公开(公告)号：US06329126B1

公开(公告)日：2001-12-11

申请号：US08339340

申请日：1994-11-14

申请人： Hatsuyuki Tanaka ,  Mitsuru Sato ,  Toshimasa Nakayama ,  Hiroshi Komano

发明人： Hatsuyuki Tanaka ,  Mitsuru Sato ,  Toshimasa Nakayama ,  Hiroshi Komano

IPC分类号： G03F732

CPC分类号： G03F7/322

摘要： Disclosed is a novel aqueous developer solution used in the development treatment of an actinic ray-sensitive resist for the manufacture of, for example, semiconductor devices, which is capable of giving a patterned resist layer free from the troubles of film residue or scum deposition in any finest patterning. The developer solution contains, in addition to a nitrogen-containing organic basic compound, e.g., tetramethyl ammonium hydroxide, dissolved in an aqueous medium as the solvent, an anionic surface active agent which is a diphenyl ether compound having at least one ammonium sulfonate group, such as an ammonium alkyl diphenylether sulfonate, in a concentration of 0.05 to 5% by weight.

摘要翻译： 公开了一种用于显影处理用于制造例如半导体器件的光化抗敏抗蚀剂的新型水性显影剂溶液，其能够提供没有膜残留物或浮渣沉积问题的图案化抗蚀剂层 任何最好的图案。 除了溶解在作为溶剂的水性介质中的含氮有机碱性化合物例如四甲基氢氧化铵之外，显影剂溶液还含有具有至少一个磺酸铵基团的二苯基醚化合物的阴离子表面活性剂， 例如烷基二苯基醚磺酸铵，其浓度为0.05-5重量％。

公开(公告)号：US5543268A

公开(公告)日：1996-08-06

申请号：US231877

申请日：1994-04-22

申请人： Hatsuyuki Tanaka ,  Mitsuru Sato ,  Toshimasa Nakayama ,  Hiroshi Komano

发明人： Hatsuyuki Tanaka ,  Mitsuru Sato ,  Toshimasa Nakayama ,  Hiroshi Komano

IPC分类号： G03F7/32

CPC分类号： G03F7/322

摘要： Disclosed is a novel aqueous developer solution used in the development treatment of an actinic ray-sensitive resist for the manufacture of, for example, semiconductor devices, which is capable of giving a patterned resist layer free from the troubles of film residue or scum deposition in any finest patterning. The developer solution contains, in addition to a nitrogen-containing organic basic compound, e.g., tetramethyl ammonium hydroxide, dissolved in an aqueous medium as the solvent, an anionic surface active agent which is a diphenyl ether compound having at least one ammonium sulfonate group, such as an ammonium alkyl diphenylether sulfonate, in a concentration of 0.05 to 5% by weight.

摘要翻译： 公开了一种用于显影处理用于制造例如半导体器件的光化抗敏抗蚀剂的新型水性显影剂溶液，其能够提供没有膜残留物或浮渣沉积问题的图案化抗蚀剂层 任何最好的图案。 除了溶解在作为溶剂的水性介质中的含氮有机碱性化合物例如四甲基氢氧化铵之外，显影剂溶液还含有具有至少一个磺酸铵基团的二苯基醚化合物的阴离子表面活性剂， 例如烷基二苯基醚磺酸铵，其浓度为0.05-5重量％。

公开(公告)号：US5985525A

公开(公告)日：1999-11-16

申请号：US127640

申请日：1993-09-28

申请人： Mitsuru Sato ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

发明人： Mitsuru Sato ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

IPC分类号： G03F7/32 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/322

摘要： Proposed is an aqueous developer solution for an alkali-developable photoresist composition which contains, besides a water-soluble organic basic compound such as tetramethyl ammonium hydroxide and an anionic or non-ionic surface active agent as conventional ingredients in the prior art developwer solutions, an inorganic ammonium salt such as ammonium sulfate, ammonium phosphates and ammonium borates in a limited amount. By virtue of this unique additive, the developer solution is advantageous in respect of the absence of any scums on the patterned resist layer obtained by the development treatment therewith as well as quite good orthogonality in the cross sectional profile of line-patterned resist layer in addition to the greatly improved latitude in the light exposure dose and range of focusing depth in the light-exposure process of the resist layer with ultraviolet light.

摘要翻译： 提出了一种用于碱显影光致抗蚀剂组合物的水性显影剂溶液，其除了水溶性有机碱性化合物如四甲基氢氧化铵和阴离子或非离子表面活性剂外，还含有现有技术的开发溶液中的常规成分， 无机铵盐如硫酸铵，磷酸铵和硼酸铵。 由于这种独特的添加剂，显影剂溶液在通过其显影处理获得的图案化抗蚀剂层上不存在任何浮渣以及线图案化抗蚀剂层的横截面轮廓中的相当好的正交性方面是有利的 在抗紫外线的光曝光过程中的曝光剂量和聚焦深度的范围大大提高。

公开(公告)号：US5800964A

公开(公告)日：1998-09-01

申请号：US717779

申请日：1996-09-24

申请人： Mitsuru Sato ,  Kazuyuki Nitta ,  Hideo Hada ,  Tatsuya Hashiguchi ,  Hiroshi Komano ,  Toshimasa Nakayama

发明人： Mitsuru Sato ,  Kazuyuki Nitta ,  Hideo Hada ,  Tatsuya Hashiguchi ,  Hiroshi Komano ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： Disclosed is a novel and improved photoresist composition which comprises: (A) a film-forming resinous compound which is, in the presence of an acid, subject to a change in the solubility in an alkaline solution; and (B) an acid-generating agent capable of releasing an acid by the exposure to actinic rays which is an oxime sulfonate compound represented by the general formula NC--CR.sup.1 .dbd.N--O--SO.sub.2 --R.sup.2, in which R.sup.1 and R.sup.2 are, each independently from the other, an unsubstituted or halogen-substituted monovalent aliphatic hydrocarbon group, e.g., alkyl, cycloalkyl, alkenyl and cycloalkenyl groups. By virtue of the non-aromatic nature of the component (B) as well as good solubility thereof in organic solvents and high acid strength of the acid released therefrom, the composition is highly transparent to deep ultraviolet light even when the content of the component (B) is relatively large and the photosensitivity of the composition is very high so that the photoresist composition is capable of giving a patterned resist layer having excellent characteristics.

摘要翻译： 公开了一种新颖且改进的光致抗蚀剂组合物，其包含：（A）在酸存在下，在碱溶液中溶解度变化的成膜树脂化合物; 和（B）能够通过暴露于由通式NC-CR1 = NO-SO2-R2表示的肟磺酸盐化合物的光化射线释放酸的酸产生剂，其中R 1和R 2各自独立地为 另一个，未取代或卤素取代的一价脂族烃基，例如烷基，环烷基，烯基和环烯基。 由于组分（B）的非芳香性质以及其在有机溶剂中的良好溶解性和从其释放的酸的高酸强度，组合物对于深紫外光是高度透明的，即使组分（ B）相对较大并且组合物的光敏性非常高，使得光致抗蚀剂组合物能够提供具有优异特性的图案化抗蚀剂层。

公开(公告)号：US4882260A

公开(公告)日：1989-11-21

申请号：US059556

申请日：1987-06-05

申请人： Hidekatsu Kohara ,  Nobuo Tokutake ,  Masanori Miyabe ,  Toshimasa Nakayama ,  Shingo Asaumi ,  Hatsuyuki Tanaka ,  Yoshiaki Arai

发明人： Hidekatsu Kohara ,  Nobuo Tokutake ,  Masanori Miyabe ,  Toshimasa Nakayama ,  Shingo Asaumi ,  Hatsuyuki Tanaka ,  Yoshiaki Arai

IPC分类号： G03C1/00 ,  C09D161/08 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/025 ,  G03F7/04 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/091

摘要： The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a combination of an alkali-insoluble dye and an alkali-soluble dye each having absorptivity of light in the wavelength region from 230 to 500 nm in a specified amount and in a specified ratio between them. By virtue of the formulation of combined dyes, the undesirable phenomenon of halation by the underlying aluminum coating layer on the substrate surface is greatly decreased so that patterned resist layer obtained with the composition is a high-fidelity reproduction of the original pattern even in a submicron range of fineness with good rectangularity of the cross sectional form of the patterned lines.

摘要翻译： 在制造半导体器件的精细图案化中适合作为光致抗蚀剂材料的光敏组合物包含作为光敏剂的碱不溶性染料和碱溶性染料的组合，其中每种具有光吸收性的染料 波长范围为230〜500nm，以规定的量和它们之间的规定比例。 由于组合染料的配制，基板表面上的下面的铝涂层的不期望的卤化现象大大降低，使得用该组合物获得的图案化抗蚀剂层即使在亚微米中也是原始图案的高保真再现 图案线的横截面形状的良好矩形度的细度范围。

公开(公告)号：US4833067A

公开(公告)日：1989-05-23

申请号：US246930

申请日：1988-09-19

申请人： Hatsuyuki Tanaka ,  Hidekatsu Kohara ,  Yoshiyuki Sato ,  Shingo Asaumi ,  Toshimasa Nakayama ,  Akira Yokota ,  Hisashi Nakane

发明人： Hatsuyuki Tanaka ,  Hidekatsu Kohara ,  Yoshiyuki Sato ,  Shingo Asaumi ,  Toshimasa Nakayama ,  Akira Yokota ,  Hisashi Nakane

IPC分类号： G03C1/72 ,  G03C5/18 ,  G03F7/30 ,  G03F7/32 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/322 ,  G03C5/18

摘要： The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metallic ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an acetylene alcohol. In comparison with conventional developing solutions, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer, higher sensitivity and smaller temperature dependency of development and less drawbacks due to foaming of the solution.

摘要翻译： 本发明的正性光致抗蚀剂组合物的水性显影液除了含有金属离子的有机碱性化合物外，还含有氢氧化四甲基铵和胆碱作为主要成分，为50-5000ppm的乙炔醇。 与传统的显影液相比，本发明的显影溶液在图案化光刻胶层的均匀性方面是有利的，更高的灵敏度和更小的显影温度依赖性以及由于溶液的发泡而引起的缺点。

公开(公告)号：US5662961A

公开(公告)日：1997-09-02

申请号：US616378

申请日：1996-03-15

申请人： Katsuya Tanitsu ,  Atsushi Kawakami ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

发明人： Katsuya Tanitsu ,  Atsushi Kawakami ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

IPC分类号： B05D5/00 ,  C03C17/00 ,  C03C17/30 ,  C09D183/02 ,  C09D183/06 ,  G02F1/1333 ,  B05D3/02

CPC分类号： G02F1/133345 ,  B05D5/00 ,  C03C17/009 ,  C03C17/30 ,  C09D183/02 ,  C09D183/06 ,  Y10T428/1045

摘要： Proposed is a novel method for the formation of a protective coating film having a pencil hardness of up to 9 H on the surface of various substrates or, in particular, electronic parts such as color filters and liquid crystal display panels. The method comprises: coating the surface with a liquid coating composition of which the principal ingredient is a partial cohydrolysis-condensation product of a tetraalkoxy silane, e.g., tetraethoxy silane, and a functional alkoxy silane, e.g., 3-methacryloxypropyl trimethoxy silane, and drying and heating the coating layer to effect complete curing. The hardness of the cured protective film can be increased by admixing the liquid coating composition with a finely divided inorganic filler such as a colloidal silica. It is optional that the functional alkoxy silane is subjected to the cohydrolysis reaction after it is polymerized alone or after it is copolymerized with a polyfunctional acrylic monomer.

摘要翻译： 提出了在各种基板的表面上形成铅笔硬度高达9H的保护涂膜的新颖方法，特别是电子部件如滤色器和液晶显示面板。 该方法包括：用液体涂料组合物涂覆表面，其中主要成分是四烷氧基硅烷（例如四乙氧基硅烷）和官能的烷氧基硅烷（例如3-甲基丙烯酰氧基丙基三甲氧基硅烷）的部分共水解缩合产物和干燥 并加热涂层以完成固化。 固化保护膜的硬度可以通过将液体涂料组合物与细碎的无机填料如胶体二氧化硅混合来提高。 功能性烷氧基硅烷在单独聚合或与多官能丙烯酸单体共聚后，可进行共水解反应是可选的。

公开(公告)号：US4997748A

公开(公告)日：1991-03-05

申请号：US394586

申请日：1989-08-16

申请人： Yasuyuki Takeda ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

发明人： Yasuyuki Takeda ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

IPC分类号： G03F7/32

CPC分类号： G03F7/322

摘要： The developer solution of the invention is suitable for use to develop a positive-working resist composition comprising an alkali-soluble novolac resin and a naphthoquinone diazide compound and capable of giving a patterned image of the resist layer with a high contrast and increasing the effective depth of focus. The characteristic ingredient in the inventive developer solution is an alkali-soluble organic cyclic nitrogen compound such as N-hydroxyethyl piperazine, N-methyl-4-piperidone, 1,3-dimethyl-2-imidazolidinone and the like added in a specified concentration to a conventional developer solution containing tetramethyl ammonium hydroxide or choline as the water-soluble alkaline compound.

摘要翻译： 本发明的显影剂溶液适用于开发包含碱溶性酚醛清漆树脂和萘醌二叠氮化合物的正性抗蚀剂组合物，能够以高对比度提供抗蚀剂层的图案化图像并增加有效深度 的焦点。 本发明的显影剂溶液中的特征成分是以特定浓度添加的碱溶性有机环状氮化合物，例如N-羟乙基哌嗪，N-甲基-4-哌啶酮，1,3-二甲基-2-咪唑啉酮等， 包含四甲基氢氧化铵或胆碱作为水溶性碱性化合物的常规显影剂溶液。

公开(公告)号：US4804612A

公开(公告)日：1989-02-14

申请号：US62954

申请日：1987-06-16

申请人： Shingo Asaumi ,  Hidekatsu Kohara ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

发明人： Shingo Asaumi ,  Hidekatsu Kohara ,  Hatsuyuki Tanaka ,  Toshimasa Nakayama

IPC分类号： G03C1/72 ,  C08G8/08 ,  G03C1/10 ,  G03F7/023 ,  G03F7/22 ,  H01L21/027 ,  G03C1/60 ,  G03C1/495

CPC分类号： C08G8/08 ,  G03F7/0236

摘要： Although the positive-working photoresist composition comprises a phenolic novolac resin as the film-forming component and a known photosensitizing compound as in conventional compositions, the novolac resin is prepared from a specific mixture of two classes of phenolic compounds including, one, phenol, cresols and/or resorcinol and, the other, one or more of the phenolic compounds having a nucleus-substituting group selected from allyloxy, allyloxymethyl, allyl dimethyl silyl, 2-(allyl dimethyl silyl) ethoxy, cinnamoyl, acryloyl and methacryloyl groups. By virtue of this unique combination to give the phenolic moiety in the novolac resin, the photoresist composition has markedly improved heat resistance as well as stability against plasma in dry etching so that the composition can give a patterned photoresist layer with extreme fineness having high fidelity to the mask pattern.

摘要翻译： 尽管正性光致抗蚀剂组合物包含作为成膜组分的酚醛酚醛树脂和常规组合物中已知的光敏化合物，但酚醛清漆树脂由两类酚类化合物的特定混合物制备，包括一种酚类，甲酚 和/或间苯二酚，另一种，一种或多种具有选自烯丙氧基，烯丙氧基甲基，烯丙基二甲基甲硅烷基，2-（烯丙基二甲基甲硅烷基）乙氧基，肉桂酰基，丙烯酰基和甲基丙烯酰基的取代基的酚类化合物。 由于这种独特的组合使得酚醛部分在酚醛清漆树脂中，光致抗蚀剂组合物在干蚀刻中具有显着改善的耐热性以及抗等离子体的稳定性，使得组合物可以给出具有高保真度的极细度的图案化光致抗蚀剂层 掩模图案。

公开(公告)号：US4731319A

公开(公告)日：1988-03-15

申请号：US886839

申请日：1986-07-18

申请人： Hidekatsu Kohara ,  Hatsuyuki Tanaka ,  Masanori Miyabe ,  Yoshiaki Arai ,  Shingo Asaumi ,  Toshimasa Nakayama

发明人： Hidekatsu Kohara ,  Hatsuyuki Tanaka ,  Masanori Miyabe ,  Yoshiaki Arai ,  Shingo Asaumi ,  Toshimasa Nakayama

IPC分类号： G03C1/72 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  G03C1/54 ,  G03C1/60

CPC分类号： G03F7/0236

摘要： A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g. VLSIs, with high fidelity is proposed. The composition comprises a cresol novolac resin and a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is characteristically a combination of two different cresol novolac resins differentiated in respects of the weight-average molecular weight, one large and the other small, and the weight proportion of the m- and p-isomers of cresol, one rich in the m-isomer and the other rich in the p-isomer, used in the preparation of the novolac and the overall weight ratio of the m-cresol and p-cresol moieties in the thus combined cresol novolac resins also should be in a specified range.

摘要翻译： 适用于制造半导体器件的精细图案化的正性光致抗蚀剂组合物，例如， 提出了高保真的VLSI。 该组合物包含甲酚酚醛清漆树脂和萘醌二叠氮化物磺酸酯作为感光组分，而甲酚酚醛清漆树脂组分特征是两种不同甲酚酚醛清漆树脂的组合，其重均分子量分别为大，一 小的，并且用于制备酚醛清漆的甲酚和m-异构体的m-和p-异构体的重量比例，其中一个富含m-异构体和另一个富含p-异构体的重量比例， 这样组合的甲酚酚醛清漆树脂中的甲酚和对甲酚部分也应在特定的范围内。