公开(公告)号：US3881108A

公开(公告)日：1975-04-29

申请号：US40997073

申请日：1973-10-26

Applicant: HITACHI LTD

Inventor： KONDO TOSHIO ,  TAMURA HIFUMI

IPC: G01N23/225 ,  G01Q60/44 ,  H01J37/252 ,  H01J37/256 ,  H01J37/26 ,  G01N23/04

CPC classification number: H01J37/256

Abstract: An ion microprobe analyzer adapted for use in effecting the solid analysis of a specimen in the depth direction thereof in such a manner that the specimen is scanned by a primary ion beam for etching to derive therefrom information on the specimen such as charged particle beams or electromagnetic waves in an attempt to analyze the surface of the specimen in succession with the progress of the etching, wherein the etching of the specimen is effected by scanning the primary ion beam over an area larger than and inclusive of a region to be analyzed and the information generated from the specimen surface only when the primary ion beam passes through the region to be analyzed which is preset is detected, thereby making free from influences from the side wall of a hole produced on the specimen by the etching to improve the precision of analysis in the depth direction of the specimen.

Abstract translation: 一种离子微探针分析仪，其适于用于实现样品在其深度方向上的固体分析，使得样品通过用于蚀刻的一次离子束进行扫描，从而得到样品上的信息，例如带电粒子束或电磁 波浪试图随着蚀刻的进行而连续地分析样品的表面，其中通过在大于和包括待分析区域的区域上扫描主离子束来实现样品的蚀刻，并且信息 只有当主离子束通过预先设定的被分析区域时，才从样品表面产生，从而通过蚀刻不受来自样品上产生的孔的侧壁的影响，从而提高分析精度 样品的深度方向。

公开(公告)号：US3894233A

公开(公告)日：1975-07-08

申请号：US41050473

申请日：1973-10-29

Applicant: HITACHI LTD

Inventor： TAMURA HIFUMI ,  KONDO TOSHIO ,  NAKAMURA KAZUMITSU

IPC: H01J37/252 ,  H01J49/14 ,  H01J37/26

CPC classification number: H01J49/142 ,  H01J37/252

Abstract: An ion microprobe analyzer including a detector of secondary particles emitted from a specimen by bombarding a specimen with an ion beam, and means for recording or displaying the relationship between currents of the secondary particles and specific ions. According to this ion microprobe analyzer the influence on the measurement of the work function of a surface of the specimen is eliminated and the measurement of a concentration distribution of an element in a direction toward the depth of the specimen can be measured precisely.

Abstract translation: 一种离子微探针分析仪，其包括通过用离子束轰击样品从样品发射的二次粒子的检测器，以及用于记录或显示二次粒子和特定离子的电流之间的关系的装置。 根据这种离子微探针分析仪，消除了对样品表面的功函数的测量的影响，并且可以精确地测量元件在朝向样品深度的方向上的浓度分布的测量。

公开(公告)号：US3889115A

公开(公告)日：1975-06-10

申请号：US34184673

申请日：1973-03-16

Applicant: HITACHI LTD

Inventor： TAMURA HIFUMI ,  KONDO TOSHIO

IPC: G01N23/225 ,  G01Q60/44 ,  H01J37/252 ,  H01J37/256 ,  H01J49/14 ,  H01J37/26

CPC classification number: H01J37/256 ,  H01J49/142

Abstract: An ion microanalyzer which detects and mass analyzes the secondary ions emitted from a specimen surface when it is scanned with an ion beam, comprising a cathode ray tube the electron beam of which is scanned synchronously with the scanning of the abovementioned ion beam, the intensity of the electron beam being modulated by the directly detected signal of the secondary ions.

Abstract translation: 一种离子微量分析仪，其用离子束进行扫描时检测并质量分析从样品表面发射的二次离子，该阴离子管包括与上述离子束的扫描同步扫描的电子束的阴极射线管， 电子束的强度由二次离子的直接检测信号调制。

公开(公告)号：US3699381A

公开(公告)日：1972-10-17

申请号：US3699381D

申请日：1971-01-11

Applicant: HITACHI LTD

Inventor： KONDO TOSHIO ,  TAMURA HIFUMI

IPC: H01J27/10 ,  H01J37/08 ,  H01J37/24 ,  H01J49/02 ,  H01J33/00

CPC classification number: H01J49/022 ,  H01J27/10 ,  H01J37/08 ,  H01J37/242 ,  Y10S315/05

Abstract: An ion source device of the Duoplasmatron type has a current reduction resistor in the filament circuit thereof for reducing the filament current during steady state operation thereof, and a relay adapted to normally short-circuit both terminals of the current reduction resistor, which relay is energized by a current flowing through an intermediate electrode circuit so as to open both of these terminals of the resistor thereby making it possible to reduce the steady state filament current.

Abstract translation: Duoplasmatron型离子源装置在其灯丝电路中具有电流减小电阻器，用于在其稳态操作期间减少灯丝电流，以及继电器，适于正常短路电流还原电阻器的两端，该继电器通电 通过流过中间电极电路的电流，以便打开电阻器的这两个端子，从而可以减小稳态灯丝电流。

公开(公告)号：US3686499A

公开(公告)日：1972-08-22

申请号：US3686499D

申请日：1970-05-13

Applicant: HITACHI LTD

Inventor： OMURA ITIRO ,  KONDO TOSHIO ,  TAMURA HIFUMI

IPC: G01N23/225 ,  G01Q30/02 ,  G01Q30/04 ,  H01J37/252 ,  H01J37/256 ,  H01J37/26

CPC classification number: H01J37/256

Abstract: An ion micro-analyzer, wherein a finely collimated ion beam is projected onto the surface of a sample to be analyzed, the projected ion beam repeatedly scans the sample surface while, one time in fixed scanning-frequency intervals, a fixed point on the sample surface is bombarded by the ion beam for a constant time, the image of the secondary electrons from the sample surface is projected on the screen of a Braun tube oscilloscope sweeped synchronously with the ion beam and observed by performing intensity modulation of the oscilloscope in correspondence with the amount of the secondary electrons emitted from the sample surface, the fixed position on the sample surface bombarded by the ion beam in the way described above is moved to a position for analysis while observing the brilliant point on the image of secondary electrons which corresponds to the fixed point on the sample bombarded by the ion beam, and then a mass-spectroscopic analysis of the secondary ions emitted from the fixed point on the sample surface is done while the fixed position on the sample desired for analysis is bombarded by the ion beam.

Abstract translation: 一种离子微量分析仪，其中精细准直的离子束投影到要分析的样品的表面上，所述投影离子束重复地扫描样品表面，而在固定的扫描频率间隔中一次在样品上的固定点 表面被离子束轰击恒定时间，来自样品表面的二次电子的图像被投影到与离子束同步扫描的布朗管示波器的屏幕​​上，并通过对应于示波器的强度调制进行观察 从样品表面发射的二次电子的量，以上述方式由离子束轰击的样品表面上的固定位置移动到用于分析的位置，同时观察对应于二次电子的二次电子的图像上的辉煌点 样品上的固定点由离子束轰击，然后对固定的二次离子进行质谱分析 在样品表面上的点被完成，而待分析的样品上的固定位置被离子束轰击。