公开(公告)号：US5068051A

公开(公告)日：1991-11-26

申请号：US454265

申请日：1989-12-21

申请人： Hideaki Kikuchi ,  Motosuke Ogawa ,  Akira Niiyama

发明人： Hideaki Kikuchi ,  Motosuke Ogawa ,  Akira Niiyama

IPC分类号： C11D7/50

CPC分类号： C11D7/5086

摘要： A mixed cleaning solvent containing dichlorotrifluoroethane and dimethoxymethane without containing Flon #113, which is suitable for cleaning and degreasing printed circuit boards and for eliminating flux residues and dust particles adhering thereon and which reveals high cleaning ability without occurrence of whity specks of volatilization residues including ionic residues on the treated surface with possible attainment of high stability to decomposition of the solvent component.

摘要翻译： 含有二氯三氟乙烷和二甲氧基甲烷的混合清洗溶剂，不含Flon＃113，适用于印刷电路板的清洗和脱脂，并且消除粘附在其上的助焊剂残留物和灰尘颗粒，并且显示出高清洁能力，而不会发生挥发残余物（包括离子） 处理表面上的残留物可能达到溶剂组分分解的高稳定性。

公开(公告)号：US08975553B2

公开(公告)日：2015-03-10

申请号：US14238655

申请日：2011-10-14

申请人： Yoshinori Saigusa ,  Hisashi Hara ,  Hideaki Kikuchi ,  Makoto Komori

发明人： Yoshinori Saigusa ,  Hisashi Hara ,  Hideaki Kikuchi ,  Makoto Komori

IPC分类号： B23H11/00 ,  B23H1/00

CPC分类号： B23H11/003 ,  B23H1/00

摘要： A workpiece mounting table (20) for an electric discharge machine, which machines a workpiece (12) by discharging electricity between an electrode and the workpiece (12) in an interior of a work tank (6) and removing a surface of the workpiece (12), includes a surface-plate mounting table (3) made of a conductive material and arranged at the bottom of the work tank (6), a plurality of insulating materials (2), each of which has a flat shape and is arranged and fixed on the surface-plate mounting table (3) with a gap (4) between the insulating materials (2) to constitute an insulating flat plate (30), and a surface plate (1) made of a metal material, fixed on the insulating flat plate (30) and insulated from the surface-plate mounting table (3) by the insulating flat plate (30), for fixing thereon the workpiece (12).

摘要翻译： 一种用于放电机的工件安装台（20），其通过在工作罐（6）的内部在电极和工件（12）之间放电并且移除工件的表面来加工工件（12） 12）包括由导电材料制成的布置在工作罐（6）的底部的表面板安装台（3），多个绝缘材料（2），每个绝缘材料均具有扁平形状并被布置 并在绝缘材料（2）之间具有间隙（4）固定在表面安装台（3）上，构成绝缘平板（30）和固定在金属材料上的表面板（1） 绝缘平板（30），并通过绝缘平板（30）与表面安装台（3）绝缘，用于固定工件（12）。

公开(公告)号：US07981554B2

公开(公告)日：2011-07-19

申请号：US11250039

申请日：2005-10-12

申请人： Masahiko Sato ,  Yosuke Fujii ,  Yasunori Kotani ,  Hideaki Kikuchi

发明人： Masahiko Sato ,  Yosuke Fujii ,  Yasunori Kotani ,  Hideaki Kikuchi

IPC分类号： H01M8/06

CPC分类号： H01M8/04089 ,  H01M8/04097 ,  H01M8/04164 ,  H01M2008/1095

摘要： A fuel cell system includes a fuel cell stack, a gas liquid separator, a first drain channel, and a second drain channel. The gas liquid separator is connected to a fuel gas discharge passage of the fuel cell stack through a fuel gas discharge channel. The first drain channel is connected to the fuel gas discharge passage separately from the fuel gas discharge channel, and connected to the gas liquid separator through a valve unit. The second drain channel chiefly discharges liquid droplets from the gas liquid separator.

摘要翻译： 燃料电池系统包括燃料电池堆，气液分离器，第一排水通道和第二排水通道。 气液分离器通过燃料气体排出通道连接到燃料电池堆的燃料气体排出通道。 第一排水通道与燃料气体排出通道分开地连接到燃料气体排出通道，并通过阀单元连接到气液分离器。 第二排水通道主要从气液分离器排出液滴。

公开(公告)号：US07964318B2

公开(公告)日：2011-06-21

申请号：US11714941

申请日：2007-03-07

申请人： Masaharu Suzuki ,  Hideaki Kikuchi ,  Katsuhiko Kohyama

发明人： Masaharu Suzuki ,  Hideaki Kikuchi ,  Katsuhiko Kohyama

IPC分类号： H01M8/24

CPC分类号： H01M8/04029 ,  H01M8/0267 ,  H01M8/241 ,  H01M8/2483 ,  H01M8/2484 ,  H01M2008/1095 ,  H01M2250/20 ,  Y02T90/32

摘要： There is provided a coolant manifold that is installed to a fuel cell stack so as to distribute coolant through the fuel cell stack, which is constituted by stacking a plurality of unit cells and has more than one communication holes for coolant supply and at least one communication hole for coolant discharge, in which the coolant flows in an order from the communication holes for coolant supply through a plurality of the unit cells to the communication hole for coolant discharge. The coolant manifold includes a manifold body having a manifold chamber that extends along an alignment direction of the communication holes for coolant supply, and an external communication part having an external communication hole for communicating the manifold chamber with external. A center axis of the external communication hole is placed unparallel and non-vertical relative to a center axis of each communication hole for coolant supply.

摘要翻译： 提供了一种冷却剂歧管，其被安装到燃料电池堆，以便将冷却剂分配通过堆叠多个单元电池而构成的燃料电池堆，并且具有多个用于冷却剂供应的连通孔和至少一个通信 用于冷却剂排放的孔，其中冷却剂从用于冷却剂供给的连通孔的顺序流过多个单元电池到用于冷却剂排放的连通孔。 冷却剂歧管包括具有歧管腔的歧管主体，该歧管腔沿着用于冷却剂供应的连通孔的对齐方向延伸，以及外部连通部，其具有用于将歧管腔与外部连通的外部连通孔。 外部连通孔的中心轴相对于用于冷却剂供应的每个连通孔的中心轴线是不平行的和非垂直的。

公开(公告)号：US07820315B2

公开(公告)日：2010-10-26

申请号：US11599938

申请日：2006-11-14

申请人： Hideaki Kikuchi ,  Masaru Oda ,  Teruyuki Otani ,  Norimasa Kawagoe

发明人： Hideaki Kikuchi ,  Masaru Oda ,  Teruyuki Otani ,  Norimasa Kawagoe

IPC分类号： H01M2/14

CPC分类号： H01M8/0267 ,  H01M8/0258 ,  H01M8/026 ,  H01M8/04029 ,  H01M8/04119 ,  H01M8/241 ,  H01M8/2483 ,  H01M2008/1095

摘要： A fuel cell stack having stacked unit fuel cells, each having a pair of separators between which a membrane electrode assembly is provided, which includes an anode and a cathode. Each separator has protruding lines arranged vertically in a zigzag manner, which protrude in a direction going away from the membrane electrode assembly. A space between the anode and the protruding lines of the separator facing the anode is used as a fuel gas passage. A space between the cathode and the protruding lines of the separator facing the cathode is used as an oxidant gas passage. At least part of the separators are each arranged in close contact with another separator so that a coolant passage through which a coolant flows horizontally is formed between both separators. A lower area of the coolant passage has a larger flow resistance than that of an upper area thereof.

摘要翻译： 一种具有堆叠单元燃料电池的燃料电池堆，每个燃料电池具有一对隔板，在该隔板之间设置有包括阳极和阴极的膜电极组件。 每个分离器具有以锯齿形方式垂直布置的突出线，其沿远离膜电极组件的方向突出。 阳极与面向阳极的隔膜的突出线之间的空间用作燃料气体通道。 阴极与分离器面对阴极的突出线之间的空间用作氧化剂气体通道。 分离器的至少一部分各自布置成与另一个分离器紧密接触，使得在两个分离器之间形成冷却剂水平流过的冷却剂通道。 冷却剂通道的下部区域的流动阻力比其上部区域的流动阻力大。

公开(公告)号：US20100197046A1

公开(公告)日：2010-08-05

申请号：US12761002

申请日：2010-04-15

申请人： Hideaki Kikuchi ,  Kouichi Nagai

发明人： Hideaki Kikuchi ,  Kouichi Nagai

IPC分类号： H01L21/768 ,  H01L21/02

CPC分类号： H01L28/75 ,  H01L21/76813 ,  H01L21/76843 ,  H01L21/76846 ,  H01L21/76849 ,  H01L21/7687 ,  H01L23/5223 ,  H01L23/53238 ,  H01L23/53266 ,  H01L27/1159 ,  H01L28/60

摘要： A silicide film is formed between a ferroelectric capacitor structure, which is formed by sandwiching a ferroelectric film between a lower electrode and an upper electrode, and a conductive plug (the conductive material constituting the plug is tungsten (W) for example). Here, an example is shown in which a base film of the conductive plug is the silicide film.

摘要翻译： 在通过在下电极和上电极之间夹入强电介质膜而形成的铁电电容器结构与导电插塞（构成插头的导电材料例如是钨（W））之间形成硅化物膜。 这里，示出了导电性塞子的基底膜为硅化物膜的例子。

公开(公告)号：US07763545B2

公开(公告)日：2010-07-27

申请号：US10372275

申请日：2003-02-25

申请人： Hideaki Kikuchi ,  Genichi Komuro ,  Mitsuhiro Endo ,  Naoki Hirai

发明人： Hideaki Kikuchi ,  Genichi Komuro ,  Mitsuhiro Endo ,  Naoki Hirai

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L27/11507 ,  C23F4/00 ,  H01L21/32136 ,  H01L27/11502 ,  H01L28/55 ,  H01L28/65

摘要： In a semiconductor device manufacturing method having the etching step of an electrode material film constituting a capacitor using ferroelectric substance or high- dielectric substance, etching of a conductive film that acts as an electrode of the capacitor formed over a semiconductor substrate is carried out in an atmosphere containing bromine, and a heating temperature of the semiconductor substrate is set in a range of 300° C. to 600° C., otherwise etching of at least the conductive film is carried out in an atmosphere to which only hydrogen bromide and oxygen are supplied from an outside.

摘要翻译： 在具有构成使用铁电体或高电介质的电容器的电极材料膜的蚀刻工序的半导体器件制造方法中，在半导体衬底上形成用作电容器的电极的导电膜的蚀刻在 含有溴的气氛，将半导体基板的加热温度设定在300℃〜600℃的范围内，否则在只有溴化氢和氧气的气氛中进行至少导电膜的蚀刻 从外部提供。

公开(公告)号：US20100108094A1

公开(公告)日：2010-05-06

申请号：US11997278

申请日：2005-07-29

申请人： Junichi Ishikawa ,  Hideaki Kikuchi ,  Kazuhito Nagashima

发明人： Junichi Ishikawa ,  Hideaki Kikuchi ,  Kazuhito Nagashima

IPC分类号： B08B7/00 ,  C07C49/00 ,  C07C43/00 ,  C07C19/08 ,  A62D3/30

CPC分类号： C11D11/0023 ,  C11D3/43 ,  C11D7/30 ,  C11D7/5018 ,  G21F9/001 ,  G21F9/002 ,  G21F9/28

摘要： The present invention relates to a solvent composition for removing radioactive substance, characterized by comprising at least one selected from hydrofluorocarbon, hydrofluoroether, and perfluoroketone as a medium for transporting the radioactive substance, and a method for removing a radioactive substance characterized by using the solvent composition for removing.

摘要翻译： 本发明涉及一种用于除去放射性物质的溶剂组合物，其特征在于包括选自氢氟烃，氢氟醚和全氟酮作为运输放射性物质的介质中的至少一种，以及用于除去放射性物质的方法，其特征在于使用溶剂组合物 用于删除。

公开(公告)号：US07709132B2

公开(公告)日：2010-05-04

申请号：US11228734

申请日：2005-09-16

申请人： Ayumu Ishizuka ,  Hideaki Kikuchi ,  Go Morimoto

发明人： Ayumu Ishizuka ,  Hideaki Kikuchi ,  Go Morimoto

IPC分类号： H01M2/08

CPC分类号： H01M8/2475 ,  H01M2008/1095

摘要： A side plate of a casing includes bracket members and a surface member. Each of the bracket members includes three second coupling portions and a plate-shaped attachment portion provided integrally with the second coupling portions. A coupling pin is inserted into the second coupling portions. The surface member is joined to the plate-shaped attachment portion. The bracket member includes a step fitted to an end of the surface member. The plate-shaped attachment portion and the surface member are jointed at a spot welding section including spots in a zigzag pattern.

摘要翻译： 壳体的侧板包括托架构件和表面构件。 每个支架构件包括三个第二联接部分和与第二联接部分一体设置的板形附接部分。 联接销插入到第二联接部分中。 表面构件连接到板状安装部。 支架构件包括装配到表面构件的端部的台阶。 板状安装部和表面构件以包括曲折形状的斑点的点焊部分接合。

公开(公告)号：US07592656B2

公开(公告)日：2009-09-22

申请号：US11191967

申请日：2005-07-29

申请人： Hideaki Kikuchi ,  Kouichi Nagai

发明人： Hideaki Kikuchi ,  Kouichi Nagai

IPC分类号： H01L27/108 ,  H01L29/94

CPC分类号： H01L27/11507 ,  H01L27/11502 ,  H01L28/57 ,  H01L2924/0002 ,  H01L2924/00

摘要： An Al2O3 film with a thickness greater than that of a wiring is formed as a protective film, and then the Al2O3 film is polished by CMP until a conductive barrier film is exposed. Namely, CMP is applied to the Al2O3 film by utilizing the conductive barrier film as a stopper film. Next, a silicon oxide film is formed over the entire surface by, for example, a high-density plasma method, and then the surface thereof is flattened. Subsequently, another Al2O3 film is formed on the silicon oxide film as a protective film for preventing intrusion of hydrogen or moisture. Further, another silicon oxide film is formed on the Al2O3 film, for example, by a high-density plasma method. Then, a via hole reaching the conductive barrier film is formed through the silicon oxide film, the Al2O3 film and the silicon oxide film, and then a W plug is embedded therein.

摘要翻译： 形成厚度大于布线的Al 2 O 3膜作为保护膜，然后通过CMP对Al 2 O 3膜进行抛光直至导电阻挡膜露出。 即，通过利用导电阻挡膜作为阻挡膜将CMP施加到Al 2 O 3膜上。 接下来，通过例如高密度等离子体法在整个表面上形成氧化硅膜，然后将其表面变平。 随后，在氧化硅膜上形成另一种Al 2 O 3膜作为防止氢或水分侵入的保护膜。 此外，例如通过高密度等离子体法在Al 2 O 3膜上形成另一氧化硅膜。 然后，通过氧化硅膜，Al 2 O 3膜和氧化硅膜形成到达导电阻挡膜的通孔，然后埋入W插头。