公开(公告)号：US20110208459A1

公开(公告)日：2011-08-25

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G06F19/00

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US08994919B2

公开(公告)日：2015-03-31

申请号：US12244326

申请日：2008-10-02

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G03B27/42 ,  G03F7/20 ,  G05D19/02

CPC分类号： G03F7/70775 ,  G03F7/709 ,  G05D19/02

摘要： A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.

摘要翻译： 提供了一种用于控制物体的位置或位置相关量的控制系统。 测量系统被配置为测量对象的位置或位置相关量。 控制器被配置为基于所测量的位置或位置相关量提供控制信号。 执行器基于控制信号致动物体。 可以是部分级过滤器单元的过滤器单元过滤所测量的位置或位置相关量。

公开(公告)号：US20090180092A1

公开(公告)日：2009-07-16

申请号：US12267809

申请日：2008-11-10

申请人： Hans BUTLER ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans BUTLER ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/709 ,  F16F15/002

摘要： An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.

摘要翻译： 一种用于抑制结构的至少一部分的振动的主动阻尼系统，包括确定结构的位置量的装置和致动器，以依据确定的位置量对结构施加力，其中该装置是 计算装置，被配置为基于致动器信号计算结构的位置量。

公开(公告)号：US08781775B2

公开(公告)日：2014-07-15

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G01C17/38

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US08059259B2

公开(公告)日：2011-11-15

申请号：US12268622

申请日：2008-11-11

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/52

CPC分类号： G03F7/709 ,  F16F7/1005 ,  F16F15/02

摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.

摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。

公开(公告)号：US20090207393A1

公开(公告)日：2009-08-20

申请号：US12268622

申请日：2008-11-11

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  F16F7/1005 ,  F16F15/02

摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.

摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。

公开(公告)号：US20090122284A1

公开(公告)日：2009-05-14

申请号：US12249399

申请日：2008-10-10

申请人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/42 ,  F16F7/10

CPC分类号： G03F7/709 ,  G03F7/70883

摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。

公开(公告)号：US09715171B2

公开(公告)日：2017-07-25

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02 ,  G03F7/00 ,  F16F15/03 ,  F16F9/53 ,  F16F15/00 ,  F16F15/027 ,  B82Y10/00 ,  B82Y40/00 ,  B29C43/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

公开(公告)号：US20110163477A1

公开(公告)日：2011-07-07

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

摘要翻译： 压印光刻设备包括致动器，其构造成使压印模板保持器相对于衬底保持器移位以执行压印处理。 压印模板保持器和/或衬底保持器被支撑在支撑结构上，支撑结构安装到安装到设备的基座上的隔振系统。 隔振系统构造成提供支撑结构相对于底座的隔振。 控制单元构造成在压印过程中控制致动器。 控制单元布置成控制隔振系统的可调节构件，以在至少部分压印过程中调节隔振系统的动态特性，以便减少支撑结构相对于底座的位移，这是由于 在压印过程中施加在支撑结构上的力。

公开(公告)号：US08245824B2

公开(公告)日：2012-08-21

申请号：US12267809

申请日：2008-11-10

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： F16F7/10 ,  G03B27/42

CPC分类号： G03F7/709 ,  F16F15/002

摘要： An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.

摘要翻译： 一种用于抑制结构的至少一部分的振动的主动阻尼系统，包括确定结构的位置量的装置和致动器，以依据确定的位置量对结构施加力，其中该装置是 计算装置，被配置为基于致动器信号计算结构的位置量。