/0016 ,  G02B21/10 ,  G02B21/26 ,  G02B27/0933 ,  G02B27/58 ,  G03F7/7065

Abstract: A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.

公开(公告)号：US20170249753A1

公开(公告)日：2017-08-31

申请号：US15386262

申请日：2016-12-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Kazuo AOKI ,  Yohei MINEKAWA

IPC: G06T7/80 ,  G06T7/00 ,  G06T7/73 ,  H04N5/232 ,  G06K9/62 ,  G01N21/956 ,  G02B21/00 ,  G02B21/06 ,  G02B21/36 ,  G01N23/225 ,  G01N21/95 ,  H04N7/18 ,  H04N5/235

CPC classification number: G06T7/80 ,  G01N21/9501 ,  G01N21/956 ,  G01N23/2251 ,  G01N2223/418 ,  G01N2223/6116 ,  G02B21/0016 ,  G02B21/06 ,  G02B21/125 ,  G02B21/365 ,  G03F7/7065 ,  G06K9/6202 ,  G06T7/001 ,  G06T7/74 ,  G06T2207/10061 ,  G06T2207/30148 ,  H04N5/2256 ,  H04N5/23238 ,  H04N5/23245 ,  H04N5/23296 ,  H04N5/2354 ,  H04N7/181

Abstract: A defect observation apparatus includes a storage unit configured to store defect information about defects detected by an external inspection apparatus; a first imaging unit configured to capture an image of a defect using a first imaging condition and a second imaging condition; a control unit configured to correct positional information on the defect using the image captured with the first imaging unit; and a second imaging unit configured to capture an image of the defect based on the corrected positional information.

公开(公告)号：US20170146463A1

公开(公告)日：2017-05-25

申请号：US15127686

申请日：2015-01-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi HONDA ,  Yuta URANO ,  Shunichi MATSUMOTO ,  Taketo UENO ,  Yuko OTANI

IPC: G01N21/956 ,  G01N21/47 ,  G01N21/95

CPC classification number: G01N21/956 ,  G01N21/4738 ,  G01N21/9501 ,  G01N2021/4792 ,  G01N2021/8848 ,  G01N2201/121

Abstract: A defect inspection method includes irradiating a sample with laser, condensing and detecting scattered light beams, processing signals that detectors have detected and extracting a defect on a sample surface, and outputting information on the extracted defect. Detection of the scattered light beams is performed by condensing the scattered light beams, adjusting polarization directions of the condensed scattered light beams, mutually separating the light beams depending on the polarization direction, and detecting the light beams by a plurality of detectors. Extraction of the defect is performed by processing output signals from the detectors by multiplying each detection signal by a gain, discriminating between a noise and the defect, and detecting the defect.

公开(公告)号：US20180088469A1

公开(公告)日：2018-03-29

申请号：US15714765

申请日：2017-09-25

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Kazuo AOKI ,  Toshifumi HONDA ,  Nobuhiko KANZAKI

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95623 ,  G03F7/70191 ,  G03F7/702

Abstract: Provided is a defect detection device including an illumination unit including a condenser lens and a plurality of light beam synthesis units, and a detection unit detecting scattered light generated on a sample by the illumination unit. The condenser lens condenses a plurality of light beams, emitted onto the sample and having substantially the same wavelength and substantially the same polarization, on the sample. The plurality of light beam synthesis units bring the plurality of light beams close to each other and make the light beams have light paths parallel to the optical axis of the condenser lens.

公开(公告)号：US20170082425A1

公开(公告)日：2017-03-23

申请号：US15126391

申请日：2015-03-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yohei MINEKAWA ,  Yuko OTANI ,  Yuji TAKAGI

IPC: G01B11/14 ,  G02B21/36 ,  G02B21/10 ,  G02B21/00 ,  G01N23/225 ,  G01N23/22

CPC classification number: G01B11/14 ,  G01B11/30 ,  G01N21/9501 ,  G01N21/956 ,  G01N23/2204 ,  G01N23/2251 ,  G01N2021/8848 ,  G01N2223/30 ,  G01N2223/646 ,  G02B5/3083 ,  G02B21/0092 ,  G02B21/10 ,  G02B21/361 ,  G02B21/367

Abstract: To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through the filter, and a detector for dividing the image of the scattered light focused by the imaging lens into the polarization directions converted by a wavelength plate and detecting the resulting images, and the control has a calculation unit for determining the position of a defect candidate detected by another inspection device using the plurality of images separated into polarization directions and detected by the detector.

公开(公告)号：US20160211112A1

公开(公告)日：2016-07-21

申请号：US14995813

申请日：2016-01-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshiyuki NAKAO ,  Yuko OTANI ,  Takehiro HIRAI

IPC: H01J37/22 ,  H01J37/285

CPC classification number: H01J37/226 ,  H01J2237/28 ,  H01L22/12 ,  H01L22/20

Abstract: A defect reviewing apparatus includes an illumination optical system that irradiates a sample with laser, a detection optical system that detects reflected light or scattered light from the sample, a processing portion that calculates coordinates of a defect based on the reflected light or scattered light detected, and an electron microscope that reviews the defect based on the coordinates of the defect calculated by the processing portion. In the illumination optical system, inspection modes are switched over based on defect information acquired in another inspection equipment.

Abstract translation: 缺陷检查装置包括：用激光照射样品的照明光学系统，检测来自样品的反射光或散射光的检测光学系统;基于所检测的反射光或散射光来计算缺陷的坐标的处理部， 以及基于由处理部计算出的缺陷坐标来检查缺陷的电子显微镜。 在照明光学系统中，基于在另一检查设备中获取的缺陷信息切换检查模式。

公开(公告)号：US20190237296A1

公开(公告)日：2019-08-01

申请号：US16260988

申请日：2019-01-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Yohei MINEKAWA ,  Takashi NOBUHARA ,  Nobuhiko KANZAKI ,  Takehiro HIRAI ,  Miyuki FUKUDA ,  Yuya ISOMAE ,  Kaori YAESHIMA ,  Yuji TAKAGI

IPC: H01J37/22 ,  G06T7/73 ,  G06T7/13 ,  G06T7/60 ,  G02B21/00 ,  G02B21/36 ,  G06T7/00 ,  H01J37/28

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.

公开(公告)号：US20150116712A1

公开(公告)日：2015-04-30

申请号：US14587271

申请日：2014-12-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Takehiro TACHIZAKI ,  Masahiro WATANABE ,  Shunichi MATSUMOTO

IPC: G01N21/95 ,  G01N21/47 ,  G01N21/21

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

Abstract translation: 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且插入空间滤光器和分布偏振元件 在使用该光学显微镜进行暗视场观察时在瞳孔平面上。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且在制造时将分配滤波器插入瞳孔平面 使用该光学显微镜进行暗场观测。