SERS SENSOR APPARATUS WITH PASSIVATION FILM
    1.
    发明申请

    公开(公告)号:US20200158645A1

    公开(公告)日:2020-05-21

    申请号:US16074368

    申请日:2016-04-22

    Abstract: A method for forming a surface enhanced Raman spectroscopy (SERS) sensing apparatus may include providing a body having an internal microfluidic passage, the microfluidic passage having an interior surrounded by an interior surface, depositing a conformal inorganic passivation film onto the interior surface so as to continuously surround the interior by atomic layer deposition and positioning a SERS sensor in connection with the microfluidic passage after the depositing of the conformal inorganic film.

    Passivation stacks
    6.
    发明授权

    公开(公告)号:US11230098B2

    公开(公告)日:2022-01-25

    申请号:US16603581

    申请日:2018-05-11

    Abstract: A passivation stack can include a laminated film, including from 8 to 40 alternating layers of HfO2 and SiO2. The layers can individually have a thickness from 8 Angstroms to 40 Angstroms, and the laminated film can have a total thickness of 280 Angstroms to 600 Angstroms. The passivation stack can also include a barrier film of HfO2 having a thickness from 50 Angstroms to 300 Angstroms applied to the laminated film.

    PASSIVATION STACKS
    7.
    发明申请

    公开(公告)号:US20210331471A1

    公开(公告)日:2021-10-28

    申请号:US16603581

    申请日:2018-05-11

    Abstract: A passivation stack can include a laminated film, including from 8 to 40 alternating layers of HfO2 and SiO2. The layers can individually have a thickness from 8 Angstroms to 40 Angstroms, and the laminated film can have a total thickness of 280 Angstroms to 600 Angstroms. The passivation stack can also include a barrier film of HfO2 having a thickness from 50 Angstroms to 300 Angstroms applied to the laminated film.

    Fluid ejection device
    9.
    发明授权

    公开(公告)号:US10449762B2

    公开(公告)日:2019-10-22

    申请号:US15748301

    申请日:2015-10-30

    Abstract: According to an example, a fluid ejection device may include a substrate, a resistor positioned on the substrate, an overcoat layer positioned over the resistor, a fluidics layer having surfaces that form a firing chamber about the resistor, in which the overcoat layer is positioned between the resistor and the firing chamber, and a thin film membrane covering the surfaces of the fluidics layer that form the firing chamber and a portion of the overcoat layer that is in the firing chamber.

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