DEVICE HOUSING AND METHOD FOR MAKING SAME
    7.
    发明申请
    DEVICE HOUSING AND METHOD FOR MAKING SAME 审中-公开
    设备外壳及其制造方法

    公开(公告)号:US20120241353A1

    公开(公告)日:2012-09-27

    申请号:US13271387

    申请日:2011-10-12

    IPC分类号: B65D79/00 C23C14/35

    摘要: A device housing having an aluminum or aluminum alloy substrate, an aluminum layer and a corrosion resistant layer formed on the aluminum or aluminum alloy substrate in that order is provided. The corrosion resistant layer is an Al—O gradient layer implanted with iridium ions by ion implantation process. The atomic percentage of O in the Al—O gradient layer gradually increases from the area near the aluminum layer to the area away from aluminum or aluminum alloy substrate. Therefore the device housing has a high corrosion resistance. A method for making the device housing is also provided.

    摘要翻译: 提供了具有铝或铝合金基板的装置壳体,铝层和在该铝或铝合金基板上依次形成的耐腐蚀层。 耐腐蚀层是通过离子注入工艺注入铱离子的Al-O梯度层。 Al-O梯度层中O的原子百分比从铝层附近的区域逐渐增加到远离铝或铝合金基底的区域。 因此,器件外壳具有高耐腐蚀性。 还提供了一种用于制造器件外壳的方法。